JP2009249392A - Epoxy resin molding material for sealing and electronic parts device - Google Patents
Epoxy resin molding material for sealing and electronic parts device Download PDFInfo
- Publication number
- JP2009249392A JP2009249392A JP2008094934A JP2008094934A JP2009249392A JP 2009249392 A JP2009249392 A JP 2009249392A JP 2008094934 A JP2008094934 A JP 2008094934A JP 2008094934 A JP2008094934 A JP 2008094934A JP 2009249392 A JP2009249392 A JP 2009249392A
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- JP
- Japan
- Prior art keywords
- group
- epoxy resin
- molding material
- sealing
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 154
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 152
- 239000012778 molding material Substances 0.000 title claims abstract description 63
- 238000007789 sealing Methods 0.000 title claims abstract description 57
- XUMBMVFBXHLACL-UHFFFAOYSA-N Melanin Chemical compound O=C1C(=O)C(C2=CNC3=C(C(C(=O)C4=C32)=O)C)=C2C4=CNC2=C1C XUMBMVFBXHLACL-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 229920005989 resin Polymers 0.000 claims description 36
- 239000011347 resin Substances 0.000 claims description 36
- 239000005011 phenolic resin Substances 0.000 claims description 28
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 21
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 16
- BLDLRWQLBOJPEB-UHFFFAOYSA-N 2-(2-hydroxyphenyl)sulfanylphenol Chemical compound OC1=CC=CC=C1SC1=CC=CC=C1O BLDLRWQLBOJPEB-UHFFFAOYSA-N 0.000 claims description 10
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 claims description 10
- 229920003986 novolac Polymers 0.000 claims description 9
- 239000004305 biphenyl Substances 0.000 claims description 8
- 235000010290 biphenyl Nutrition 0.000 claims description 8
- 239000000049 pigment Substances 0.000 claims description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 7
- 241000238366 Cephalopoda Species 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- 238000013329 compounding Methods 0.000 claims description 2
- 239000004020 conductor Substances 0.000 abstract description 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- -1 epichlorohydrin Glycidyl ester Chemical class 0.000 description 63
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 49
- 238000002156 mixing Methods 0.000 description 23
- 125000003710 aryl alkyl group Chemical group 0.000 description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 21
- 125000000547 substituted alkyl group Chemical group 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 17
- 125000000217 alkyl group Chemical group 0.000 description 16
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 13
- 125000003118 aryl group Chemical group 0.000 description 11
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 11
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 150000002989 phenols Chemical class 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N 1H-imidazole Chemical compound C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- 150000004756 silanes Chemical class 0.000 description 7
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 6
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 239000003086 colorant Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000004898 kneading Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 239000011295 pitch Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 4
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 4
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 125000000732 arylene group Chemical group 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 3
- 125000006725 C1-C10 alkenyl group Chemical group 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000004103 aminoalkyl group Chemical group 0.000 description 3
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 3
- 150000004056 anthraquinones Chemical class 0.000 description 3
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 239000013065 commercial product Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000002184 metal Chemical class 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000012860 organic pigment Substances 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 2
- NADHCXOXVRHBHC-UHFFFAOYSA-N 2,3-dimethoxycyclohexa-2,5-diene-1,4-dione Chemical compound COC1=C(OC)C(=O)C=CC1=O NADHCXOXVRHBHC-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
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- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- 229960003237 betaine Drugs 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
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- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
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- 238000001816 cooling Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 150000007973 cyanuric acids Chemical class 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000001023 inorganic pigment Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
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- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- HTDKEJXHILZNPP-UHFFFAOYSA-N dioctyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OCCCCCCCC HTDKEJXHILZNPP-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- VTIXMGZYGRZMAW-UHFFFAOYSA-N ditridecyl hydrogen phosphite Chemical compound CCCCCCCCCCCCCOP(O)OCCCCCCCCCCCCC VTIXMGZYGRZMAW-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- ZVJXKUWNRVOUTI-UHFFFAOYSA-N ethoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OCC)C1=CC=CC=C1 ZVJXKUWNRVOUTI-UHFFFAOYSA-N 0.000 description 1
- HHBOIIOOTUCYQD-UHFFFAOYSA-N ethoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(C)CCCOCC1CO1 HHBOIIOOTUCYQD-UHFFFAOYSA-N 0.000 description 1
- WUOIAOOSKMHJOV-UHFFFAOYSA-N ethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CC)C1=CC=CC=C1 WUOIAOOSKMHJOV-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- HKIOYBQGHSTUDB-UHFFFAOYSA-N folpet Chemical group C1=CC=C2C(=O)N(SC(Cl)(Cl)Cl)C(=O)C2=C1 HKIOYBQGHSTUDB-UHFFFAOYSA-N 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- WTFXARWRTYJXII-UHFFFAOYSA-N iron(2+);iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Fe+2].[Fe+3].[Fe+3] WTFXARWRTYJXII-UHFFFAOYSA-N 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 239000002931 mesocarbon microbead Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- BKXVGDZNDSIUAI-UHFFFAOYSA-N methoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OC)C1=CC=CC=C1 BKXVGDZNDSIUAI-UHFFFAOYSA-N 0.000 description 1
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 description 1
- OOKUSURYFNISKZ-UHFFFAOYSA-N methyl 3-(3-triethoxysilylpropylamino)propanoate Chemical compound CCO[Si](OCC)(OCC)CCCNCCC(=O)OC OOKUSURYFNISKZ-UHFFFAOYSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- GVYLCNUFSHDAAW-UHFFFAOYSA-N mirex Chemical compound ClC12C(Cl)(Cl)C3(Cl)C4(Cl)C1(Cl)C1(Cl)C2(Cl)C3(Cl)C4(Cl)C1(Cl)Cl GVYLCNUFSHDAAW-UHFFFAOYSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 235000013872 montan acid ester Nutrition 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- VSIWSTHJGCRNLN-UHFFFAOYSA-N n,n-dimethyl-3-(3-triethoxysilylpropylamino)propanamide Chemical compound CCO[Si](OCC)(OCC)CCCNCCC(=O)N(C)C VSIWSTHJGCRNLN-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N protonated dimethyl amine Natural products CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- KNYWDHFOQZZIDQ-UHFFFAOYSA-N trimethoxy-(2-trimethoxysilylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1[Si](OC)(OC)OC KNYWDHFOQZZIDQ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- NLSXASIDNWDYMI-UHFFFAOYSA-N triphenylsilanol Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(O)C1=CC=CC=C1 NLSXASIDNWDYMI-UHFFFAOYSA-N 0.000 description 1
- IDXDWPWXHTXJMZ-UHFFFAOYSA-N tris(2,4,6-trimethylphenyl)phosphane Chemical compound CC1=CC(C)=CC(C)=C1P(C=1C(=CC(C)=CC=1C)C)C1=C(C)C=C(C)C=C1C IDXDWPWXHTXJMZ-UHFFFAOYSA-N 0.000 description 1
- XDHRVAHAGMMFMC-UHFFFAOYSA-N tris(2,4-dimethylphenyl)phosphane Chemical compound CC1=CC(C)=CC=C1P(C=1C(=CC(C)=CC=1)C)C1=CC=C(C)C=C1C XDHRVAHAGMMFMC-UHFFFAOYSA-N 0.000 description 1
- RERMPCBBVZEPBS-UHFFFAOYSA-N tris(2,6-dimethylphenyl)phosphane Chemical compound CC1=CC=CC(C)=C1P(C=1C(=CC=CC=1C)C)C1=C(C)C=CC=C1C RERMPCBBVZEPBS-UHFFFAOYSA-N 0.000 description 1
- CKKFLUXMIUUGAW-UHFFFAOYSA-N tris(2-propan-2-ylphenyl)phosphane Chemical compound CC(C)C1=CC=CC=C1P(C=1C(=CC=CC=1)C(C)C)C1=CC=CC=C1C(C)C CKKFLUXMIUUGAW-UHFFFAOYSA-N 0.000 description 1
- GDKAFTKCUOBEDW-UHFFFAOYSA-N tris(2-tert-butylphenyl)phosphane Chemical compound CC(C)(C)C1=CC=CC=C1P(C=1C(=CC=CC=1)C(C)(C)C)C1=CC=CC=C1C(C)(C)C GDKAFTKCUOBEDW-UHFFFAOYSA-N 0.000 description 1
- RYXYUARTMQUYKV-UHFFFAOYSA-N tris(4-butylphenyl)phosphane Chemical compound C1=CC(CCCC)=CC=C1P(C=1C=CC(CCCC)=CC=1)C1=CC=C(CCCC)C=C1 RYXYUARTMQUYKV-UHFFFAOYSA-N 0.000 description 1
- SPNVODOGUAUMCA-UHFFFAOYSA-N tris(4-ethoxy-2,6-dimethylphenyl)phosphane Chemical compound CC1=CC(OCC)=CC(C)=C1P(C=1C(=CC(OCC)=CC=1C)C)C1=C(C)C=C(OCC)C=C1C SPNVODOGUAUMCA-UHFFFAOYSA-N 0.000 description 1
- LQEKTSMTEYLBLJ-UHFFFAOYSA-N tris(4-ethoxyphenyl)phosphane Chemical compound C1=CC(OCC)=CC=C1P(C=1C=CC(OCC)=CC=1)C1=CC=C(OCC)C=C1 LQEKTSMTEYLBLJ-UHFFFAOYSA-N 0.000 description 1
- PCCAGZSOGFNURV-UHFFFAOYSA-N tris(4-ethylphenyl)phosphane Chemical compound C1=CC(CC)=CC=C1P(C=1C=CC(CC)=CC=1)C1=CC=C(CC)C=C1 PCCAGZSOGFNURV-UHFFFAOYSA-N 0.000 description 1
- UYUUAUOYLFIRJG-UHFFFAOYSA-N tris(4-methoxyphenyl)phosphane Chemical compound C1=CC(OC)=CC=C1P(C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 UYUUAUOYLFIRJG-UHFFFAOYSA-N 0.000 description 1
- JTOQWGJGVSYTTN-UHFFFAOYSA-N tris(4-propylphenyl)phosphane Chemical compound C1=CC(CCC)=CC=C1P(C=1C=CC(CCC)=CC=1)C1=CC=C(CCC)C=C1 JTOQWGJGVSYTTN-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 210000001835 viscera Anatomy 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本発明は、電子部品装置の封止用材料として好適な流動性、硬化性及び着色性に優れ、特にパッド間やワイヤー間距離が狭い半導体装置等の電子部品装置においても、導電性物質によるショート不良が発生しない封止用エポキシ樹脂成形材料、及びこの封止用エポキシ樹脂成形材料で封止した素子を備えた電子部品装置に関する。 The present invention is excellent in fluidity, curability and colorability suitable as a sealing material for an electronic component device, and is particularly short-circuited by a conductive substance even in an electronic component device such as a semiconductor device having a short distance between pads or wires. The present invention relates to an epoxy resin molding material for sealing that does not cause defects, and an electronic component device including an element sealed with the epoxy resin molding material for sealing.
従来から、トランジスタ、IC等の電子部品装置の素子封止の分野では生産性、コスト等の面から樹脂封止が主流となり、エポキシ樹脂成形材料が広く用いられている。この理由としては、エポキシ樹脂が電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性などの諸特性にバランスがとれているためである。 Conventionally, in the field of element sealing of electronic component devices such as transistors and ICs, resin sealing has been the mainstream in terms of productivity and cost, and epoxy resin molding materials have been widely used. This is because epoxy resins are balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with inserts.
近年、電子部品装置のプリント配線板への高密度実装化に伴い、電子部品装置の形態は従来のピン挿入型のパッケージから、表面実装型のパッケージが主流になっている。表面実装型のIC、LSIなどは、実装密度を高くし実装高さを低くするために、薄型、小型のパッケージになっており、素子のパッケージに対する占有体積が大きくなり、パッケージの肉厚は非常に薄くなってきた。 In recent years, along with the high density mounting of electronic component devices on printed wiring boards, electronic component devices are mainly used in surface mount type packages rather than conventional pin insertion type packages. Surface-mount ICs, LSIs, etc. are thin and small packages in order to increase the mounting density and reduce the mounting height, and the volume occupied by the device package increases, resulting in a very thick package. It has become thinner.
また、さらなる小型軽量化に対応すべく、パッケージの形態もQFP(Quad Flat Package)、SOP(Small Outline Package)といったものから、より多ピン化に対応しやすく、かつより高密度実装が可能なCSP(Chip Size Package)を含めたBGA(Ball Grid Array)等のエリア実装パッケージへ移行しつつある。これらのパッケージは近年、高速化、多機能化を実現するために、フェースダウン型、積層(スタックド)型、フリップチップ型、ウェハーレベル型等、新しい構造のものが開発されているが、それらの多くが素子搭載面側の片面のみをエポキシ樹脂成形材料等の封止材料で封止した後、裏面にはんだボールを形成して回路基板との接合を行う片面封止型パッケージの形態を有している。 In addition, in order to cope with further reduction in size and weight, CSP (Quad Flat Package), SOP (Small Outline Package), and other forms of packages are easy to cope with higher pin count and CSP capable of higher density mounting. It is shifting to an area mounting package such as BGA (Ball Grid Array) including (Chip Size Package). In recent years, these packages have been developed with new structures such as face-down type, stacked type, flip chip type, and wafer level type in order to realize high speed and multiple functions. Many have a single-side sealed package form in which only one side on the element mounting surface side is sealed with a sealing material such as an epoxy resin molding material, and then solder balls are formed on the back surface to join the circuit board. ing.
このようなパッケージの小型化、多ピン化にともなってインナーリード間やパッド間、ワイヤー間等のピッチ間距離が加速的に狭くなってきている。そのため、従来から使用されているカーボンブラックは、それ自体が導電性であるため、その凝集物がインナーリード間やパッド間及びワイヤー間に入り込み電気特性不良を引き起こす問題が生じてきた。このため、カーボンブラックの代わりに有機染料、有機顔料及び無機顔料を用いる方法(例えば、特許文献1〜4参照)が検討されているが、流動性の低下、着色性の低下及び硬化性の低下等の問題があり満足のいくレベルには達していない。 As such packages become smaller and more pins are used, the distances between pitches such as between inner leads, between pads, and between wires are acceleratingly narrowing. For this reason, since carbon black that has been used in the past is electrically conductive, there has been a problem that the aggregates enter between the inner leads, between the pads, and between the wires, resulting in poor electrical characteristics. For this reason, methods using organic dyes, organic pigments, and inorganic pigments instead of carbon black (for example, see Patent Documents 1 to 4) have been studied. However, fluidity, coloring, and curability are reduced. However, it has not reached a satisfactory level.
本発明はかかる状況に鑑みなされたもので、流動性や硬化性等の成形性及び着色性を低下させること無く、パッド間やワイヤー間距離が狭いパッケージに用いた場合でも導電性物質によるショート不良が発生しない封止用エポキシ樹脂成形材料、及びこれにより封止した素子を備えた電子部品装置を提供しようとするものである。 The present invention has been made in view of such a situation, and even when used for a package having a short distance between pads or wires without reducing moldability and colorability such as fluidity and curability, a short circuit failure due to a conductive material. It is an object of the present invention to provide an epoxy resin molding material for sealing that does not generate a problem, and an electronic component device including an element sealed thereby.
本発明者らは上記の課題を解決するために鋭意検討を重ねた結果、メラニンを含有する封止用エポキシ樹脂成形材料により上記の目的を達成し得ることを見い出し、本発明を完成するに至った。
本発明は、以下に関する。
(1)エポキシ樹脂、硬化剤、メラニンを含有する封止用エポキシ樹脂成形材料。
(2)メラニンがユーメラニンである(1)記載の封止用エポキシ樹脂成形材料。
(3)メラニンがイカスミの色素成分である(1)に記載の封止用エポキシ樹脂成形材料。
(4)メラニンの割合が、封止用エポキシ樹脂成形材料の総配合量に対して0.1〜1.5質量%である(1)〜(3)のいずれかに記載の封止用エポキシ樹脂成形材料。
(5)エポキシ樹脂が、ビフェニル型エポキシ樹脂、チオジフェノール型エポキシ樹脂、ノボラック型エポキシ樹脂、ナフタレン型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノール・アラルキル型エポキシ樹脂及びナフトール・アラルキル型エポキシ樹脂のいずれか少なくとも1種を含有する(1)〜(4)のいずれかに記載の封止用エポキシ樹脂成形材料。
(6)硬化剤が、フェノール・アラルキル樹脂、ナフトール・アラルキル樹脂、トリフェニルメタン型フェノール樹脂、ノボラック型フェノール樹脂及び共重合型フェノール・アラルキル樹脂のいずれか少なくとも1種を含有する(1)〜(5)のいずれかに記載の封止用エポキシ樹脂成形材料。
(7)(1)〜(6)のいずれかに記載の封止用エポキシ樹脂成形材料により封止された素子を備える電子部品装置。
As a result of intensive studies to solve the above problems, the present inventors have found that the above object can be achieved by a sealing epoxy resin molding material containing melanin, and the present invention has been completed. It was.
The present invention relates to the following.
(1) An epoxy resin molding material for sealing containing an epoxy resin, a curing agent, and melanin.
(2) The sealing epoxy resin molding material according to (1), wherein the melanin is eumelanin.
(3) The epoxy resin molding material for sealing according to (1), wherein melanin is a pigment component of squid ink.
(4) The epoxy for sealing according to any one of (1) to (3), wherein the ratio of melanin is 0.1 to 1.5% by mass with respect to the total amount of the epoxy resin molding material for sealing. Resin molding material.
(5) The epoxy resin is a biphenyl type epoxy resin, a thiodiphenol type epoxy resin, a novolac type epoxy resin, a naphthalene type epoxy resin, a triphenylmethane type epoxy resin, a bisphenol F type epoxy resin, a phenol / aralkyl type epoxy resin, or a naphthol. -The epoxy resin molding material for sealing in any one of (1)-(4) containing at least 1 sort (s) in any one of an aralkyl type epoxy resin.
(6) The curing agent contains at least one of a phenol / aralkyl resin, a naphthol / aralkyl resin, a triphenylmethane type phenol resin, a novolac type phenol resin, and a copolymer type phenol / aralkyl resin (1) to ( 5) The epoxy resin molding material for sealing according to any one of the above.
(7) An electronic component device including an element sealed with the sealing epoxy resin molding material according to any one of (1) to (6).
本発明の封止用エポキシ樹脂成形材料は流動性、硬化性が良好で、電気特性に優れる電子部品装置が得られるのでその工業的価値は大である。 The epoxy resin molding material for sealing of the present invention has a great fluidity and curability, and an electronic component device having excellent electrical characteristics can be obtained, so that its industrial value is great.
本発明において用いられるエポキシ樹脂は、1分子中にエポキシ基を2個以上含有するものであれば特に制限ないが、たとえばフェノールノボラック型エポキシ樹脂、オルトクレゾールノボラック型エポキシ樹脂、トリフェニルメタン骨格を有するエポキシ樹脂をはじめとするフェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール類及び/又はα‐ナフトール、β‐ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したもの、アルキル置換、芳香環置換又は非置換のビスフェノールA、ビスフェノールF、ビスフェノールS、ビフェノール、チオジフェノール等のジグリシジルエーテル、スチルベン型エポキシ樹脂、ハイドロキノン型エポキシ樹脂、フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂、ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂、ジシクロペンタジエンとフェノール類の共縮合樹脂のエポキシ化物、ナフタレン環を有するエポキシ樹脂、フェノール類及び/又はナフトール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル樹脂、ナフトール・アラルキル樹脂等のアラルキル型フェノール樹脂のエポキシ化物、トリメチロールプロパン型エポキシ樹脂、テルペン変性エポキシ樹脂、オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂などが挙げられ、これらの1種を単独で用いても2種以上を組み合わせて用いてもよい。 The epoxy resin used in the present invention is not particularly limited as long as it contains two or more epoxy groups in one molecule. For example, it has a phenol novolak type epoxy resin, an orthocresol novolak type epoxy resin, or a triphenylmethane skeleton. Phenols such as epoxy resin, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, etc. and / or naphthols such as α-naphthol, β-naphthol, dihydroxynaphthalene and formaldehyde, acetaldehyde, propionaldehyde, Epoxidized novolac resin obtained by condensation or cocondensation with a compound having an aldehyde group such as benzaldehyde or salicylaldehyde under an acidic catalyst, alkyl substitution, aromatic ring placement By reaction of polychlorinated acid such as diglycidyl ether such as substituted or unsubstituted bisphenol A, bisphenol F, bisphenol S, biphenol, thiodiphenol, stilbene type epoxy resin, hydroquinone type epoxy resin, phthalic acid, dimer acid and epichlorohydrin Glycidyl ester type epoxy resin obtained, glycidyl amine type epoxy resin obtained by reaction of polyamine such as diaminodiphenylmethane, isocyanuric acid and epichlorohydrin, epoxidized product of co-condensation resin of dicyclopentadiene and phenol, epoxy resin having naphthalene ring, Phenol aralkyl resin, naphthol aralkyl synthesized from phenols and / or naphthols and dimethoxyparaxylene or bis (methoxymethyl) biphenyl Epoxidized products of aralkyl type phenolic resins such as fat, trimethylolpropane type epoxy resin, terpene modified epoxy resin, linear aliphatic epoxy resin obtained by oxidizing olefinic bond with peracid such as peracetic acid, alicyclic epoxy resin These may be used, and one of these may be used alone, or two or more may be used in combination.
