JPH0526755Y2 - - Google Patents
Info
- Publication number
- JPH0526755Y2 JPH0526755Y2 JP7480287U JP7480287U JPH0526755Y2 JP H0526755 Y2 JPH0526755 Y2 JP H0526755Y2 JP 7480287 U JP7480287 U JP 7480287U JP 7480287 U JP7480287 U JP 7480287U JP H0526755 Y2 JPH0526755 Y2 JP H0526755Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holders
- adjacent
- rotate
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 65
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Description
【考案の詳細な説明】
[産業上の利用分野]
この考案の効果は、回転基板装置特にスパツタ
ー、真空蒸着、ドライエツチング等のチヤンバー
内で複数個の基板ホルダーを回転させる装置に関
するものである。[Detailed Description of the Invention] [Industrial Application Field] The effects of this invention relate to a rotating substrate apparatus, particularly an apparatus for rotating a plurality of substrate holders within a chamber for sputtering, vacuum evaporation, dry etching, and the like.
[従来の技術]
従来、この種の基板回転装置は第4図に示すよ
うに、複数個の円盤状基板ホルダーaが軸線bを
中心としてそれぞれ矢印A方向に回転できるよう
に隣接配置され、各基板ホルダーa上に正方形の
基板cを載置して、前記スパツター等の作業をす
るようになつている。[Prior Art] Conventionally, as shown in FIG. 4, in this type of substrate rotation device, a plurality of disc-shaped substrate holders a are arranged adjacently so that they can each rotate in the direction of arrow A about an axis b, and each A square substrate c is placed on a substrate holder a to perform sputtering and other operations.
[考案が解決しようとする問題点]
上記のような基板回転装置を有する各種装置で
は、真空排気性能等やスペースの有効利用の点
で、出来る限り小さな容量のチヤンバー内で大き
な基板を処理することが要求される。[Problems to be solved by the invention] In various apparatuses having a substrate rotation device as described above, it is necessary to process a large substrate in a chamber with the smallest possible capacity in terms of vacuum pumping performance and effective use of space. is required.
ところが、前記の従来例では、第4図に示すよ
うに対角線の長さlの正方形の基板cが同時に処
理できる最大のサイズであつて、これ以上大きい
と前記基板ホルダーaの回転時に相互に接触して
処理できなくなるからである。従つて、大きなサ
イズの基板を処理するには、隣接する基板ホルダ
ーaの軸線b間の距離を大きく採らなければなら
ないが、このようにすると必然的にチヤンバーの
容量が大きくなつてしまう。 However, in the conventional example, as shown in FIG. 4, a square substrate c with a diagonal length l is the maximum size that can be processed simultaneously, and if the substrate holder a is larger than this, the substrate holder a will come into contact with each other when rotating. This is because it becomes impossible to process. Therefore, in order to process a large-sized substrate, it is necessary to increase the distance between the axes b of adjacent substrate holders a, but this inevitably increases the capacity of the chamber.
本考案は、このような従来の問題点を解決する
ためになされ、チヤンバーの容量を大きくするこ
となく、大きなサイズの基板を処理できるように
した基板回転装置を提供しようとするものであ
る。 The present invention has been made to solve these conventional problems, and aims to provide a substrate rotation device that can process large-sized substrates without increasing the capacity of the chamber.
[問題点を解決するための手段]
上記の問題点を解決するための手段として、こ
の考案は、軸線を中心として回転する複数の基板
ホルダーが互いに隣接して設けられ、各基板ホル
ダー上に方形の基板を載置する基板回転装置にお
いて、前記複数の基板ホルダーはいずれも等速回
転で、かつ隣接する基板ホルダーは互いに逆向き
に回転するように構成されたことを要旨とし、前
記方形の基板は、互いに隣接するもののうち一方
が他方に対してほぼ45°回転させた位置関係とな
るように、前記基板ホルダー上に載置されたこと
を特徴とするものである。[Means for Solving the Problems] As a means for solving the above problems, this invention provides a plurality of substrate holders that rotate around their axes adjacent to each other, and a rectangular shape on each substrate holder. In the substrate rotation device for mounting a substrate, the plurality of substrate holders are configured to rotate at a constant speed, and adjacent substrate holders rotate in opposite directions to each other, is characterized in that it is placed on the substrate holder such that one of the adjacent substrates is rotated approximately 45 degrees with respect to the other.
このような構成により、基板ホルダーの間隔を
拡げることなく、大きなサイズの方形基板を処理
することができる。 With this configuration, large-sized rectangular substrates can be processed without increasing the spacing between substrate holders.
[実施例]
以下、図示の実施例によりこの考案を更に詳し
く説明する。[Example] This invention will be explained in more detail below with reference to the illustrated example.
第1図は、この考案の一実施例を示すもので、
4つの円盤状の基板ホルダー1〜4が各軸線1a
〜4aを中心として回転可能に隣接配置され、こ
の場合は同方向に回転するのではなく、隣接する
ものが互いに逆方向に回転するようになつてい
る。即ち、図示の例では基板ホルダー1は時計方
向に、その右隣りの基板ホルダー2と手前の基板
ホルダー3は反時計方向に、そして手前の右隣り
の基板ホルダー4は時計方向にそれぞれ同じ速度
で回転するようになつている。また、従来と同様
に各基板ホルダー1〜4は第2図に示すように回
転板5に支持され、その軸線5aを中心として時
計方向に回転するようになつている。 Figure 1 shows an example of this invention.
Four disc-shaped substrate holders 1 to 4 are attached to each axis 1a.
They are arranged adjacent to each other so as to be rotatable around ~4a, and in this case, the adjacent ones do not rotate in the same direction, but in opposite directions. That is, in the illustrated example, the substrate holder 1 moves clockwise, the substrate holder 2 on the right and the substrate holder 3 on the front move counterclockwise, and the substrate holder 4 on the right in the front moves clockwise at the same speed. It is supposed to rotate. Further, as in the conventional case, each of the substrate holders 1 to 4 is supported by a rotary plate 5 as shown in FIG. 2, and is configured to rotate clockwise about its axis 5a.
前記回転板5には、モーター等の駆動源(図示
せず)により回転させられる歯車5bが取り付け
られ、この歯車に前記基板ホルダー1〜4に取り
付けられた各歯車1b〜4bが伝導用の歯車6,
7を介して或は歯車6のみを介してそれぞれ噛合
され、これにより各基板ホルダーは前記のように
それぞれ定められた方向に自転すると共に、回転
板5によつていわば公転させられることになる。 A gear 5b rotated by a drive source (not shown) such as a motor is attached to the rotary plate 5, and the gears 1b to 4b attached to the substrate holders 1 to 4 are transmission gears. 6,
7 or only through the gear 6, so that each substrate holder rotates on its own axis in a predetermined direction as described above, and is also caused to revolve by the rotary plate 5.
8〜11は前記基板ホルダー1〜4の上にセツ
トされた正方形の基板であり、互いに隣接する基
板のうち一方が他方に対してほぼ45°回転させた
位置関係となるように載置固定されている。 Square substrates 8 to 11 are set on the substrate holders 1 to 4, and are placed and fixed such that one of the adjacent substrates is rotated approximately 45 degrees with respect to the other. ing.
この場合、各基板ホルダー1〜4により各基板
8〜11が回転されても互いに接触することはな
く、この結果基板ホルダーの間隔は従来と同じで
も、各基板8〜11の対角線の長さLを従来の基
板の対角線の長さlよりも大きくすることができ
る。因みに、l=250mmであつたのがL=300mmに
することができた。 In this case, even if the substrates 8 to 11 are rotated by the substrate holders 1 to 4, they do not come into contact with each other. As a result, even though the spacing between the substrate holders is the same as before, the diagonal length L of each substrate 8 to 11 is can be made larger than the diagonal length l of the conventional substrate. By the way, I was able to change L=300mm from L=250mm.
尚、基板の端部は膜厚分布やその他の処理効果
において、基板の中央部よりも多少異なつた値と
なるが、これは特殊な用途以外では殆ど問題とな
らない。 Note that although the film thickness distribution and other processing effects at the edges of the substrate are somewhat different from those at the center of the substrate, this hardly poses a problem except for special uses.
第3図に示すのは、この考案の他の実施例で6
つの基板ホルダー21〜26がリング状に隣接配
置されたものであり、前記の実施例と同様に隣接
する基板ホルダーの回転方向は互いに逆方向で、
これらの基板ホルダー上にセツトされた正方形の
基板27〜32は互いに隣接する基板のうち一方
が他方に対してほぼ45°回転させた位置関係とな
るように載置固定されている。この実施例におい
ても、前記実施例と同様に従来よりも大きな基板
を処理することが可能である。 Figure 3 shows another embodiment of this invention.
Two substrate holders 21 to 26 are arranged adjacently in a ring shape, and as in the previous embodiment, the rotation directions of the adjacent substrate holders are opposite to each other.
The square substrates 27 to 32 set on these substrate holders are mounted and fixed such that one of the adjacent substrates is rotated approximately 45 degrees with respect to the other. In this embodiment as well, it is possible to process a larger substrate than the conventional method, as in the previous embodiment.
[考案の効果]
以上説明したように、この考案によれば、スパ
ツター等の処理において、チヤンバーの容積を増
大することなく、従来よりも大きなサイズの基板
をセツトすることができ、処理基板のサイズが僅
かに大きくて予定した膜付け装置に適用できなか
つたものが使用可能となる等製造上大きなメリツ
トを得ることができる。[Effects of the invention] As explained above, according to this invention, it is possible to set a substrate of a larger size than before without increasing the volume of the chamber in processing such as sputtering, and the size of the processed substrate can be reduced. It is possible to obtain great manufacturing advantages, such as making it possible to use a device that cannot be applied to the intended film deposition apparatus because of its slightly large size.
第1図は、この考案の実施例を示す説明図、第
2図は、その要部の破断斜視図、第3図は、この
考案の他の実施例を示す回転時の説明図、第4図
は従来例の説明図である。
1〜4……基板ホルダー、1a〜4a……軸
線、5……回転板、6,7……歯車、8〜11…
…基板、21〜26……基板ホルダー、27〜3
2……基板。
Fig. 1 is an explanatory diagram showing an embodiment of this invention, Fig. 2 is a cutaway perspective view of its main parts, Fig. 3 is an explanatory diagram showing another embodiment of this invention during rotation, and Fig. 4 is an explanatory diagram showing an embodiment of this invention. The figure is an explanatory diagram of a conventional example. 1 to 4... Substrate holder, 1a to 4a... Axis line, 5... Rotating plate, 6, 7... Gear, 8 to 11...
...Substrate, 21-26...Substrate holder, 27-3
2...Substrate.
Claims (1)
ーが互いに隣接して設けられ、各基板ホルダー
上に方形の基板を載置する基板回転装置におい
て、前記複数の基板ホルダーはいずれも等速回
転で、かつ隣接する基板ホルダーは互いに逆向
きに回転するように構成されたことを特徴とす
る基板回転装置。 (2) 前記方形の基板は、互いに隣接するもののう
ち一方が他方に対してほぼ45°回転させた位置
関係となるように、前記基板ホルダー上に載置
されたことを特徴とする実用新案登録請求の範
囲第(1)項記載の基板回転装置。[Claims for Utility Model Registration] (1) In a substrate rotation device in which a plurality of substrate holders that rotate around an axis are provided adjacent to each other and a rectangular substrate is placed on each substrate holder, 1. A substrate rotation device, wherein all holders rotate at a constant speed, and adjacent substrate holders rotate in opposite directions. (2) The utility model registration characterized in that the rectangular substrates are placed on the substrate holder so that one of the adjacent substrates is rotated approximately 45 degrees with respect to the other. A substrate rotation device according to claim (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7480287U JPH0526755Y2 (en) | 1987-05-19 | 1987-05-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7480287U JPH0526755Y2 (en) | 1987-05-19 | 1987-05-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63182536U JPS63182536U (en) | 1988-11-24 |
JPH0526755Y2 true JPH0526755Y2 (en) | 1993-07-07 |
Family
ID=30920358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7480287U Expired - Lifetime JPH0526755Y2 (en) | 1987-05-19 | 1987-05-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0526755Y2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012224878A (en) * | 2011-04-15 | 2012-11-15 | Nissan Motor Co Ltd | Mechanism for moving workpiece for vapor deposition apparatus, and vapor deposition method using the same |
JP7044627B2 (en) * | 2018-05-08 | 2022-03-30 | 株式会社アルバック | Film forming equipment |
JP2020176326A (en) * | 2019-04-22 | 2020-10-29 | キヤノン電子管デバイス株式会社 | Vacuum deposition apparatus and method for manufacturing vapor deposition film |
-
1987
- 1987-05-19 JP JP7480287U patent/JPH0526755Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS63182536U (en) | 1988-11-24 |
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