JPH0529130B2 - - Google Patents
Info
- Publication number
- JPH0529130B2 JPH0529130B2 JP61190063A JP19006386A JPH0529130B2 JP H0529130 B2 JPH0529130 B2 JP H0529130B2 JP 61190063 A JP61190063 A JP 61190063A JP 19006386 A JP19006386 A JP 19006386A JP H0529130 B2 JPH0529130 B2 JP H0529130B2
- Authority
- JP
- Japan
- Prior art keywords
- stage
- yawing
- photomask
- measuring device
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 235000012431 wafers Nutrition 0.000 description 12
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61190063A JPS6345819A (ja) | 1986-08-13 | 1986-08-13 | 投影露光装置におけるステ−ジ誤差測定装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61190063A JPS6345819A (ja) | 1986-08-13 | 1986-08-13 | 投影露光装置におけるステ−ジ誤差測定装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10966595A Division JP2724979B2 (ja) | 1995-05-08 | 1995-05-08 | 投影露光装置および投影露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6345819A JPS6345819A (ja) | 1988-02-26 |
JPH0529130B2 true JPH0529130B2 (nl) | 1993-04-28 |
Family
ID=16251727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61190063A Granted JPS6345819A (ja) | 1986-08-13 | 1986-08-13 | 投影露光装置におけるステ−ジ誤差測定装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6345819A (nl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0438813A (ja) * | 1990-06-04 | 1992-02-10 | Canon Inc | 半導体露光装置 |
CN1066156C (zh) * | 1998-09-11 | 2001-05-23 | 化学工业部北京化工研究院 | 吸水树脂的制备方法及搅拌器 |
JP2006349945A (ja) * | 2005-06-15 | 2006-12-28 | Fujifilm Holdings Corp | 露光装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57201025A (en) * | 1981-06-03 | 1982-12-09 | Mitsubishi Electric Corp | Stepping and repeating device |
JPS5972135A (ja) * | 1982-10-18 | 1984-04-24 | Hitachi Ltd | 超精密xy移動装置 |
JPS60173550A (ja) * | 1984-02-20 | 1985-09-06 | Canon Inc | 半導体焼付装置 |
JPS60224225A (ja) * | 1984-04-23 | 1985-11-08 | Canon Inc | 半導体焼付装置 |
JPS60249323A (ja) * | 1984-05-25 | 1985-12-10 | Hitachi Ltd | 縮小投影露光装置 |
JPS6187330A (ja) * | 1984-10-01 | 1986-05-02 | Canon Inc | 半導体製造装置 |
-
1986
- 1986-08-13 JP JP61190063A patent/JPS6345819A/ja active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57201025A (en) * | 1981-06-03 | 1982-12-09 | Mitsubishi Electric Corp | Stepping and repeating device |
JPS5972135A (ja) * | 1982-10-18 | 1984-04-24 | Hitachi Ltd | 超精密xy移動装置 |
JPS60173550A (ja) * | 1984-02-20 | 1985-09-06 | Canon Inc | 半導体焼付装置 |
JPS60224225A (ja) * | 1984-04-23 | 1985-11-08 | Canon Inc | 半導体焼付装置 |
JPS60249323A (ja) * | 1984-05-25 | 1985-12-10 | Hitachi Ltd | 縮小投影露光装置 |
JPS6187330A (ja) * | 1984-10-01 | 1986-05-02 | Canon Inc | 半導体製造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6345819A (ja) | 1988-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |