GB2125418B - Photosensitive chloromehylated polymers - Google Patents

Photosensitive chloromehylated polymers

Info

Publication number
GB2125418B
GB2125418B GB08314989A GB8314989A GB2125418B GB 2125418 B GB2125418 B GB 2125418B GB 08314989 A GB08314989 A GB 08314989A GB 8314989 A GB8314989 A GB 8314989A GB 2125418 B GB2125418 B GB 2125418B
Authority
GB
United Kingdom
Prior art keywords
chloromehylated
photosensitive
polymers
photosensitive chloromehylated
chloromehylated polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08314989A
Other versions
GB2125418A (en
GB8314989D0 (en
Inventor
Hideaki Doi
Kenichi Kokubun
Teruo Sakagami
Naohiro Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kureha Corp
Original Assignee
Kureha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9276682A external-priority patent/JPS58209732A/en
Priority claimed from JP15936482A external-priority patent/JPS5948759A/en
Application filed by Kureha Corp filed Critical Kureha Corp
Publication of GB8314989D0 publication Critical patent/GB8314989D0/en
Publication of GB2125418A publication Critical patent/GB2125418A/en
Application granted granted Critical
Publication of GB2125418B publication Critical patent/GB2125418B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB08314989A 1982-05-31 1983-05-31 Photosensitive chloromehylated polymers Expired GB2125418B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9276682A JPS58209732A (en) 1982-05-31 1982-05-31 Radiosensitive composition and resist
JP15936482A JPS5948759A (en) 1982-09-13 1982-09-13 Photoresist material

Publications (3)

Publication Number Publication Date
GB8314989D0 GB8314989D0 (en) 1983-07-06
GB2125418A GB2125418A (en) 1984-03-07
GB2125418B true GB2125418B (en) 1985-09-11

Family

ID=26434141

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08314989A Expired GB2125418B (en) 1982-05-31 1983-05-31 Photosensitive chloromehylated polymers

Country Status (4)

Country Link
CA (1) CA1202148A (en)
DE (1) DE3319558C2 (en)
FR (1) FR2527795B1 (en)
GB (1) GB2125418B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005033852A1 (en) * 2005-07-12 2007-01-18 Hach Lange Gmbh Disc-shaped carrier system with a plurality of integrated diffraction structures

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4262081A (en) * 1979-11-21 1981-04-14 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers
DE3174780D1 (en) * 1980-11-05 1986-07-10 Nec Corp Radiation-sensitive negative resist

Also Published As

Publication number Publication date
CA1202148A (en) 1986-03-18
FR2527795B1 (en) 1985-07-26
DE3319558C2 (en) 1986-10-30
GB2125418A (en) 1984-03-07
GB8314989D0 (en) 1983-07-06
DE3319558A1 (en) 1983-12-01
FR2527795A1 (en) 1983-12-02

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920531