JPH0527106B2 - - Google Patents

Info

Publication number
JPH0527106B2
JPH0527106B2 JP57159364A JP15936482A JPH0527106B2 JP H0527106 B2 JPH0527106 B2 JP H0527106B2 JP 57159364 A JP57159364 A JP 57159364A JP 15936482 A JP15936482 A JP 15936482A JP H0527106 B2 JPH0527106 B2 JP H0527106B2
Authority
JP
Japan
Prior art keywords
copolymer
isopropenylnaphthalene
chloromethyl
resist
glass transition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57159364A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5948759A (ja
Inventor
Hideaki Doi
Teruo Sakagami
Kenichi Kokubu
Naohiro Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kureha Corp
Original Assignee
Kureha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kureha Corp filed Critical Kureha Corp
Priority to JP15936482A priority Critical patent/JPS5948759A/ja
Priority to DE19833319558 priority patent/DE3319558C2/de
Priority to CA000429204A priority patent/CA1202148A/en
Priority to GB08314989A priority patent/GB2125418B/en
Priority to FR8309023A priority patent/FR2527795B1/fr
Publication of JPS5948759A publication Critical patent/JPS5948759A/ja
Publication of JPH0527106B2 publication Critical patent/JPH0527106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP15936482A 1982-05-31 1982-09-13 フオトレジスト材料 Granted JPS5948759A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP15936482A JPS5948759A (ja) 1982-09-13 1982-09-13 フオトレジスト材料
DE19833319558 DE3319558C2 (de) 1982-05-31 1983-05-30 Strahlungsempfindliches Gemisch
CA000429204A CA1202148A (en) 1982-05-31 1983-05-30 Photoresist material
GB08314989A GB2125418B (en) 1982-05-31 1983-05-31 Photosensitive chloromehylated polymers
FR8309023A FR2527795B1 (fr) 1982-05-31 1983-05-31 Matiere pour photoreserves

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15936482A JPS5948759A (ja) 1982-09-13 1982-09-13 フオトレジスト材料

Publications (2)

Publication Number Publication Date
JPS5948759A JPS5948759A (ja) 1984-03-21
JPH0527106B2 true JPH0527106B2 (enrdf_load_stackoverflow) 1993-04-20

Family

ID=15692220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15936482A Granted JPS5948759A (ja) 1982-05-31 1982-09-13 フオトレジスト材料

Country Status (1)

Country Link
JP (1) JPS5948759A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3712530B2 (ja) * 1998-05-28 2005-11-02 キッコーマン株式会社 新種クリプトコッカス・ノダエンシス、それを用いる耐塩性耐熱性グルタミナーゼの製造法並びにグルタミン酸含量の多い蛋白加水分解物の製造法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5650263A (en) * 1979-09-29 1981-05-07 Hitachi Ltd Noncontact igniter for internal combustion engine
JPS5778529A (en) * 1980-11-05 1982-05-17 Nec Corp Resist material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist

Also Published As

Publication number Publication date
JPS5948759A (ja) 1984-03-21

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