JPH0521652A - Semiconductor sealing epoxy resin composition - Google Patents
Semiconductor sealing epoxy resin compositionInfo
- Publication number
- JPH0521652A JPH0521652A JP17208991A JP17208991A JPH0521652A JP H0521652 A JPH0521652 A JP H0521652A JP 17208991 A JP17208991 A JP 17208991A JP 17208991 A JP17208991 A JP 17208991A JP H0521652 A JPH0521652 A JP H0521652A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- marking
- laser
- resin composition
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】炭酸ガスレーザーおよびYAGレ
ーザーのいずれのレーザー捺印装置によっても本発明は
表面に鮮明なマーキングを施すことができる樹脂封止半
導体装置用エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for a resin-sealed semiconductor device, which can make a clear marking on the surface by any laser marking device such as a carbon dioxide laser or a YAG laser.
【0002】[0002]
【従来の技術】近年、環境問題により樹脂封止半導体装
置の捺印は、フロン、塩素系溶剤による前洗浄の必要な
インク捺印からレーザー発振器から発生するレーザー
を、型抜きしたマスクを通し、その光像を前記半導体装
置上に集束して、所定のマーキングを施すか直接レーザ
ービームで半導体装置上に文字を描くレーザー捺印方法
に移行してきている。レーザー捺印方式としては、炭酸
ガスレーザーによるパルス捺印(マスクタイプ)並びに
YAGレーザーによるパルス捺印(マスクタイプ)およ
びスキャン捺印(一筆書き)がある。2. Description of the Related Art In recent years, due to environmental problems, the marking of resin-encapsulated semiconductor devices is carried out by using a freon or an ink marking that requires pre-cleaning with a chlorine-based solvent to emit a laser generated from a laser oscillator through a die-cut mask. There has been a shift to a laser marking method in which an image is focused on the semiconductor device and predetermined marking is performed or a character is directly drawn on the semiconductor device by a laser beam. Laser marking methods include pulse marking with a carbon dioxide gas laser (mask type), pulse marking with a YAG laser (mask type), and scanning marking (one-stroke writing).
【0003】このマーキング方式は、レーザービームの
エネルギーにより樹脂封止半導体装置の表面層を数μm
〜数10μmの深さに破壊して表面を粗面化し、この破
壊部と非破壊部の表面性状の対比によってマーキングと
して視覚的に認識させる方式である。しかしながら、上
記のようなレーザーを用いてマーキングを施す場合、従
来の樹脂封止半導体装置では、上記破壊部と非破壊部と
の対比が必ずしも良好とはならず、従ってインク捺印と
比較してマーキングが鮮明に見えないという様な欠点を
有していた。In this marking method, the surface layer of the resin-sealed semiconductor device is several μm by the energy of the laser beam.
This is a method in which the surface is roughened by breaking to a depth of several tens of μm, and the marking is visually recognized by comparing the surface properties of the broken portion and the non-destructed portion. However, when marking is performed using a laser as described above, in the conventional resin-encapsulated semiconductor device, the comparison between the destructive portion and the non-destructive portion is not always good, and therefore, the marking is more difficult than the ink imprinting. Had a drawback that it could not be seen clearly.
【0004】更に最近の高集積化の動きの中で主流とな
っている低応力封止材料は応力を低減する目的でシリコ
ーン化合物が添加されているため従来材と比較してより
捺印が不鮮明であり視認性の向上が強く望まれている。The low-stress encapsulating material, which has become the mainstream in the recent trend of higher integration, is added with a silicone compound for the purpose of reducing stress, so that the marking is more unclear than the conventional material. There is a strong demand for improved visibility.
【0005】こうした状況の中で視認性の向上のため種
々の検討がなされており、特に着色剤の成分を調整する
ことが有効であることがわかっている。例えば炭酸ガス
レーザー捺印に対してジアゾ系、アジン系染料が視認性
の向上に効果的であるとの特許(例えば特開昭60−1
19760号公報)も出願されている。ところがこうい
った着色剤は炭酸ガスレーザーでは良好な捺印を示して
も、YAGレーザーになると全くレーザーエネルギーを
吸収できず、従って捺印が全く視認できない状態とな
る。これは炭酸ガスレーザーとYAGレーザーのレーザ
ー波長の違いによるものと思われる。Under these circumstances, various studies have been made to improve the visibility, and it has been found that adjusting the components of the colorant is particularly effective. For example, a patent that a diazo dye or an azine dye is effective for improving visibility in carbon dioxide laser marking (for example, JP-A-60-1).
(Japanese Patent No. 19760) has also been filed. However, even if such a colorant shows a good marking with a carbon dioxide laser, it cannot absorb the laser energy at all with a YAG laser, and therefore the marking becomes completely invisible. This seems to be due to the difference in laser wavelength between the carbon dioxide laser and the YAG laser.
【0006】一方、カーボンブラックはYAGレーザー
では良好な捺印を示すが炭酸ガスレーザーになると視認
性が悪い欠点がある。現状では、炭酸ガスレーザー捺印
機とYAGレーザー捺印機両方とも使われている為、ど
ちらのレーザータイプでも視認性の良い半導体封止用エ
ポキシ樹脂組成物の開発が望まれている。上記のように
従来のエポキシ樹脂封止材では炭酸ガスレーザー捺印お
よびYAGレーザー捺印のどちらのレーザータイプでも
良好な視認性を示すものがなかった。On the other hand, carbon black shows a good marking with a YAG laser, but has a drawback that visibility is poor with a carbon dioxide gas laser. At present, both the carbon dioxide gas laser marking machine and the YAG laser marking machine are used. Therefore, it is desired to develop an epoxy resin composition for semiconductor encapsulation which has good visibility with both laser types. As described above, none of the conventional epoxy resin encapsulating materials shows good visibility in both the carbon dioxide laser marking and the YAG laser marking laser types.
【0007】[0007]
【発明が解決しようとする課題】本発明はこのような事
情に鑑みなされたもので、炭酸ガスレーザー捺印機、Y
AGレーザー捺印機のいずれで捺印されても比較的暗い
雰囲気下でも、また樹脂成形部分が灰色、黒色等でもレ
ーザーによるマーキングが明瞭に見える半導体封止用エ
ポキシ樹脂組成物を提供するものである。SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and a carbon dioxide gas laser marking machine, Y
It is intended to provide an epoxy resin composition for semiconductor encapsulation, in which marking can be clearly seen by a laser even when the marking is carried out by any of the AG laser marking machines in a relatively dark atmosphere, and the resin molding portion is gray or black.
【0008】[0008]
【課題を解決するための手段】即ち、本発明は無機充填
剤、エポキシ樹脂、フェノール樹脂、硬化促進剤、シリ
コーン化合物および下記式(1)、(2)、(3)に示
す化合物の混合物からなるアントラキノン系黒色着色剤
を必須成分とし、全体の樹脂組成物中に該アントラキノ
ン系黒色着色剤を0.1〜2.0重量%含有する半導体
封止用エポキシ樹脂組成物である。That is, the present invention comprises an inorganic filler, an epoxy resin, a phenol resin, a curing accelerator, a silicone compound and a mixture of compounds represented by the following formulas (1), (2) and (3). An anthraquinone-based black colorant as an essential component and an epoxy resin composition for semiconductor encapsulation containing 0.1 to 2.0% by weight of the anthraquinone-based black colorant in the entire resin composition.
【0009】[0009]
【化2】 [Chemical 2]
【0010】即ち、エポキシ樹脂組成物としては、従来
から熱硬化性樹脂、特にエポキシ樹脂を主成分とするも
のが広く用いられている。このようなエポキシ樹脂を主
成分とする樹脂組成物は、一般にエポキシ樹脂以外に、
通常、硬化剤、硬化促進剤、充填剤、離型剤が配合さ
れ、必要に応じて難燃剤、着色剤、カップリング剤等が
配合される。上記顔料としては、通常、カーボンブラッ
クやジアゾ染料が用いられている。このような樹脂組成
物を用いて封止して得られる樹脂封止半導体装置では、
先に述べたように炭酸ガス、YAGのいずれのレーザー
においてもレーザー光による半導体装置表面の破壊部と
非破壊部との対比が鮮明とはいえずマーキングが明瞭に
は見えない。That is, as the epoxy resin composition, a thermosetting resin, particularly one containing an epoxy resin as a main component, has been widely used. A resin composition containing such an epoxy resin as a main component generally contains, in addition to the epoxy resin,
Usually, a curing agent, a curing accelerator, a filler, and a release agent are blended, and if necessary, a flame retardant, a coloring agent, a coupling agent and the like are blended. As the pigment, carbon black or diazo dye is usually used. In the resin-sealed semiconductor device obtained by sealing using such a resin composition,
As described above, in both the carbon dioxide gas and YAG lasers, the destructive portion and the non-destructive portion on the surface of the semiconductor device due to the laser beam cannot be said to be clear and the marking cannot be clearly seen.
【0011】本発明者は、レーザー光による半導体装置
表面の破壊部と非破壊部との対比の鮮明さを得ることを
目的として研究を重ねた結果、アントラキノン系着色剤
が大きな影響を及ぼすことをつきとめ、この染料を中心
にさらに研究を重ねた結果、式(1)、(2)、(3)
に示す化合物の混合物からなるアントラキノン系黒色着
色剤(以下、アントラキノン系混合黒色着色剤という)
を用いるといずれのレーザーによるマーキングに際して
も破壊部と非破壊部との対比が鮮明になることを見いだ
した。そしてこれに基づきさらに研究を重ねた結果、樹
脂組成物全体中にアントラキノン系黒色着色剤を0.1
〜2.0重量%(以下、%と略す)含有させることによ
り、特にマーキングの鮮明性が向上し、半導体装置の樹
脂成形部分が灰色、黒色等の有色であっても、また比較
的暗い雰囲気下であってもマーキングが明瞭に認められ
るようになることを見いだし、本発明に到達した。The present inventor has carried out research for the purpose of obtaining a sharp contrast between a destructive portion and a non-destructive portion on the surface of a semiconductor device by laser light, and as a result, it has been found that the anthraquinone colorant has a great influence. As a result of further research focusing on this dye, formulas (1), (2), and (3)
Anthraquinone-based black colorant consisting of a mixture of compounds shown in (hereinafter referred to as anthraquinone-based black colorant)
It was found that the contrast between the destructive part and the non-destructive part becomes clear when marking with any laser. As a result of further research based on this, 0.1% of the anthraquinone-based black colorant was added to the entire resin composition.
The content of up to 2.0% by weight (hereinafter, abbreviated as%) particularly improves the sharpness of the marking, and even if the resin-molded portion of the semiconductor device is colored such as gray or black, it is a relatively dark atmosphere. The inventors have found that the markings can be clearly recognized even underneath and have reached the present invention.
【0012】本発明の封止用エポキシ樹脂組成物はエポ
キシ樹脂、フェノール樹脂、硬化促進剤、シリコーン化
合物および溶融シリカあるいは結晶シリカ等の無機充填
剤、アントラキノン系混合黒色着色剤を必須成分とする
が、これ以外に必要に応じてシランカップリング剤、ブ
ロム化エポキシ樹脂、三酸化アンチモン、ヘキサブロム
ベンゼン等の難燃剤、天然ワックス、合成ワックス等の
離型剤および種々の添加剤を適宜配合しても差し支えが
ない。The encapsulating epoxy resin composition of the present invention contains an epoxy resin, a phenol resin, a curing accelerator, a silicone compound, an inorganic filler such as fused silica or crystalline silica, and an anthraquinone-based mixed black colorant as essential components. In addition, if necessary, a silane coupling agent, a brominated epoxy resin, a flame retardant such as antimony trioxide, hexabromobenzene, a release agent such as a natural wax or a synthetic wax, and various additives are appropriately mixed. There is no problem.
【0013】また、本発明の封止用エポキシ樹脂組成物
を成形材料として製造するには、エポキシ樹脂、フェノ
ール樹脂、硬化促進剤、シリコーン化合物、充填剤、そ
の他添加剤をミキサー等によって十分に均一に混合した
後、更に熱ロールまたはニーダー等で溶融混練し、冷却
後粉砕して成形材料とすることができる。In order to produce the encapsulating epoxy resin composition of the present invention as a molding material, the epoxy resin, the phenol resin, the curing accelerator, the silicone compound, the filler, and other additives are sufficiently homogenized by a mixer or the like. Then, the mixture can be melt-kneaded with a hot roll or a kneader, cooled, and then pulverized to obtain a molding material.
【0014】これらの成形材料は電子部品あるいは電子
部品の封止、被覆、絶縁に適用することができる。本発
明に用いるエポキシ樹脂としては、その分子中にエポキ
シ基を少なくとも2個以上有する化合物であれば分子構
造、分子量などは特に制限はなく、一般に封止用材料と
して使用されているものであり、例えばビスフェノール
A型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、
ビスフェノールS型エポキシ樹脂、フェノールノボラッ
ク型エポキシ樹脂、クレゾールノボラック型エポキシ樹
脂、脂環式エポキシ型エポキシ樹脂、グリシジルエステ
ル型エポキシ樹脂、ジグリシジルアミン型エポキシ樹
脂、イソシアヌレート型エポキシ樹脂、ビスフェノール
AまたはビスフェノールFとホルムアルデヒドの重縮合
物グリシジルエーテル化物およびそれらのハロゲン化
物、水素添加物などが挙げられ、これらは単独もしくは
2種以上混合して用いても差し支えない。These molding materials can be applied to electronic parts or sealing, coating and insulation of electronic parts. The epoxy resin used in the present invention is not particularly limited in molecular structure, molecular weight and the like as long as it is a compound having at least two epoxy groups in its molecule, and it is generally used as a sealing material, For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin,
Bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, alicyclic epoxy type epoxy resin, glycidyl ester type epoxy resin, diglycidyl amine type epoxy resin, isocyanurate type epoxy resin, bisphenol A or bisphenol F Examples thereof include glycidyl ether compounds of polycondensation products of and formaldehyde, and their halides and hydrogenated compounds. These may be used alone or in combination of two or more.
【0015】また、硬化剤のフェノール樹脂としては、
ノボラック型フェノール樹脂系およびこれらの変性樹脂
であり、例えばフェノールノボラック、O−クレゾール
ノボラックの他アルキル変性したフェノールノボラック
樹脂等が挙げられ、これらは単独もしくは2種以上混合
して使用しても差し支えがない。Further, as a phenol resin as a curing agent,
Examples of the novolak type phenol resin system and modified resins thereof include phenol novolac, O-cresol novolac, and alkyl-modified phenol novolac resin. These may be used alone or in combination of two or more kinds. Absent.
【0016】エポキシ樹脂と硬化剤の配合比はエポキシ
樹脂のエポキシ基と硬化剤の水酸基との当量比が0.5
〜5の範囲内にあることが望ましい。当量比が0.5未
満または5を超えたものは耐湿性、成形作業性および硬
化物の電気特性が悪くなるので好ましくない。The compounding ratio of the epoxy resin and the curing agent is such that the equivalent ratio of the epoxy group of the epoxy resin and the hydroxyl group of the curing agent is 0.5.
It is desirable to be in the range of -5. If the equivalent ratio is less than 0.5 or exceeds 5, moisture resistance, molding workability, and electrical characteristics of the cured product deteriorate, which is not preferable.
【0017】本発明に使用される硬化促進剤はエポキシ
基とフェノール性水酸基との反応を促進するものであれ
ば良く、一般に封止用材料に使用されているものを広く
使用することができ、例えばジアザビシクロウンデセン
(DBU)、トリフェニルホスフィン(TPP)、ジメ
チルベンジルアミン(BDMA)や2メチルイミダゾー
ル(2MZ)等が単独もしくは2種以上混合して用いら
れる。The curing accelerator used in the present invention may be any one as long as it accelerates the reaction between the epoxy group and the phenolic hydroxyl group, and those generally used for sealing materials can be widely used. For example, diazabicycloundecene (DBU), triphenylphosphine (TPP), dimethylbenzylamine (BDMA), 2-methylimidazole (2MZ) and the like are used alone or in combination of two or more.
【0018】本発明に用いられる充填材は、溶融シリ
カ、結晶シリカ、アルミナ、窒化珪素、酸化マグネシウ
ム等が挙げられ、これは単独もしくは2種以上混合して
使用しても差し支えない。シリコーン化合物としてはシ
リコーンオイル、シリコーンゴム、シリコーンゲル等が
挙げられ単独もしくは2種以上混合して使用してもかま
わずエポキシ樹脂組成物中に低応力性を賦与するため配
合される。着色剤としてはアントラキノン系混合黒色着
色剤が用いられるが、この着色剤は式(1)、(2)、
(3)に示される3種の化合物を含む微粉末の染料混合
物である。Examples of the filler used in the present invention include fused silica, crystalline silica, alumina, silicon nitride and magnesium oxide, which may be used alone or in combination of two or more. Examples of the silicone compound include silicone oil, silicone rubber, and silicone gel, which may be used alone or in admixture of two or more, and are added to impart low stress to the epoxy resin composition. Anthraquinone-based mixed black colorant is used as the colorant, and this colorant has the formula (1), (2),
It is a fine powder dye mixture containing the three compounds shown in (3).
【0019】このアントラキノン系混合黒色着色剤は組
成物全体中に0.1〜2.0%、さらに好ましくは0.
3〜1.5%含有されるのが良い。即ち、このアントラ
キノン系混合黒色着色剤の添加量が0.1%未満のとき
は、破壊部と非破壊部との対比が鮮明でなくなり、逆に
2%を超えるときには樹脂封止された半導体装置の信頼
性(耐湿性)が低下する等の欠点を生じるからである。
特にこのアントラキノン系混合黒色着色剤の含有量を
0.3〜1.5%に設定するときにマーキングが著しく
鮮明となる。アントラキノン系混合黒色着色剤は式
(1)、(2)、(3)のいずれの化合物をも5重量%
含有する必要がある。1種類の化合物でも5重量%未満
だと所望の黒色度が得られない。なお、上記着色剤と共
に、従来から樹脂組成物に添加される着色剤、例えばカ
ーボンブラック等を用いても差し支えない。このよう
に、着色剤としてこのアントラキノン系混合黒色着色剤
を用いることが、本発明の大きな特徴であり、これによ
って比較的暗い雰囲気下や樹脂成形部分が灰色、黒色等
であっても明瞭なマーキングがなされるようになるので
ある。This anthraquinone-based mixed black colorant is contained in the composition in an amount of 0.1 to 2.0%, more preferably 0.1.
It is better to contain 3 to 1.5%. That is, when the amount of this anthraquinone-based mixed black colorant added is less than 0.1%, the contrast between the destructive portion and the non-destructive portion becomes unclear, and conversely, when the amount exceeds 2%, the resin-encapsulated semiconductor device. This is because it causes a defect such as a decrease in reliability (moisture resistance).
In particular, when the content of the anthraquinone-based mixed black colorant is set to 0.3 to 1.5%, the marking becomes remarkably clear. The anthraquinone-based mixed black colorant contains 5% by weight of any of the compounds of formulas (1), (2) and (3).
Must be included. Even if one kind of compound is less than 5% by weight, desired blackness cannot be obtained. In addition to the above colorant, a colorant conventionally added to the resin composition, such as carbon black, may be used. As described above, the use of this anthraquinone-based mixed black colorant as a colorant is a major feature of the present invention, which allows clear marking even in a relatively dark atmosphere or when the resin molding portion is gray or black. Will be done.
【0020】以下、本発明を実施例で具体的に示す。The present invention will be specifically described below with reference to examples.
【0021】[0021]
【実施例】実施例1 溶融シリカ 68.0 重量部 O−クレゾールノボラックエポキシ樹脂 16.0 重量部 (エポキシ当量200、軟化点65℃) フェノールノボラック樹脂 9.0 重量部 (OH当量104、軟化点100℃) ブロム化ビスフェノールA型エポキシ樹脂 1.7 重量部 (Br含有量46%、エポキシ当量360) DBU 0.2 重量部 三酸化アンチモン 1.7 重量部 カルノバワックス 0.3 重量部 シリコーンオイル 3.0 重量部 (SF−8413、東レ・ダウコーニンダ・シリコーン) γ−グリシドメトキシシラン 0.8 重量部 アントラキノン系混合黒色着色剤 0.15 重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕し成形材料とした。Example 1 Fused silica 68.0 parts by weight O-cresol novolac epoxy resin 16.0 parts by weight (epoxy equivalent 200, softening point 65 ° C.) phenol novolac resin 9.0 parts by weight (OH equivalent 104, softening point 100 ° C.) brominated bisphenol A type epoxy resin 1.7 parts by weight (Br content 46%, epoxy equivalent 360) DBU 0.2 parts by weight Antimony trioxide 1.7 parts by weight Carnova wax 0.3 parts by weight Silicone oil 3.0 parts by weight (SF-8413, Toray Dow Corninda Silicone) 0.8 parts by weight of γ-glycidmethoxysilane 0.15 parts by weight of anthraquinone-based mixed black colorant were mixed at room temperature with a mixer, kneaded at 70 to 100 ° C. with a biaxial roll, cooled, and ground to obtain a molding material.
【0022】得られた成形材料をタブレット化し、低圧
トランスファー成形機にて175℃、70kg/cm2 、1
20秒の条件で16pDIPパッケージに封止し175℃、
8時間の条件でポストキュアー後、レーザー捺印し視認
性を21ステップセンシビティーガイドにて評価した。The obtained molding material was made into tablets, which were then transferred to a low-pressure transfer molding machine at 175 ° C., 70 kg / cm 2 , 1
Sealed in a 16p DIP package under the condition of 20 seconds, 175 ℃,
After post-curing under the condition of 8 hours, laser marking was performed and the visibility was evaluated using a 21-step sensitivity guide.
【0023】なお、レーザー捺印機としてはルモニクス
製炭酸ガスレーザーマーク940型およびNEC製YA
GレーザーマークSL−476Aを使用した。As a laser marking machine, carbon dioxide gas laser mark 940 type manufactured by Lumonix and YA manufactured by NEC are used.
G laser mark SL-476A was used.
【0024】実施例2〜4 アントラキノン系混合黒色着色剤の配合量を変えた以外
は実施例1と同一配合とし実施例1と同様にして成形材
料を得て、この成形材料で試験用の成形品を作成し、レ
ーザー捺印試験を行った。試験結果を表1に示す。Examples 2 to 4 A molding material was obtained in the same manner as in Example 1 except that the compounding amount of the anthraquinone-based black colorant was changed. A product was prepared and a laser marking test was conducted. The test results are shown in Table 1.
【0025】比較例1〜4 表2に示す配合割合で実施例1と同様にして樹脂組成物
を作製し、同様に試験した。その結果を表2に示す。Comparative Examples 1 to 4 Resin compositions were prepared in the same manner as in Example 1 with the compounding ratios shown in Table 2 and tested in the same manner. The results are shown in Table 2.
【0026】[0026]
【表1】 [Table 1]
【0027】[0027]
【表2】 [Table 2]
【0028】[0028]
【発明の効果】本発明によると被覆モールドされる樹脂
封止半導体装置はレーザー光によるマーキング形成に際
して樹脂成形部が、灰色、黒色等であっても、また薄暗
い雰囲気下であっても明瞭に識別できるマーキングを施
しうるようになり、マーキングの鮮明度の大幅な向上を
実現できる。According to the present invention, the resin-encapsulated semiconductor device to be covered and molded can be clearly identified even when the resin-molded portion is gray, black, or the like, or in a dim atmosphere when the marking is formed by laser light. Marking that can be done will be possible, and the sharpness of marking will be greatly improved.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C08K 5/16 NLB 7167−4J C08L 63/00 NKB 8416−4J ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location C08K 5/16 NLB 7167-4J C08L 63/00 NKB 8416-4J
Claims (1)
樹脂、硬化促進剤、シリコーン化合物および下記式
(1)、(2)、(3)に示す化合物の混合物からなる
アントラキノン系黒色着色剤を必須成分とし、全体の樹
脂組成物中に該アントラキノン系黒色着色剤を0.1〜
2.0重量%含有することを特徴とする半導体封止用エ
ポキシ樹脂組成物。 【化1】 Claims: 1. An anthraquinone system comprising an inorganic filler, an epoxy resin, a phenol resin, a curing accelerator, a silicone compound and a mixture of compounds represented by the following formulas (1), (2) and (3). The black colorant is an essential component, and the anthraquinone-based black colorant is contained in the entire resin composition in an amount of 0.1 to 0.1%.
An epoxy resin composition for semiconductor encapsulation, comprising 2.0% by weight. [Chemical 1]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3172089A JP2598585B2 (en) | 1991-07-12 | 1991-07-12 | Epoxy resin composition for semiconductor encapsulation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3172089A JP2598585B2 (en) | 1991-07-12 | 1991-07-12 | Epoxy resin composition for semiconductor encapsulation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0521652A true JPH0521652A (en) | 1993-01-29 |
JP2598585B2 JP2598585B2 (en) | 1997-04-09 |
Family
ID=15935342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3172089A Expired - Fee Related JP2598585B2 (en) | 1991-07-12 | 1991-07-12 | Epoxy resin composition for semiconductor encapsulation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2598585B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002249640A (en) * | 2001-02-22 | 2002-09-06 | Toray Ind Inc | Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor |
WO2008126825A1 (en) * | 2007-04-10 | 2008-10-23 | Sumitomo Bakelite Co., Ltd. | Resin composition, prepreg, laminated board, multilayer printed wiring board and semiconductor device |
JP2009249392A (en) * | 2008-04-01 | 2009-10-29 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing and electronic parts device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61264018A (en) * | 1985-05-17 | 1986-11-21 | Denki Kagaku Kogyo Kk | Epoxy resin composition |
JPS6255950A (en) * | 1985-09-05 | 1987-03-11 | Matsushita Electric Works Ltd | Molding material for sealing |
JPS6257425A (en) * | 1985-09-05 | 1987-03-13 | Matsushita Electric Works Ltd | Production of molding material for sealing |
JPS62169846A (en) * | 1986-01-22 | 1987-07-27 | Matsushita Electric Works Ltd | Sealing resin composition |
-
1991
- 1991-07-12 JP JP3172089A patent/JP2598585B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61264018A (en) * | 1985-05-17 | 1986-11-21 | Denki Kagaku Kogyo Kk | Epoxy resin composition |
JPS6255950A (en) * | 1985-09-05 | 1987-03-11 | Matsushita Electric Works Ltd | Molding material for sealing |
JPS6257425A (en) * | 1985-09-05 | 1987-03-13 | Matsushita Electric Works Ltd | Production of molding material for sealing |
JPS62169846A (en) * | 1986-01-22 | 1987-07-27 | Matsushita Electric Works Ltd | Sealing resin composition |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002249640A (en) * | 2001-02-22 | 2002-09-06 | Toray Ind Inc | Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor |
JP4736203B2 (en) * | 2001-02-22 | 2011-07-27 | 住友ベークライト株式会社 | Resin-encapsulated semiconductor device and epoxy resin composition for encapsulating semiconductor |
WO2008126825A1 (en) * | 2007-04-10 | 2008-10-23 | Sumitomo Bakelite Co., Ltd. | Resin composition, prepreg, laminated board, multilayer printed wiring board and semiconductor device |
JPWO2008126825A1 (en) * | 2007-04-10 | 2010-07-22 | 住友ベークライト株式会社 | Resin composition, prepreg, laminate, multilayer printed wiring board, and semiconductor device |
US8294268B2 (en) | 2007-04-10 | 2012-10-23 | Sumitomo Bakelite Company, Ltd. | Resin composition, prepreg, laminated board, multilayer printed wiring board and semiconductor device |
JP5293598B2 (en) * | 2007-04-10 | 2013-09-18 | 住友ベークライト株式会社 | Resin composition, prepreg, laminate, multilayer printed wiring board, and semiconductor device |
JP2009249392A (en) * | 2008-04-01 | 2009-10-29 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing and electronic parts device |
Also Published As
Publication number | Publication date |
---|---|
JP2598585B2 (en) | 1997-04-09 |
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