FR2527795B1 - Matiere pour photoreserves - Google Patents
Matiere pour photoreservesInfo
- Publication number
- FR2527795B1 FR2527795B1 FR8309023A FR8309023A FR2527795B1 FR 2527795 B1 FR2527795 B1 FR 2527795B1 FR 8309023 A FR8309023 A FR 8309023A FR 8309023 A FR8309023 A FR 8309023A FR 2527795 B1 FR2527795 B1 FR 2527795B1
- Authority
- FR
- France
- Prior art keywords
- photoreserves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9276682A JPS58209732A (ja) | 1982-05-31 | 1982-05-31 | 感放射線組成物及びレジスト |
JP15936482A JPS5948759A (ja) | 1982-09-13 | 1982-09-13 | フオトレジスト材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2527795A1 FR2527795A1 (fr) | 1983-12-02 |
FR2527795B1 true FR2527795B1 (fr) | 1985-07-26 |
Family
ID=26434141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8309023A Expired FR2527795B1 (fr) | 1982-05-31 | 1983-05-31 | Matiere pour photoreserves |
Country Status (4)
Country | Link |
---|---|
CA (1) | CA1202148A (fr) |
DE (1) | DE3319558C2 (fr) |
FR (1) | FR2527795B1 (fr) |
GB (1) | GB2125418B (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005033852A1 (de) * | 2005-07-12 | 2007-01-18 | Hach Lange Gmbh | Scheibenförmiges Trägersystem mit einer Mehrzahl integrierter Beugungsstrukturen |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4262081A (en) * | 1979-11-21 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers |
DE3174780D1 (en) * | 1980-11-05 | 1986-07-10 | Nec Corp | Radiation-sensitive negative resist |
-
1983
- 1983-05-30 DE DE19833319558 patent/DE3319558C2/de not_active Expired
- 1983-05-30 CA CA000429204A patent/CA1202148A/fr not_active Expired
- 1983-05-31 FR FR8309023A patent/FR2527795B1/fr not_active Expired
- 1983-05-31 GB GB08314989A patent/GB2125418B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB8314989D0 (en) | 1983-07-06 |
CA1202148A (fr) | 1986-03-18 |
DE3319558A1 (de) | 1983-12-01 |
DE3319558C2 (de) | 1986-10-30 |
GB2125418B (en) | 1985-09-11 |
GB2125418A (en) | 1984-03-07 |
FR2527795A1 (fr) | 1983-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |