JPS6257425A - Production of molding material for sealing - Google Patents
Production of molding material for sealingInfo
- Publication number
- JPS6257425A JPS6257425A JP60196564A JP19656485A JPS6257425A JP S6257425 A JPS6257425 A JP S6257425A JP 60196564 A JP60196564 A JP 60196564A JP 19656485 A JP19656485 A JP 19656485A JP S6257425 A JPS6257425 A JP S6257425A
- Authority
- JP
- Japan
- Prior art keywords
- dye
- resin
- molding material
- sealing
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は電気部品や電子部品を封止する樹脂モールド晶
に主として用いられる封止用成形材料の製造方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for manufacturing a molding material for sealing, which is mainly used for resin molded crystals for sealing electrical and electronic parts.
〔背景技術]
電気、電子部品を外部環境から保護し、部品の高性能化
、信頼性向上を計るため樹脂による被覆、封止が施され
ており、近年その生産激は1加しつつある。これらの部
品は注型、含浸、シール、成形等の方法で封止した後%
製品名、番号等を必要に応じてマーキングすることが通
常行なわれている。従来この方法にはインクを用すた印
刷が採用され、近年はレーザービームによるマーキング
が採用されつつある。前者の方法は印刷方法やインクの
乾燥性等からみて能率がやや悪く、特に注型、含浸等で
封止された樹脂封止型電子部品の表面は必ずしも表面が
平滑でなく特に印刷に手間がかかったりマークが消滅す
ることもあった。後者の方法はマーキング効率が高論た
め近年益々研兄が盛んである。しかしマーキングが不鮮
明で識別が困難な場合が多かった。[Background Art] Electrical and electronic components are coated and sealed with resin in order to protect them from the external environment and improve their performance and reliability, and their production has been increasing rapidly in recent years. After these parts are encapsulated by methods such as casting, impregnation, sealing, molding, etc.
It is common practice to mark the product name, number, etc. as necessary. Conventionally, printing using ink has been employed for this method, and in recent years, marking using a laser beam has been increasingly employed. The former method is somewhat inefficient in terms of the printing method and drying properties of the ink, and in particular, the surface of resin-sealed electronic components sealed by casting, impregnation, etc. is not necessarily smooth and requires particular effort to print. There were times when the mark would disappear or the mark would disappear. The latter method has been studied more and more in recent years because of its high marking efficiency. However, the markings were often unclear and difficult to identify.
[発明の目的〕
本発明の目的とするところはマーキング後の識別が容易
な樹脂封止型電子部品の得られる封止用成形材料の製造
方法を提供することにある。[Object of the Invention] An object of the present invention is to provide a method for manufacturing a molding material for sealing, which allows resin-sealed electronic components to be easily identified after marking.
本発明は合成樹脂と染料を予じめ加熱溶融混合した後、
離型剤、カップリング剤、充填剤、更に必要に応じて架
橋剤、硬化剤、硬化促進剤を添加し混合、混線、粉砕し
必要に応じて造粒することを特徴とする封止用成形材料
の製造方法のため、成形後は成形品表面に染料が均一に
配位され、レーザービームを吸収し、マーキングが鮮明
になりマーキング後の識別が容易になるもので、以下本
発明の詳細な説明する。In the present invention, after heating and melting the synthetic resin and the dye,
Molding for sealing characterized by adding a mold release agent, a coupling agent, a filler, and further a crosslinking agent, a curing agent, and a curing accelerator as necessary, mixing, mixing, crushing, and granulating as necessary. Due to the manufacturing method of the material, the dye is uniformly distributed on the surface of the molded product after molding, absorbing the laser beam, and making the marking clear and easy to identify after marking.The details of the present invention are as follows. explain.
本発明に用りる染料は好ましくは塩素イオンの含有量が
0.1係以下で且つアゾ糸染料、ニグロシン系染料、ア
ントラキノン系染料から選ばれた少くとも1種類の染料
であることが望まし論。塩素イオン含有量がO,tSを
こえると樹脂封止型電子部品の耐湿信頼性が低下するか
らである。染料は上記3系統のものから所要数を選択し
て用することができ組合せて用いることもできる。上記
染料の使用量は全体社の0.01〜20 %であること
が望まし込、即ち0.01%未満ではマーキングが不鮮
明になる傾向にあり、2部%をこえると樹脂封止電子部
品の耐湿信頼性が低下する傾向にあるからである。封止
用成形材料の樹脂としては、フェノール樹脂、エポキシ
樹脂、不飽和ポリエステル樹脂、ジアリルフタレート樹
脂、アクリル樹脂、ポリイミド樹脂、ポリアミド樹脂、
ポリアミドイミド樹脂、ポリスルフォン樹脂、ポリフェ
ニレンサルファイド樹脂、ポリフェニレンオキサイド樹
脂、ポリブチレンテレフタレート樹脂、ポリエチレンテ
レフタレート樹脂、弗素樹脂、yリコン樹脂等の凰独、
混合物、変性物のように合成樹脂全般を用−ることがで
きる、充填剤としては溶融シリカ、結晶y IJ力、ガ
ラス繊維、硅酸カルシウム、炭酸カルシウム、アルミナ
、りV+、三酸化アンチモン、硫酸バリウム、窒化ホウ
素、炭化ケイ素等の熱伝導性のよ込無機充填剤全般を用
いることができ特に限定するものではないが好ましくは
粒子径200ミクロン以下であることが望ましい。樹脂
、染料、充填剤以外の添加剤としては離型剤、力・フプ
リング剤等に加え、更に必要に応じて架橋剤、硬化剤、
硬化促進剤等を添加するものである。製造方法としては
先ず上記の樹脂と上記の染料を予じめ加熱溶融混合した
後、離型剤、カリブリング剤、充填剤、更に必要に応じ
て架橋剤、硬化剤、硬化促進剤を添加し混合、混練、粉
砕し必侠に応じて造粒し封止用成形材料を得るものであ
る。この際、加熱溶融混合の温度は好ましくは樹脂の軟
化点より20℃以上高温であることがより均一に加熱溶
融混合することができ望ましいことである。The dye used in the present invention preferably has a chlorine ion content of 0.1 or less and is preferably at least one type of dye selected from azo yarn dyes, nigrosine dyes, and anthraquinone dyes. Theory. This is because when the chlorine ion content exceeds O, tS, the moisture resistance reliability of the resin-sealed electronic component decreases. The required number of dyes can be selected from the above three systems, and can also be used in combination. It is desirable that the amount of the above dye used is 0.01 to 20% of the entire company.In other words, if it is less than 0.01%, the marking tends to become unclear, and if it exceeds 2%, it is used for resin-sealed electronic parts. This is because the moisture resistance reliability of the materials tends to decrease. Resins for molding materials for sealing include phenolic resin, epoxy resin, unsaturated polyester resin, diallyl phthalate resin, acrylic resin, polyimide resin, polyamide resin,
Polyamide-imide resin, polysulfone resin, polyphenylene sulfide resin, polyphenylene oxide resin, polybutylene terephthalate resin, polyethylene terephthalate resin, fluororesin, ylicon resin, etc.
All synthetic resins can be used, such as mixtures and modified products. Fillers include fused silica, crystalline IJ, glass fiber, calcium silicate, calcium carbonate, alumina, RI V+, antimony trioxide, and sulfuric acid. Any type of thermally conductive loaded inorganic filler such as barium, boron nitride, silicon carbide, etc. can be used, and is not particularly limited, but preferably the particle size is 200 microns or less. Additives other than resins, dyes, and fillers include mold release agents, strength and flapping agents, and, if necessary, crosslinking agents, curing agents,
A curing accelerator and the like are added. The manufacturing method is to first heat and melt mix the above resin and the above dye, and then add a mold release agent, a calibrating agent, a filler, and further a crosslinking agent, a curing agent, and a curing accelerator as necessary. A molding material for sealing is obtained by mixing, kneading, pulverizing, and granulating as required. At this time, it is preferable that the temperature of heating and melting mixing is 20° C. or more higher than the softening point of the resin, as this enables more uniform heating and melting mixing.
更に該成形材料の成形については、トランスファー成形
、封止成形等によるトランジスター、ダイオード、コン
デンサー、フィルター、整rAt h 、抵抗体、コイ
ル等の電子部品の多数個取り成形に適することに勿論、
圧縮成形等にも適用できるものである。以下本発明を実
施例にもとすいて詳細に説明する。Furthermore, regarding the molding of the molding material, it is of course suitable for multi-cavity molding of electronic components such as transistors, diodes, capacitors, filters, resistors, coils, etc. by transfer molding, sealing molding, etc.
It can also be applied to compression molding, etc. The present invention will be described in detail below using examples.
実施例
エポキシ& 711 jエポキシ当k 220 *軟化
点80℃のノボラック型エポキシ樹脂)115重量部(
以下朧に部と記す)と塩素イオン@f蓋0.04M1J
係(以下車にチと記す)のアゾ系染料5部とをニーダ−
に入れ110℃で30分間加熱溶溶融金して均一混合物
を得た0次に該加熱溶融混合切120部に対し、フェノ
ールノボラックjili脂(水酸基当7104、軟化点
87℃)50部、溶融シリカ450部、2メチルイミダ
ゾ一ル1部、カルナウバワックス2部、三酸化アン千モ
ン20部、カリプリング剤3部を加え加熱ロールで混合
、混練後、粉砕して封止用成形材料を得、トランスファ
ー成形機を用いて金型温度175℃、成形圧力so’v
’d%硬化時間3分の条件で電子部品を封止成形した仮
、レーサービームで品名をレーザーマーキングした。Example epoxy & 711 j epoxy k 220 *novolac type epoxy resin with a softening point of 80°C) 115 parts by weight (
(Hereinafter referred to as part) and chlorine ion @f lid 0.04M1J
In a kneader, add 5 parts of azo dye (hereinafter referred to as "Chi").
To 120 parts of the heated and melted mixture obtained by heating and melting at 110°C for 30 minutes, 50 parts of phenol novolac resin (7104 hydroxyl group, softening point 87°C) and fused silica were added. Add 450 parts, 1 part of 2-methyl imidazole, 2 parts of carnauba wax, 20 parts of ammonium trioxide, and 3 parts of calipling agent, mix with heated rolls, knead, and crush to obtain a molding material for sealing. Using a transfer molding machine, the mold temperature was 175°C and the molding pressure was so'v.
The electronic parts were encapsulated and molded under the conditions of 'd% curing time of 3 minutes, and the product name was laser marked with a laser beam.
比較例1
実施例のエポキシ樹脂、アゾ糸染料、フェノールノボラ
ック4mM、fd融フシリカ2メ千ルイミダゾール、カ
ルナウバワ噌りス、三酸化アンチモン、カップリング剤
を配合量のみは実施例と同様にして、配合物を全て一度
にロールで混合、混練後、粉砕して封止用成形材料を得
、実施例と同様に封止成形した後、レーザービームで品
名をレーザーマーキングした。Comparative Example 1 The epoxy resin, azo dye, phenol novolac 4mM, fd fused fusilica 2mthyl imidazole, carnauba wax, antimony trioxide, and coupling agent were mixed in the same amounts as in the example, The mixture was mixed and kneaded all at once with a roll, and then pulverized to obtain a molding material for sealing. After sealing and molding was carried out in the same manner as in the example, the product name was laser marked with a laser beam.
比較例2
比較例1のアゾ系染料5部をカーボンプラ、4.り5部
に変えた以外は比較例1と同様に処理して封止用成形材
料を得、比較例1と同様に封止成形した後、レーザービ
ームで品名をレーザーマーキングした。Comparative Example 2 5 parts of the azo dye of Comparative Example 1 was added to carbon plastic, 4. A molding material for sealing was obtained by processing in the same manner as in Comparative Example 1, except that the amount was changed to 5 parts, and after sealing molding was carried out in the same manner as in Comparative Example 1, the product name was laser marked with a laser beam.
〔発明の効1果]
実施例と比較例1及び2の成形品のマーキング後の識別
の容易さ及び16 D I Pモデル素子封止成形品の
耐湿信頼性は第2表で明白なように本発明の封止用成形
材料から得られた封止成形品の性能はよぐ本発明の優れ
ていることを確認した。[Effect 1 of the invention] As is clear from Table 2, the ease of identification after marking of the molded products of Example and Comparative Examples 1 and 2 and the moisture resistance reliability of the 16 D I P model element sealed molded products It was confirmed that the performance of the encapsulated molded product obtained from the encapsulating molding material of the present invention was excellent.
Claims (3)
型剤、カップリング剤、充填剤、更に必要に応じて架橋
剤、硬化剤、硬化促進剤を添加し混合、混練、粉砕し必
要に応じて造粒することを特徴とする封止用成形材料の
製造方法。(1) After heat-melting and mixing the synthetic resin and dye in advance, a mold release agent, a coupling agent, a filler, and if necessary, a crosslinking agent, a curing agent, and a curing accelerator are added, followed by mixing, kneading, and pulverization. A method for producing a molding material for sealing, characterized in that the molding material is granulated as necessary.
上高温であることを特徴とする特許請求の範囲第1項記
載の封止用成形材料の製造方法。(2) The method for producing a molding material for sealing according to claim 1, wherein the temperature of heating and melting and mixing is 20° C. or more higher than the softening point of the resin.
染料、ニグロシン系染料、アントラキノン系染料から選
ばれた少くとも1種類の染料であることを特徴とする特
許請求の範囲第1項、第2項記載の樹脂封止用成形材料
の製造方法。(3) Claim 1, characterized in that the dye is at least one type of dye selected from azo dyes, nigrosine dyes, and anthraquinone dyes with a chlorine ion content of 0.1% by weight or less. 2. A method for producing a molding material for resin sealing according to item 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60196564A JPS6257425A (en) | 1985-09-05 | 1985-09-05 | Production of molding material for sealing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60196564A JPS6257425A (en) | 1985-09-05 | 1985-09-05 | Production of molding material for sealing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6257425A true JPS6257425A (en) | 1987-03-13 |
Family
ID=16359828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60196564A Pending JPS6257425A (en) | 1985-09-05 | 1985-09-05 | Production of molding material for sealing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6257425A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0264159A (en) * | 1988-08-30 | 1990-03-05 | Dainippon Ink & Chem Inc | Polyphenylene sulfide resin composition |
JPH0521652A (en) * | 1991-07-12 | 1993-01-29 | Sumitomo Bakelite Co Ltd | Semiconductor sealing epoxy resin composition |
US5373252A (en) * | 1990-02-21 | 1994-12-13 | Sankyo Seiki Mfg. Co., Ltd. | Circuit for preventing saturation of a transistor |
-
1985
- 1985-09-05 JP JP60196564A patent/JPS6257425A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0264159A (en) * | 1988-08-30 | 1990-03-05 | Dainippon Ink & Chem Inc | Polyphenylene sulfide resin composition |
US5373252A (en) * | 1990-02-21 | 1994-12-13 | Sankyo Seiki Mfg. Co., Ltd. | Circuit for preventing saturation of a transistor |
JPH0521652A (en) * | 1991-07-12 | 1993-01-29 | Sumitomo Bakelite Co Ltd | Semiconductor sealing epoxy resin composition |
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