なかでも、流動性と硬化性の両立の観点からはアルキル置換、芳香環置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂を含有していることが好ましく、流動性と難燃性の両立の観点からはアルキル置換、芳香環置換又は非置換のビスフェノールFのジグリシジルエーテルであるビスフェノールF型エポキシ樹脂を含有していることが好ましく、流動性とリフロー性の両立の観点からはアルキル置換、芳香環置換又は非置換のチオジフェノールのジグリシジルエーテルであるチオジフェノール型エポキシ樹脂を含有していることが好ましく、硬化性と難燃性の両立の観点からはアルキル置換、芳香環置換又は非置換のフェノールとビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル樹脂のエポキシ化物を含有していることが好ましい。 Among these, from the viewpoint of compatibility between fluidity and curability, it is preferable to contain a biphenyl type epoxy resin which is a diglycidyl ether of alkyl-substituted, aromatic ring-substituted or unsubstituted biphenol, and fluidity and flame retardancy. It is preferable to contain a bisphenol F-type epoxy resin that is a diglycidyl ether of alkyl-substituted, aromatic-ring-substituted or unsubstituted bisphenol F from the viewpoint of both compatibility, and alkyl from the viewpoint of compatibility between fluidity and reflowability. It is preferable to contain a thiodiphenol type epoxy resin which is a diglycidyl ether of a substituted, aromatic ring-substituted or unsubstituted thiodiphenol. From the viewpoint of both curability and flame retardancy, an alkyl-substituted, aromatic ring Phenol aralkyl synthesized from substituted or unsubstituted phenol and bis (methoxymethyl) biphenyl It preferably contains an epoxidized resin.
ビフェニル型エポキシ樹脂としては、たとえば下記一般式(I)で示されるエポキシ樹脂等が挙げられる。 Examples of the biphenyl type epoxy resin include an epoxy resin represented by the following general formula (I).
(ここで、R1〜R8は水素原子及び炭素数1〜10の置換又は非置換の一価の炭化水素基から選ばれ、全てが同一でも異なっていてもよい。nは0又は1〜3の整数を示す。)
(Here, R 1 to R 8 are selected from a hydrogen atom and a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and all may be the same or different. N is 0 or 1 to 1. Indicates an integer of 3.)
上記一般式(I)で示されるビフェニル型エポキシ樹脂は、ビフェノール化合物にエピクロルヒドリンを公知の方法で反応させることによって得られる。一般式(I)中のR1〜R8としては、たとえば、水素原子、メチル基、エチル基、プロピル基、ブチル基、イソプロピル基、イソブチル基、tert−ブチル基等の炭素数1〜10のアルキル基、ビニル基、アリル基、ブテニル基等の炭素数1〜10のアルケニル基などが挙げられ、なかでも水素原子又はメチル基が好ましい。このようなエポキシ樹脂としては、たとえば、4,4´‐ビス(2,3‐エポキシプロポキシ)ビフェニル又は4,4´‐ビス(2,3‐エポキシプロポキシ)‐3,3´,5,5´‐テトラメチルビフェニルを主成分とするエポキシ樹脂、エピクロルヒドリンと4,4´‐ビフェノール又は4,4´‐(3,3´,5,5´‐テトラメチル)ビフェノールとを反応させて得られるエポキシ樹脂等が挙げられる。なかでも4,4´‐ビス(2,3‐エポキシプロポキシ)‐3,3´,5,5´‐テトラメチルビフェニルを主成分とするエポキシ樹脂が好ましい。そのようなエポキシ樹脂としては市販品としてジャパンエポキシレジン株式会社製商品名YX‐4000として入手可能である。上記ビフェニル型エポキシ樹脂の配合量は、その性能を発揮するためにエポキシ樹脂全量中20質量%以上とすることが好ましく、30質量%以上がより好ましく、50質量%以上がさらに好ましい。 The biphenyl type epoxy resin represented by the general formula (I) can be obtained by reacting a biphenol compound with epichlorohydrin by a known method. As R < 1 > -R < 8 > in general formula (I), C1-C10, such as a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, an isobutyl group, a tert-butyl group etc., for example. C1-C10 alkenyl groups, such as an alkyl group, a vinyl group, an allyl group, a butenyl group, etc. are mentioned, Especially, a hydrogen atom or a methyl group is preferable. Examples of such an epoxy resin include 4,4′-bis (2,3-epoxypropoxy) biphenyl or 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5 ′. -Epoxy resin mainly composed of tetramethylbiphenyl, epoxy resin obtained by reacting epichlorohydrin with 4,4'-biphenol or 4,4 '-(3,3', 5,5'-tetramethyl) biphenol Etc. Among these, an epoxy resin mainly composed of 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl is preferable. Such an epoxy resin can be obtained as a commercial product under the trade name YX-4000 manufactured by Japan Epoxy Resin Co., Ltd. The blending amount of the biphenyl type epoxy resin is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 50% by mass or more in the total amount of the epoxy resin in order to exhibit its performance.
チオジフェノール型エポキシ樹脂、たとえば下記一般式(II)で示されるエポキシ樹脂等が挙げられる。 Examples thereof include thiodiphenol type epoxy resins, for example, epoxy resins represented by the following general formula (II).
(ここで、R1〜R8は水素原子及び炭素数1〜10の置換又は非置換の一価の炭化水素基から選ばれ、全てが同一でも異なっていてもよい。nは0又は1〜3の整数を示す。)
(Here, R 1 to R 8 are selected from a hydrogen atom and a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and all may be the same or different. N is 0 or 1 to 1. Indicates an integer of 3.)
上記一般式(II)で示されるチオジフェノール型エポキシ樹脂は、チオジフェノール化合物にエピクロルヒドリンを公知の方法で反応させることによって得られる。一般式(II)中のR1〜R8としては、たとえば、水素原子、メチル基、エチル基、プロピル基、ブチル基、イソプロピル基、イソブチル基、tert−ブチル基等の炭素数1〜10のアルキル基、ビニル基、アリル基、ブテニル基等の炭素数1〜10のアルケニル基などが挙げられ、なかでも水素原子、メチル基又はtert−ブチル基が好ましい。このようなエポキシ樹脂としては、たとえば、4,4´‐ジヒドロキシジフェニルスルフィドのジグリシジルエーテルを主成分とするエポキシ樹脂、2,2´,5,5´‐テトラメチル‐4,4´‐ジヒドロキシジフェニルスルフィドのジグリシジルエーテルを主成分とするエポキシ樹脂、2,2´‐ジメチル‐4,4´‐ジヒドロキシ‐5,5´‐ジ‐tert‐ブチルジフェニルスルフィドのジグリシジルエーテルを主成分とするエポキシ樹脂等が挙げられ、なかでも2,2´‐ジメチル‐4,4´‐ジヒドロキシ‐5,5´‐ジ‐tert‐ブチルジフェニルスルフィドのジグリシジルエーテルを主成分とするエポキシ樹脂を主成分とするエポキシ樹脂が好ましい。そのようなエポキシ樹脂としては市販品として新日鐵化学株式会社製商品名YSLV‐120TEとして入手可能である。上記チオジフェノール型エポキシ樹脂の配合量は、その性能を発揮するためにエポキシ樹脂全量中20質量%以上とすることが好ましく、30質量%以上がより好ましく、50質量%以上がさらに好ましい。 The thiodiphenol type epoxy resin represented by the general formula (II) can be obtained by reacting a thiodiphenol compound with epichlorohydrin by a known method. As R < 1 > -R < 8 > in general formula (II), it is C1-C10, such as a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, an isobutyl group, a tert-butyl group, for example. C1-C10 alkenyl groups, such as an alkyl group, a vinyl group, an allyl group, a butenyl group, etc. are mentioned, Especially, a hydrogen atom, a methyl group, or a tert- butyl group is preferable. Examples of such an epoxy resin include an epoxy resin mainly composed of diglycidyl ether of 4,4′-dihydroxydiphenyl sulfide, and 2,2 ′, 5,5′-tetramethyl-4,4′-dihydroxydiphenyl. Epoxy resin based on diglycidyl ether of sulfide, epoxy resin based on diglycidyl ether of 2,2'-dimethyl-4,4'-dihydroxy-5,5'-di-tert-butyldiphenyl sulfide Among them, an epoxy mainly composed of an epoxy resin mainly composed of diglycidyl ether of 2,2′-dimethyl-4,4′-dihydroxy-5,5′-di-tert-butyldiphenyl sulfide Resins are preferred. Such an epoxy resin is commercially available as a trade name YSLV-120TE manufactured by Nippon Steel Chemical Co., Ltd. The blending amount of the thiodiphenol type epoxy resin is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 50% by mass or more in the total amount of the epoxy resin in order to exhibit its performance.
ビスフェノールF型エポキシ樹脂としては、たとえば下記一般式(III)で示されるエポキシ樹脂等が挙げられる。 Examples of the bisphenol F type epoxy resin include an epoxy resin represented by the following general formula (III).
(ここで、R1〜R8は水素原子及び炭素数1〜10の置換又は非置換の一価の炭化水素基から選ばれ、全てが同一でも異なっていてもよい。nは0又は1〜3の整数を示す。)
(Here, R 1 to R 8 are selected from a hydrogen atom and a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and all may be the same or different. N is 0 or 1 to 1. Indicates an integer of 3.)
上記一般式(III)で示されるビスフェノールF型エポキシ樹脂は、ビスフェノールF化合物にエピクロルヒドリンを公知の方法で反応させることによって得られる。一般式(III)中のR1〜R8としては、たとえば、水素原子、メチル基、エチル基、プロピル基、ブチル基、イソプロピル基、イソブチル基、tert−ブチル基等の炭素数1〜10のアルキル基、ビニル基、アリル基、ブテニル基等の炭素数1〜10のアルケニル基などが挙げられ、なかでも水素原子又はメチル基が好ましい。このようなエポキシ樹脂としては、たとえば、4,4´‐メチレンビス(2,6‐ジメチルフェノール)のジグリシジルエーテルを主成分とするエポキシ樹脂、4,4´‐メチレンビス(2,3,6‐トリメチルフェノール)のジグリシジルエーテルを主成分とするエポキシ樹脂、4,4´‐メチレンビスフェノールのジグリシジルエーテルを主成分とするエポキシ樹脂等が挙げられ、なかでも4,4´‐メチレンビス(2,6‐ジメチルフェノール)のジグリシジルエーテルを主成分とするエポキシ樹脂が好ましい。そのようなエポキシ樹脂としては市販品として新日鐵化学株式会社製商品名YSLV‐80XYとして入手可能である。上記ビスフェノールF型エポキシ樹脂の配合量は、その性能を発揮するためにエポキシ樹脂全量中20質量%以上とすることが好ましく、30質量%以上がより好ましく、50質量%以上がさらに好ましい。 The bisphenol F type epoxy resin represented by the general formula (III) can be obtained by reacting a bisphenol F compound with epichlorohydrin by a known method. As R < 1 > -R < 8 > in general formula (III), it is C1-C10, such as a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, an isobutyl group, a tert-butyl group, for example. C1-C10 alkenyl groups, such as an alkyl group, a vinyl group, an allyl group, a butenyl group, etc. are mentioned, Especially, a hydrogen atom or a methyl group is preferable. Examples of such an epoxy resin include an epoxy resin mainly composed of 4,4′-methylenebis (2,6-dimethylphenol) diglycidyl ether, and 4,4′-methylenebis (2,3,6-trimethyl). (Epoxy) epoxy resin mainly composed of diglycidyl ether, epoxy resin mainly composed of 4,4′-methylenebisphenol diglycidyl ether, etc., among others, 4,4′-methylene bis (2,6- An epoxy resin mainly composed of diglycidyl ether of (dimethylphenol) is preferred. Such an epoxy resin is commercially available as a trade name YSLV-80XY manufactured by Nippon Steel Chemical Co., Ltd. The blending amount of the bisphenol F-type epoxy resin is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 50% by mass or more in the total amount of the epoxy resin in order to exhibit its performance.
フェノール・アラルキル樹脂のエポキシ化物としては、たとえば下記一般式(IV)で示されるエポキシ樹脂等が挙げられる。 Examples of the epoxidized phenol / aralkyl resin include epoxy resins represented by the following general formula (IV).
(ここで、R1〜R9は水素原子、炭素数1〜12の置換又は非置換の一価の炭化水素基から選ばれ、すべてが同一でも異なっていてもよい。iは0又は1〜3の整数を示し、nは0又は1〜10の整数を示す。)
(Here, R 1 to R 9 are selected from a hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and all may be the same or different. 3 represents an integer, and n represents 0 or an integer of 1 to 10.)
上記一般式(IV)で示されるビフェニレン骨格含有フェノール・アラルキル樹脂のエポキシ化物は、アルキル置換、芳香環置換又は非置換のフェノールとビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル樹脂にエピクロルヒドリンを公知の方法で反応させることによって得られる。一般式(IV)中のR1〜R9としては、たとえば、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基、ドデシル基等の鎖状アルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロペンテニル基、シクロヘキセニル基等の環状アルキル基、ベンジル基、フェネチル基等のアリール基置換アルキル基、メトキシ基置換アルキル基、エトキシ基置換アルキル基、ブトキシ基置換アルキル基等のアルコキシ基置換アルキル基、アミノアルキル基、ジメチルアミノアルキル基、ジエチルアミノアルキル基等のアミノ基置換アルキル基、水酸基置換アルキル基、フェニル基、ナフチル基、ビフェニル基等の無置換アリール基、トリル基、ジメチルフェニル基、エチルフェニル基、ブチルフェニル基、tert−ブチルフェニル基、ジメチルナフチル基等のアルキル基置換アリール基、メトキシフェニル基、エトキシフェニル基、ブトキシフェニル基、tert−ブトキシフェニル基、メトキシナフチル基等のアルコキシ基置換アリール基、ジメチルアミノ基、ジエチルアミノ基等のアミノ基置換アリール基、水酸基置換アリール基などが挙げられ、なかでも水素原子又はメチル基が好ましい。また一般式(IV)中のnとしては平均で6以下がより好ましく、そのようなエポキシ樹脂としては、市販品として日本化薬株式会社製商品名NC‐3000Sとして入手可能である。 The epoxidized product of the biphenylene skeleton-containing phenol / aralkyl resin represented by the general formula (IV) is obtained by adding epichlorohydrin to a phenol / aralkyl resin synthesized from alkyl-substituted, aromatic-ring-substituted or unsubstituted phenol and bis (methoxymethyl) biphenyl. It can be obtained by reacting by a known method. Examples of R 1 to R 9 in the general formula (IV) include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, Chain alkyl groups such as octyl group, decyl group and dodecyl group, cyclic alkyl groups such as cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclopentenyl group and cyclohexenyl group, and aryl group-substituted alkyl groups such as benzyl group and phenethyl group , Alkoxy groups substituted alkyl groups such as methoxy group substituted alkyl groups, ethoxy group substituted alkyl groups, butoxy group substituted alkyl groups, amino group substituted alkyl groups such as aminoalkyl groups, dimethylaminoalkyl groups, diethylaminoalkyl groups, hydroxyl group substituted alkyl groups , Phenyl group, naphthyl group, biphenyl group, etc. Alkyl group, tolyl group, dimethylphenyl group, ethylphenyl group, butylphenyl group, tert-butylphenyl group, dimethylnaphthyl group and other alkyl group-substituted aryl groups, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, tert- Examples include alkoxy group-substituted aryl groups such as butoxyphenyl group and methoxynaphthyl group, amino group-substituted aryl groups such as dimethylamino group and diethylamino group, and hydroxyl group-substituted aryl groups. Among them, a hydrogen atom or a methyl group is preferable. Moreover, as an n in general formula (IV), 6 or less is more preferable on average, and such an epoxy resin is commercially available as a product name NC-3000S manufactured by Nippon Kayaku Co., Ltd.
また、難燃性と耐リフロー性、流動性の両立の観点からは上記一般式(I)で示されるエポキシ樹脂を含有していることが好ましく、なかでも上記一般式(IV)のR1〜R8が水素原子で上記一般式(I)のR1〜R8が水素原子でn=0であることがより好ましい。また特にその配合質量比は、(I)/(IV)=50/50〜5/95であることが好ましく、40/60〜10/90であるものがより好ましく、30/70〜15/85であるものがさらに好ましい。このような配合質量比を満足する化合物としては、CER−3000L(日本化薬株式会社製商品名)等が市販品として入手可能である。 Moreover, it is preferable to contain the epoxy resin shown by the said general formula (I) from a viewpoint of coexistence of a flame retardance, reflow resistance, and fluidity, Especially R < 1 > of the said general formula (IV)- More preferably, R 8 is a hydrogen atom, and R 1 to R 8 in the general formula (I) are hydrogen atoms and n = 0. In particular, the blending mass ratio is preferably (I) / (IV) = 50/50 to 5/95, more preferably 40/60 to 10/90, and 30/70 to 15/85. Is more preferred. As a compound satisfying such a blending mass ratio, CER-3000L (trade name, manufactured by Nippon Kayaku Co., Ltd.) and the like are commercially available.
上記のビフェニル型エポキシ樹脂、チオジフェノール型エポキシ樹脂、ビスフェノールF型エポキシ樹脂及びフェノール・アラルキル樹脂のエポキシ化物は、いずれか1種を単独で用いても2種以上を組合わせて用いてもよいが、2種以上を組み合わせて用いる場合の配合量は、エポキシ樹脂全量中合わせて50質量%以上とすることが好ましく、60質量%以上がより好ましく、80質量%以上がさらに好ましい。 The biphenyl type epoxy resin, thiodiphenol type epoxy resin, bisphenol F type epoxy resin and epoxidized product of phenol / aralkyl resin may be used alone or in combination of two or more. However, when 2 or more types are used in combination, the blending amount is preferably 50% by mass or more, more preferably 60% by mass or more, and still more preferably 80% by mass or more in the total amount of the epoxy resin.
本発明において用いられる硬化剤は、封止用エポキシ樹脂成形材料に一般に使用されているもので特に制限はないが、たとえば、フェノール、クレゾール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェニルフェノール、チオジフェノール、アミノフェノール等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂、フェノール類及び/又はナフトール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル樹脂、ナフトール・アラルキル樹脂等のアラルキル型フェノール樹脂、フェノール・ノボラック構造とフェノール・アラルキル構造がランダム、ブロック又は交互に繰り返された共重合型フェノール・アラルキル樹脂、パラキシリレン及び/又はメタキシリレン変性フェノール樹脂、メラミン変性フェノール樹脂、テルペン変性フェノール樹脂、ジシクロペンタジエン変性フェノール樹脂、シクロペンタジエン変性フェノール樹脂、多環芳香環変性フェノール樹脂などが挙げられ、これらを単独で用いても2種以上を組合わせて用いてもよい。 The curing agent used in the present invention is not particularly limited as it is generally used for an epoxy resin molding material for sealing. For example, phenol, cresol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol, thiol Condensation or cocondensation of phenols such as diphenol and aminophenol and / or naphthols such as α-naphthol, β-naphthol and dihydroxynaphthalene with compounds having an aldehyde group such as formaldehyde, benzaldehyde and salicylaldehyde in an acidic catalyst Phenolic aralkyl resin, naphthol aralkyl tree synthesized from novolac type phenolic resin, phenols and / or naphthols and dimethoxyparaxylene or bis (methoxymethyl) biphenyl Aralkyl-type phenol resins such as fats, copolymer-type phenol-aralkyl resins in which the phenol / novolak structure and the phenol-aralkyl structure are random, block or alternately repeated, paraxylylene and / or metaxylylene-modified phenol resin, melamine-modified phenol resin, terpene Examples thereof include modified phenol resins, dicyclopentadiene modified phenol resins, cyclopentadiene modified phenol resins, polycyclic aromatic ring modified phenol resins, and the like. These may be used alone or in combination of two or more.
なかでも、流動性、難燃性及び耐リフロー性の観点からはフェノール・アラルキル樹脂及び共重合型フェノール・アラルキル樹脂が好ましく、耐熱性、低膨張率及び低そり性の観点からはトリフェニルメタン型フェノール樹脂が好ましく、これらのフェノール樹脂の少なくとも1種を含有していることが好ましい。 Of these, phenol / aralkyl resins and copolymeric phenol / aralkyl resins are preferred from the viewpoint of fluidity, flame retardancy and reflow resistance, and triphenylmethane type from the viewpoint of heat resistance, low expansion rate and low warpage. Phenol resins are preferred and preferably contain at least one of these phenol resins.
フェノール・アラルキル樹脂としては、たとえば下記一般式(V)で示される樹脂が挙げられる。 Examples of the phenol / aralkyl resin include a resin represented by the following general formula (V).
(ここで、Rは水素原子、炭素数1〜12の置換又は非置換の一価の炭化水素基から選ばれ、すべてが同一でも異なっていてもよい。iは0又は1〜3の整数を示し、Xは芳香環を含む二価の有機基を示し、nは0又は1〜10の整数を示す。)
(Here, R is selected from a hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and all may be the same or different. I is an integer of 0 or 1-3. X represents a divalent organic group containing an aromatic ring, and n represents 0 or an integer of 1 to 10.)
上記一般式(V)中のRとしては、たとえば、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基、ドデシル基等の鎖状アルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロペンテニル基、シクロヘキセニル基等の環状アルキル基、ベンジル基、フェネチル基等のアリール基置換アルキル基、メトキシ基置換アルキル基、エトキシ基置換アルキル基、ブトキシ基置換アルキル基等のアルコキシ基置換アルキル基、アミノアルキル基、ジメチルアミノアルキル基、ジエチルアミノアルキル基等のアミノ基置換アルキル基水酸基置換アルキル基、フェニル基、ナフチル基、ビフェニル基等の無置換アリール基、トリル基、ジメチルフェニル基、エチルフェニル基、ブチルフェニル基、tert−ブチルフェニル基、ジメチルナフチル基等のアルキル基置換アリール基、メトキシフェニル基、エトキシフェニル基、ブトキシフェニル基、tert−ブトキシフェニル基、メトキシナフチル基等のアルコキシ基置換アリール基、ジメチルアミノ基、ジエチルアミノ基等のアミノ基置換アリール基、水酸基置換アリール基などが挙げられ、なかでも水素原子又はメチル基が好ましい。 As R in the general formula (V), for example, methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, octyl group, Decyl group, chain alkyl group such as dodecyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclopentenyl group, cyclohexenyl group and other cyclic alkyl groups, benzyl group, phenethyl group and other aryl group substituted alkyl groups, methoxy group Substituted alkyl group, ethoxy group substituted alkyl group, alkoxy group substituted alkyl group such as butoxy group substituted alkyl group, aminoalkyl group, dimethylaminoalkyl group, amino group substituted alkyl group such as diethylaminoalkyl group, hydroxyl group substituted alkyl group, phenyl group, Unsubstituted aryl groups such as naphthyl group and biphenyl group, Alkyl group-substituted aryl groups such as ryl group, dimethylphenyl group, ethylphenyl group, butylphenyl group, tert-butylphenyl group, dimethylnaphthyl group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, tert-butoxyphenyl group, Examples include an alkoxy group-substituted aryl group such as a methoxynaphthyl group, an amino group-substituted aryl group such as a dimethylamino group and a diethylamino group, and a hydroxyl group-substituted aryl group. Among them, a hydrogen atom or a methyl group is preferable.
また、Xは芳香環を含む基を示し、たとえばフェニレン基、ビフェニレン基、ナフチレン基等のアリーレン基、トリレン基等のアルキル基置換アリーレン基、アルコキシル基置換アリーレン基、ベンジル基、フェネチル基等のアラルキル基から得られる二価の基、アラルキル基置換アリーレン基、キシリレン基等のアリーレン基を含む二価の基などが挙げられる。なかでも、難燃性と耐リフロー性の両立の観点からは置換又は非置換のビフェニレン基が好ましく、例えば下記一般式(VI)で示されるフェノール・アラルキル樹脂が挙げられ、難燃性、流動性と硬化性の両立の観点からは置換又は非置換のフェニレン基が好ましく、例えば下記一般式(VII)で示されるフェノール・アラルキル樹脂が挙げられる。nは0又は1〜10の整数を示し、平均で6以下がより好ましい。 X represents a group containing an aromatic ring, for example, an arylene group such as a phenylene group, a biphenylene group or a naphthylene group, an alkyl group-substituted arylene group such as a tolylene group, an alkoxyl group-substituted arylene group, a benzyl group or a phenethyl group. And a divalent group containing an arylene group such as a divalent group obtained from a group, an aralkyl group-substituted arylene group, and a xylylene group. Among them, from the viewpoint of achieving both flame retardancy and reflow resistance, a substituted or unsubstituted biphenylene group is preferable, and examples thereof include a phenol / aralkyl resin represented by the following general formula (VI). From the standpoint of achieving both good and curability, a substituted or unsubstituted phenylene group is preferred, and examples thereof include a phenol / aralkyl resin represented by the following general formula (VII). n shows 0 or the integer of 1-10, and 6 or less is more preferable on average.
(ここで、nは0又は1〜10の整数を示す。)
(Here, n represents 0 or an integer of 1 to 10.)
(ここで、nは0又は1〜10の整数を示す。)
(Here, n represents 0 or an integer of 1 to 10.)
上記一般式(VI)で示されるビフェニレン骨格含有フェノール・アラルキル樹脂としては、市販品として明和化成株式会社製商品名MEH‐7851が挙げられ、一般式(VII)で示されるフェノール・アラルキル樹脂としては、市販品として三井化学株式会社製商品名XLCが挙げられる。上記フェノール・アラルキル樹脂の配合量は、その性能を発揮するために硬化剤全量中20質量%以上とすることが好ましく、30質量%以上がより好ましく、50質量%以上がさらに好ましい。 As a biphenylene skeleton containing phenol aralkyl resin represented by the above general formula (VI), MEH-7851 manufactured by Meiwa Kasei Co., Ltd. may be mentioned as a commercial product, and as a phenol aralkyl resin represented by the general formula (VII) As a commercial product, trade name XLC manufactured by Mitsui Chemicals, Inc. may be mentioned. The blending amount of the phenol-aralkyl resin is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 50% by mass or more in the total amount of the curing agent in order to exhibit its performance.
トリフェニルメタン型フェノール樹脂としては、たとえば下記一般式(VIII)で示されるフェノール樹脂等が挙げられる。 Examples of the triphenylmethane type phenol resin include a phenol resin represented by the following general formula (VIII).
(ここで、Rは水素原子及び炭素数1〜10の置換又は非置換の一価の炭化水素基から選ばれ、nは0〜10の整数を示す。)
(Here, R is selected from a hydrogen atom and a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and n represents an integer of 0 to 10.)
上記一般式(VIII)中のRとしては、たとえば、水素原子、メチル基、エチル基、プロピル基、ブチル基、イソプロピル基、tert−ブチル基等のアルキル基、ビニル基、アリル基、ブテニル基等のアルケニル基、ハロゲン化アルキル基、アミノ基置換アルキル基、メルカプト基置換アルキル基などの炭素数1〜10の置換又は非置換の一価の炭化水素基が挙げられ、なかでもメチル基、エチル基等のアルキル基及び水素原子が好ましく、メチル基及び水素原子がより好ましい。トリフェニルメタン型フェノール樹脂を用いる場合、その配合量はその性能を発揮するために硬化剤全量中30質量%以上とすることが好ましく、50質量%以上がより好ましい。 Examples of R in the general formula (VIII) include a hydrogen atom, an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, and a tert-butyl group, a vinyl group, an allyl group, and a butenyl group. C1-C10 substituted or unsubstituted monovalent hydrocarbon group such as alkenyl group, halogenated alkyl group, amino group-substituted alkyl group, mercapto group-substituted alkyl group, etc., among which methyl group, ethyl group Alkyl groups and hydrogen atoms such as methyl groups and hydrogen atoms are more preferable. When using a triphenylmethane type phenol resin, the blending amount is preferably 30% by mass or more, more preferably 50% by mass or more, based on the total amount of the curing agent in order to exhibit its performance.
共重合型フェノール・アラルキル樹脂としては、たとえば下記一般式(IX)で示されるフェノール樹脂が挙げられる。 As copolymerization type phenol aralkyl resin, the phenol resin shown, for example by the following general formula (IX) is mentioned.
(ここで、Rは水素原子、炭素数1〜12の置換又は非置換の一価の炭化水素基及び水酸基から選ばれ、すべてが同一でも異なっていてもよい。またXは芳香環を含む二価の基を示す。n及びmは0又は1〜10の整数を示す。)
(Wherein R is selected from a hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms and a hydroxyl group, all of which may be the same or different. And n and m are each 0 or an integer of 1 to 10.)
上記一般式(IX)中のRとしては、たとえば、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基、ドデシル基等の鎖状アルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロペンテニル基、シクロヘキセニル基等の環状アルキル基、ベンジル基、フェネチル基等のアリール基置換アルキル基、メトキシ基置換アルキル基、エトキシ基置換アルキル基、ブトキシ基置換アルキル基等のアルコキシ基置換アルキル基、アミノアルキル基、ジメチルアミノアルキル基、ジエチルアミノアルキル基等のアミノ基置換アルキル基水酸基置換アルキル基、フェニル基、ナフチル基、ビフェニル基等の無置換アリール基、トリル基、ジメチルフェニル基、エチルフェニル基、ブチルフェニル基、tert−ブチルフェニル基、ジメチルナフチル基等のアルキル基置換アリール基、メトキシフェニル基、エトキシフェニル基、ブトキシフェニル基、tert−ブトキシフェニル基、メトキシナフチル基等のアルコキシ基置換アリール基、ジメチルアミノ基、ジエチルアミノ基等のアミノ基置換アリール基、水酸基置換アリール基などが挙げられ、なかでも水素原子又はメチル基が好ましく、またn及びmは0又は1〜10の整数を示し、平均で6以下がより好ましい。 Examples of R in the general formula (IX) include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, an octyl group, Decyl group, chain alkyl group such as dodecyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclopentenyl group, cyclohexenyl group and other cyclic alkyl groups, benzyl group, phenethyl group and other aryl group substituted alkyl groups, methoxy group Substituted alkyl group, ethoxy group substituted alkyl group, alkoxy group substituted alkyl group such as butoxy group substituted alkyl group, aminoalkyl group, dimethylaminoalkyl group, amino group substituted alkyl group such as diethylaminoalkyl group, hydroxyl group substituted alkyl group, phenyl group, Unsubstituted aryl groups such as naphthyl group and biphenyl group Alkyl group-substituted aryl group such as tolyl group, dimethylphenyl group, ethylphenyl group, butylphenyl group, tert-butylphenyl group, dimethylnaphthyl group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, tert-butoxyphenyl group, Examples include an alkoxy group-substituted aryl group such as a methoxynaphthyl group, an amino group-substituted aryl group such as a dimethylamino group and a diethylamino group, and a hydroxyl group-substituted aryl group. Among them, a hydrogen atom or a methyl group is preferable, and n and m are 0. Or the integer of 1-10 is shown and 6 or less is more preferable on average.
上記一般式(IX)中のXとしては、たとえばフェニレン基、ビフェニレン基、ナフチレン基等のアリーレン基、トリレン基等のアルキル基置換アリーレン基、アルコキシル基置換アリーレン基、アラルキル基置換アリーレン基、ベンジル基、フェネチル基等のアラルキル基から得られる二価の基、キシリレン基等のアリーレン基を含む二価の基などが挙げられ、なかでも、保存安定性と難燃性の観点からは置換又は非置換のフェニレン基及びビフェニレン基が好ましい。
一般式(IX)で示される化合物としては、HE−510(エア・ウォーター株式会社製商品名)等が市販品として入手可能である。
共重合型フェノール・アラルキル樹脂を用いる場合、その配合量はその性能を発揮するために硬化剤全量中30質量%以上とすることが好ましく、50質量%以上がより好ましい。
X in the general formula (IX) is, for example, an arylene group such as a phenylene group, a biphenylene group or a naphthylene group, an alkyl group-substituted arylene group such as a tolylene group, an alkoxyl group-substituted arylene group, an aralkyl group-substituted arylene group, or a benzyl group. , Divalent groups obtained from an aralkyl group such as a phenethyl group, divalent groups containing an arylene group such as a xylylene group, etc., among others, substituted or unsubstituted from the viewpoint of storage stability and flame retardancy The phenylene group and biphenylene group are preferred.
As the compound represented by the general formula (IX), HE-510 (trade name, manufactured by Air Water Co., Ltd.) and the like are commercially available.
In the case of using a copolymeric phenol / aralkyl resin, the blending amount thereof is preferably 30% by mass or more, more preferably 50% by mass or more, based on the total amount of the curing agent in order to exhibit its performance.
上記のフェノール・アラルキル樹脂、トリフェニルメタン型フェノール樹脂及び共重合型フェノール・アラルキル樹脂は、いずれか1種を単独で用いても2種以上を組合わせて用いてもよいが、2種以上を組み合わせて用いる場合の配合量は、フェノール樹脂全量中合わせて50質量%以上とすることが好ましく、60質量%以上がより好ましく、80質量%以上がさらに好ましい。 The above-mentioned phenol / aralkyl resin, triphenylmethane type phenol resin and copolymer type phenol / aralkyl resin may be used alone or in combination of two or more. When used in combination, the blending amount is preferably 50% by mass or more, more preferably 60% by mass or more, and further preferably 80% by mass or more in the total amount of phenol resin.
本発明において、エポキシ樹脂と硬化剤との当量比、すなわちエポキシ基に対する硬化剤中の水酸基数の比(硬化剤中の水酸基数/エポキシ樹脂中のエポキシ基数)は、特に制限はないが、それぞれの未反応分を少なく抑えるために0.5〜2の範囲に設定されることが好ましく、0.6〜1.3がより好ましい。成形性、耐半田リフロー性に優れる封止用エポキシ樹脂成形材料を得るためには0.8〜1.2の範囲に設定されることがさらに好ましい。 In the present invention, the equivalent ratio of the epoxy resin and the curing agent, that is, the ratio of the number of hydroxyl groups in the curing agent to the epoxy group (number of hydroxyl groups in the curing agent / number of epoxy groups in the epoxy resin) is not particularly limited, Is preferably set in the range of 0.5 to 2 and more preferably in the range of 0.6 to 1.3 in order to suppress the unreacted content of the resin. In order to obtain a sealing epoxy resin molding material excellent in moldability and solder reflow resistance, it is more preferably set in the range of 0.8 to 1.2.
本発明で用いられるメラニンとは、フェノール類がオキシダーゼにより酸化されて生成する褐色ないし黒色の高分子色素の総称であり、動植物界に広く分布する体色色素である。その中でも黒色を示すユーメラニンは5,6−ジヒドロキシインドールと5,6−ジヒドロキシインドール−2−カルボン酸が重合した化合物である。なおメラニンは通常、タンパク質と共有結合やイオン結合により強く結合しており分離が困難であることから、ここに記載するメラニンとはタンパク質との混合物または化合物も含めた総称である。 Melanin used in the present invention is a generic name for brown or black polymer pigments produced by oxidation of phenols with oxidase, and is a body color pigment widely distributed in the animal and plant kingdoms. Among them, eumelanin showing a black color is a compound in which 5,6-dihydroxyindole and 5,6-dihydroxyindole-2-carboxylic acid are polymerized. Since melanin is usually strongly bound to a protein by covalent bond or ionic bond and is difficult to separate, melanin is a generic name including a mixture or compound with protein.
本発明で用いられるメラニンは上記の高分子色素であれば特に制限はないが、着色性の観点からは黒色のユーメラニンが好ましい。ユーメラニンとしては上記の化合物または混合物であれば特に制限は無いが、例えば、烏賊(イカ)の内臓中の墨袋から得られるイカスミ、その色素成分の抽出物及びその加工品が挙げられる。これらは、イカスミパウダー、アイカブラックS、セピアIC(日本葉緑素株式会社製商品名)等が市販品として入手可能である。 The melanin used in the present invention is not particularly limited as long as it is the above polymer pigment, but black eumelanin is preferable from the viewpoint of colorability. Eumelanin is not particularly limited as long as it is the above compound or mixture, and examples thereof include squid obtained from a black bag in the internal organs of squid (squid), an extract of its pigment component, and a processed product thereof. These are available as commercially available products such as Ikasumi Powder, Aika Black S, Sepia IC (trade name, manufactured by Nippon Chlorophyll Co., Ltd.) and the like.
本発明で使用されるメラニンは単独で用いても組み合わせて用いても良く、予めエポキシ樹脂や硬化剤等の樹脂に混合して用いても良い。 The melanin used in the present invention may be used alone or in combination, or may be used by previously mixing with a resin such as an epoxy resin or a curing agent.
本発明で用いられるメラニンの配合量は、本発明の効果が達成される範囲内であれば特に制限は無いが、封止用エポキシ樹脂成形材料の総配合量に対して0.1質量%〜1.5質量%が好ましく、0.1質量%〜1質量%がより好ましい。 The blending amount of melanin used in the present invention is not particularly limited as long as the effect of the present invention is achieved, but is 0.1% by mass to the total blending amount of the epoxy resin molding material for sealing. 1.5 mass% is preferable and 0.1 mass%-1 mass% are more preferable.
本発明の封止用エポキシ樹脂成形材料には、本発明の効果が達成される範囲内であれば、着色剤を含有してもよい。使用できる着色剤はアゾ系、アントラキノン系、フタロシアニン系等の染料、アジン系、アゾ系、アントラキノン系、ジイモニウム系、ジイミニウム系、フタロシアニン系、金属塩系有機顔料、Al、Mg、Fe、Ti等の金属酸化物系無機顔料、Cu、Cr、Mn等の複合金属酸化物系顔料、ピッチ、カーボンブラック等が挙げられる。これらの中で、着色性の観点からはフタロシアニン系染料又は顔料、アニリンブラック、ペリレンブラック、黒色酸化鉄、黒色酸化チタン、ピッチが好ましく、レーザーマーク性の観点から黒色酸化チタン又はピッチがより好ましい。このような黒色酸化チタンとしては市販品として株式会社ジェムコ製商品名チタンブラックが挙げられ、ピッチとしては大阪ガスケミカル株式会社製商品名MCMBグリーン品が挙げられる。 The sealing epoxy resin molding material of the present invention may contain a colorant as long as the effects of the present invention are achieved. Colorants that can be used are dyes such as azo, anthraquinone and phthalocyanine, azine, azo, anthraquinone, diimonium, diiminium, phthalocyanine, metal salt organic pigments, Al, Mg, Fe, Ti, etc. Examples thereof include metal oxide inorganic pigments, composite metal oxide pigments such as Cu, Cr, and Mn, pitch, and carbon black. Among these, phthalocyanine dyes or pigments, aniline black, perylene black, black iron oxide, black titanium oxide, and pitch are preferable from the viewpoint of colorability, and black titanium oxide or pitch is more preferable from the viewpoint of laser mark property. Examples of such black titanium oxide include commercially available product name Titanium Black manufactured by Gemco Co., Ltd., and examples of pitch include product name MCMB Green manufactured by Osaka Gas Chemical Co., Ltd.
メラニンを含まない着色剤を使用する場合、メラニン及びメラニンを含まない着色剤の全配合量は、本発明の効果が達成される範囲内であれば特に制限は無いが、エポキシ樹脂に対して0.1〜1.5質量%が好ましく、0.1質量%〜1質量%がより好ましい。またメラニンの配合量は、着色性とショート不良の観点からメラニン及びメラニンを含まない着色剤中に30質量%以上含有することが好ましく、45質量%以上含有することがより好ましく、60質量%以上含有することがさらに好ましい。 When using a colorant that does not contain melanin, the total amount of melanin and the colorant that does not contain melanin is not particularly limited as long as the effects of the present invention are achieved. 0.1 to 1.5% by mass is preferable, and 0.1 to 1% by mass is more preferable. The blending amount of melanin is preferably 30% by mass or more, more preferably 45% by mass or more, and more preferably 60% by mass or more in the colorant not containing melanin and melanin from the viewpoint of colorability and short circuit failure. It is more preferable to contain.
本発明の成形材料は、硬化促進剤を含有してもよい。本発明で用いられる硬化促進剤としては、封止用エポキシ樹脂成形材料で一般に使用されているもので特に限定はない。たとえば、1,8−ジアザビシクロ[5.4.0]ウンデセン−7、1,5−ジアザビシクロ[4.3.0]ノネン−5、5,6−ジブチルアミノ−1,8−ジアザビシクロ[5.4.0]ウンデセン−7等のシクロアミジン化合物及びこれらの化合物に無水マレイン酸、1,4−ベンゾキノン、2,5−トルキノン、1,4−ナフトキノン、2,3−ジメチルベンゾキノン、2,6−ジメチルベンゾキノン、2,3−ジメトキシ−5−メチル−1,4ベンゾキノン、2,3−ジメトキシ−1,4−ベンゾキノン、フェニル−1,4−ベンゾキノン等のキノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の三級アミン類及びこれらの誘導体、2−メチルイミダゾール、2−フェニルイミダゾール、2―フェニル−4−メチルイミダゾール、2−ヘプタデシルイミダゾール等のイミダゾール類及びこれらの誘導体、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィン、トリス(4−メチルフェニル)ホスフィン、ジフェニルホスフィン、フェニルホスフィン等の有機ホスフィン類及びこれらのホスフィン類に無水マレイン酸、上記キノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有するリン化合物、テトラフェニルホスホニウムテトラフェニルボレート、テトラフェニルホスホニウムエチルトリフェニルボレート、テトラブチルホスホニウムテトラブチルボレート等のテトラ置換ホスホニウム・テトラ置換ボレート、2−エチル−4−メチルイミダゾール・テトラフェニルボレート、N−メチルモルホリン・テトラフェニルボレート等のテトラフェニルボロン塩及びこれらの誘導体などが挙げられ、これらの1種を単独で用いても2種以上組み合わせて用いてもよい。 The molding material of the present invention may contain a curing accelerator. As a hardening accelerator used by this invention, it is generally used with the epoxy resin molding material for sealing, and there is no limitation in particular. For example, 1,8-diazabicyclo [5.4.0] undecene-7,1,5-diazabicyclo [4.3.0] nonene-5,5,6-dibutylamino-1,8-diazabicyclo [5.4 .0] cycloamidine compounds such as undecene-7 and these compounds to maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethyl Quinones such as benzoquinone, 2,3-dimethoxy-5-methyl-1,4benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone, π such as diazophenylmethane, phenol resin, etc. Compound with intramolecular polarization formed by adding a compound with bond, benzyldimethylamine, triethanolamine, dimethylamine Tertiary amines such as ethanol and tris (dimethylaminomethyl) phenol and their derivatives, imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole and the like Derivatives, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, tris (4-methylphenyl) phosphine, diphenylphosphine, phenylphosphine and the like, and maleic anhydride, the above quinone compounds, diazophenylmethane Phosphorus compounds with intramolecular polarization formed by adding a compound having a π bond such as phenol resin, tetraphenylphosphonium tetraphenylborate, tetraphenylphosphonium ethyltrif Tetra-substituted phosphonium and tetra-substituted borates such as nylborate and tetrabutylphosphonium tetrabutylborate, tetraphenylboron salts such as 2-ethyl-4-methylimidazole and tetraphenylborate, N-methylmorpholine and tetraphenylborate, and derivatives thereof These may be used alone or in combination of two or more.
なかでも、硬化性及び流動性の観点からは第三ホスフィンとキノン化合物との付加物が好ましく、保存安定性の観点からはシクロアミジン化合物とフェノール樹脂との付加物が好ましく、ジアザビシクロウンデセンのノボラック型フェノール樹脂塩がより好ましい。
これらの硬化促進剤の配合量は硬化促進剤全量中合わせて60質量%以上が好ましく、80質量%以上がより好ましい。
Among these, an adduct of a tertiary phosphine and a quinone compound is preferable from the viewpoint of curability and fluidity, and an adduct of a cycloamidine compound and a phenol resin is preferable from the viewpoint of storage stability, and diazabicycloundecene. The novolac type phenol resin salt is more preferable.
The blending amount of these curing accelerators is preferably 60% by mass or more, more preferably 80% by mass or more in the total amount of the curing accelerator.
第三ホスフィンとキノン化合物との付加物に用いられる第三ホスフィンとしては特に制限はないが、たとえば、ジブチルフェニルホスフィン、ブチルジフェニルホスフィン、エチルジフェニルホスフィン、トリフェニルホスフィン、トリス(4−メチルフェニル)ホスフィン、トリス(4−エチルフェニル)ホスフィン、トリス(4−プロピルフェニル)ホスフィン、トリス(4−ブチルフェニル)ホスフィン、トリス(イソプロピルフェニル)ホスフィン、トリス(tert−ブチルフェニル)ホスフィン、トリス(2,4−ジメチルフェニル)ホスフィン、トリス(2,6−ジメチルフェニル)ホスフィン、トリス(2,4,6−トリメチルフェニル)ホスフィン、トリス(2,6−ジメチル−4−エトキシフェニル)ホスフィン、トリス(4−メトキシフェニル)ホスフィン、トリス(4−エトキシフェニル)ホスフィン等のアリール基を有する第三ホスフィンが挙げられ、成形性の点からはトリフェニルホスフィンが好ましい。 The tertiary phosphine used in the adduct of the tertiary phosphine and the quinone compound is not particularly limited, but examples thereof include dibutylphenylphosphine, butyldiphenylphosphine, ethyldiphenylphosphine, triphenylphosphine, and tris (4-methylphenyl) phosphine. , Tris (4-ethylphenyl) phosphine, tris (4-propylphenyl) phosphine, tris (4-butylphenyl) phosphine, tris (isopropylphenyl) phosphine, tris (tert-butylphenyl) phosphine, tris (2,4- Dimethylphenyl) phosphine, tris (2,6-dimethylphenyl) phosphine, tris (2,4,6-trimethylphenyl) phosphine, tris (2,6-dimethyl-4-ethoxyphenyl) phosphine, tris (4-methoxyphenyl) phosphine, tertiary phosphines are exemplified with an aryl group such as tris (4-ethoxyphenyl) phosphine, triphenylphosphine is preferable in view of moldability.
また、第三ホスフィンとキノン化合物との付加物に用いられるキノン化合物としては特に制限はないが、たとえば、o−ベンゾキノン、p−ベンゾキノン、ジフェノキノン、1,4−ナフトキノン、アントラキノン等が挙げられ、耐湿性又は保存安定性の観点からはp−ベンゾキノンが好ましい。 Further, the quinone compound used for the adduct of the tertiary phosphine and the quinone compound is not particularly limited, and examples thereof include o-benzoquinone, p-benzoquinone, diphenoquinone, 1,4-naphthoquinone, anthraquinone, and the like. P-benzoquinone is preferable from the viewpoint of stability or storage stability.
硬化促進剤の配合量は、硬化促進効果が達成される量であれば特に限定されるものではないが、エポキシ樹脂と硬化剤の合計量100質量部に対して0.1〜10質量部が好ましく、0.3〜5質量部がより好ましい。0.1質量部未満では短時間で硬化させることが困難となり、10質量部を超えると硬化速度が早すぎて良好な成形品が得られない傾向がある。 The blending amount of the curing accelerator is not particularly limited as long as the curing acceleration effect is achieved, but is 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the epoxy resin and the curing agent. Preferably, 0.3-5 mass parts is more preferable. If it is less than 0.1 parts by mass, it is difficult to cure in a short time, and if it exceeds 10 parts by mass, the curing rate tends to be too fast and a good molded product tends not to be obtained.
本発明の成形材料は、無機充てん剤を含有してもよい。本発明で用いられる無機充てん剤は、吸湿性、線膨張係数低減、熱伝導性向上及び強度向上のために成形材料に配合されるものであり、封止用エポキシ樹脂成形材料に一般に使用されているものであれば特に制限されるものではないが、例えば、溶融シリカ、結晶シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、チタン酸カリウム、炭化珪素、窒化珪素、窒化アルミ、窒化ホウ素、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体、又はこれらを球形化したビーズ、ガラス繊維などが挙げられ、これらを単独で用いても2種以上を組み合わせて用いてもよい。なかでも、線膨張係数低減の観点からは溶融シリカが、高熱伝導性の観点からはアルミナが好ましく、充てん剤形状は成形時の流動性及び金型摩耗性の点から球形が好ましい。特にコストと性能のバランスの観点からは球状溶融シリカが好ましい。 The molding material of the present invention may contain an inorganic filler. The inorganic filler used in the present invention is blended in a molding material for hygroscopicity, linear expansion coefficient reduction, thermal conductivity improvement and strength improvement, and is generally used for epoxy resin molding materials for sealing. It is not particularly limited as long as it is, for example, fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, potassium titanate, silicon carbide, silicon nitride, aluminum nitride, boron nitride, beryllia, Examples include powders such as zirconia, zircon, fosterite, steatite, spinel, mullite, titania, or beads made of these spheroids, glass fibers, etc., and these may be used alone or in combination of two or more. Also good. Among these, fused silica is preferable from the viewpoint of reducing the linear expansion coefficient, and alumina is preferable from the viewpoint of high thermal conductivity, and the filler shape is preferably spherical from the viewpoint of fluidity during molding and mold wear. In particular, spherical fused silica is preferable from the viewpoint of a balance between cost and performance.
無機充てん剤の配合量は、難燃性、成形性、吸湿性、線膨張係数低減及び強度向上の観点から、封止用エポキシ樹脂成形材料中70〜95質量%が好ましく、吸湿性、線膨張係数低減の観点から84〜95質量%がより好ましい。70質量%未満では、難燃性及び耐リフロー性が低下する傾向があり、95質量%を超えると流動性が不足する傾向がある。 The blending amount of the inorganic filler is preferably 70 to 95% by mass in the epoxy resin molding material for sealing, from the viewpoint of flame retardancy, moldability, hygroscopicity, reduction of linear expansion coefficient and improvement of strength, and hygroscopicity, linear expansion. From the viewpoint of reducing the coefficient, 84 to 95% by mass is more preferable. If it is less than 70% by mass, the flame retardancy and reflow resistance tend to decrease, and if it exceeds 95% by mass, the fluidity tends to be insufficient.
本発明の成形材料は、シラン化合物を配合してもよい。シラン化合物とは、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物である。
これらを例示すると、ビニルトリクロロシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(β−メトキシエトキシ)シラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−メタクリロキシプロピルトリエトキシシラン、γ−メタクリロキシプロピルメチルジメトキシシラン、γ−メタクリロキシプロピルメチルジエトキシシラン、γ−メタクリロキシプロピルジメチルメトキシシラン、γ−メタクリロキシプロピルジメチルエトキシシラン、γ−アクリロキシプロピルトリメトキシシラン、γ−アクリロキシプロピルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−グリシドキシプロピルメチルジメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、γ−グリシドキシプロピルジメチルメトキシシラン、γ−グリシドキシプロピルジメチルエトキシシラン、ビニルトリアセトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−メルカプトプロピルトリエトキシシラン、ビス(トリエトキシシリルプロピル)テトラスルフィド、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、γ−[ビス(β−ヒドロキシエチル)]アミノプロピルトリエトキシシラン、N−β−(アミノエチル)−γ−アミノプロピルトリエトキシシラン、N−(トリメトキシシリルプロピル)エチレンジアミン、イソシアネートプロピルトリメトキシシラン、イソシアネートプロピルトリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、ジフェニルシランジオール、トリフェニルメトキシシラン、トリフェニルエトキシシラン、トリフェニルシラノール、N−β−(N−ビニルベンジルアミノエチル)−γ−アミノプロピルトリメトキシシラン、γ−クロロプロピルトリメトキシシラン、ヘキサメチルジシラン、γ−アニリノプロピルトリメトキシシラン、γ−アニリノプロピルトリエトキシシラン、2−トリエトキシシリル−N−(1,3−ジメチル−ブチリデン)プロピルアミン、3−トリエトキシシリル−N−(1,3−ジメチル−ブチリデン)プロピルアミン、N−(3−トリエトキシシリルプロピル)フェニルイミン、3−(3−(トリエトキシシリル)プロピルアミノ)−N,N−ジメチルプロピオンアミド、N−トリエトキシシリルプロピル−β−アラニンメチルエステル、3−(トリエトキシシリルプロピル)ジヒドロ−3,5−フランジオン、ビス(トリメトキシシリル)ベンゼン等のシラン系化合物、1H−イミダゾール、2−アルキルイミダゾール、2,4−ジアルキルイミダゾール、4−ビニルイミダゾール等のイミダゾール化合物とγ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン等のγ−グリシドキシプロピルアルコキシシランの反応物であるイミダゾール系シラン化合物が挙げられる。これらシラン系化合物の1種を単独で用いても2種以上を組み合わせて用いてもよい。
The molding material of the present invention may contain a silane compound. Silane compounds are various silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane.
Examples of these are vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxy. Propylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyldimethylmethoxysilane, γ-methacryloxypropyldimethylethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyltriethoxysilane , Β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ Glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyldimethylmethoxysilane, γ-glycidoxypropyldimethylethoxysilane, vinyltriacetoxysilane, γ-mercaptopropyltrimethoxy Silane, γ-mercaptopropyltriethoxysilane, bis (triethoxysilylpropyl) tetrasulfide, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ- [bis (β-hydroxyethyl)] aminopropyltri Ethoxysilane, N-β- (aminoethyl) -γ-aminopropyltriethoxysilane, N- (trimethoxysilylpropyl) ethylenediamine, isocyanatepropyltrimethoxysilane, isocyanate group Pyrtriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenylsilanediol, triphenylmethoxy Silane, triphenylethoxysilane, triphenylsilanol, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, hexamethyldisilane, γ-anilinopropyltri Methoxysilane, γ-anilinopropyltriethoxysilane, 2-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine, 3-triethoxysilyl- -(1,3-dimethyl-butylidene) propylamine, N- (3-triethoxysilylpropyl) phenylimine, 3- (3- (triethoxysilyl) propylamino) -N, N-dimethylpropionamide, N- Silane compounds such as triethoxysilylpropyl-β-alanine methyl ester, 3- (triethoxysilylpropyl) dihydro-3,5-furandion, bis (trimethoxysilyl) benzene, 1H-imidazole, 2-alkylimidazole, It is a reaction product of imidazole compounds such as 2,4-dialkylimidazole and 4-vinylimidazole and γ-glycidoxypropylalkoxysilane such as γ-glycidoxypropyltrimethoxysilane and γ-glycidoxypropyltriethoxysilane. Imidazole-based silane compounds It is. One of these silane compounds may be used alone, or two or more thereof may be used in combination.
これらのシラン化合物は、1種または2種以上を組み合わせて重合したシラン化合物を用いても良い。重合したシラン化合物としては、流動性及び耐リフロー性のバランスの観点から、γ−グリシドキシプロピルトリメトキシシランのアルコキシシリル基部分を重合して得られる、重量平均分子量が3000以下の化合物が好ましい。これら重合したシラン化合物は1種を単独で用いても2種以上を組み合わせて用いてもよく、シラン化合物と組み合わせて用いてもよい。 These silane compounds may be silane compounds obtained by polymerizing one kind or a combination of two or more kinds. The polymerized silane compound is preferably a compound having a weight average molecular weight of 3000 or less obtained by polymerizing an alkoxysilyl group portion of γ-glycidoxypropyltrimethoxysilane from the viewpoint of a balance between fluidity and reflow resistance. . These polymerized silane compounds may be used alone or in combination of two or more, or may be used in combination with a silane compound.
シラン化合物の全配合量は成形性及び接着性の観点から封止用エポキシ樹脂成形材料中0.06〜2質量%が好ましく、0.1〜0.75質量%がより好ましく、0.2〜0.7質量%がさらに好ましい。0.06質量%未満では各種パッケージ部材との接着性が低下する傾向にあり、2質量%を超える場合にはボイド等の成形不良が発生しやすい傾向がある。 The total amount of the silane compound is preferably 0.06 to 2% by mass, more preferably 0.1 to 0.75% by mass in the epoxy resin molding material for sealing, from the viewpoints of moldability and adhesiveness. 0.7 mass% is more preferable. If it is less than 0.06% by mass, the adhesion to various package members tends to be reduced, and if it exceeds 2% by mass, molding defects such as voids tend to occur.
本発明の封止用エポキシ樹脂成形材料には、従来公知のカップリング剤を配合してもよい。たとえば、イソプロピルトリイソステアロイルチタネート、イソプロピルトリス(ジオクチルパイロホスフェート)チタネート、イソプロピルトリ(N−アミノエチル−アミノエチル)チタネート、テトラオクチルビス(ジトリデシルホスファイト)チタネート、テトラ(2,2−ジアリルオキシメチル−1−ブチル)ビス(ジトリデシル)ホスファイトチタネート、ビス(ジオクチルパイロホスフェート)オキシアセテートチタネート、ビス(ジオクチルパイロホスフェート)エチレンチタネート、イソプロピルトリオクタノイルチタネート、イソプロピルジメタクリルイソステアロイルチタネート、イソプロピルイソステアロイルジアクリルチタネート、イソプロピルトリ(ジオクチルホスフェート)チタネート、イソプロピルトリクミルフェニルチタネート、テトライソプロピルビス(ジオクチルホスファイト)チタネート等のチタネート系カップリング剤、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物等が挙げられ、これらの1種を単独で用いても2種以上を組み合わせて用いてもよい。またこれらカップリング剤の全配合量は成形性及び接着性の観点から封止用エポキシ樹脂成形材料中0.06〜2質量%が好ましく、0.1〜0.75質量%がより好ましく、0.2〜0.7質量%がさらに好ましい。0.06質量%未満では各種パッケージ部材との接着性が低下する傾向にあり、2質量%を超える場合にはボイド等の成形不良が発生しやすい傾向がある。 A conventionally well-known coupling agent may be mix | blended with the epoxy resin molding material for sealing of this invention. For example, isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, isopropyl tri (N-aminoethyl-aminoethyl) titanate, tetraoctyl bis (ditridecyl phosphite) titanate, tetra (2,2-diallyloxymethyl) -1-butyl) bis (ditridecyl) phosphite titanate, bis (dioctylpyrophosphate) oxyacetate titanate, bis (dioctylpyrophosphate) ethylene titanate, isopropyltrioctanoyl titanate, isopropyldimethacrylisostearoyl titanate, isopropylisostearoyldiacrylic Titanate, isopropyl tri (dioctyl phosphate) titanate, isopropyl tricumi Examples include titanate coupling agents such as phenyl titanate and tetraisopropyl bis (dioctyl phosphite) titanate, aluminum chelates, aluminum / zirconium compounds, etc. Even if one of these is used alone, two or more are combined. It may be used. Further, the total blending amount of these coupling agents is preferably 0.06 to 2% by mass, more preferably 0.1 to 0.75% by mass in the sealing epoxy resin molding material from the viewpoint of moldability and adhesiveness. More preferably, it is 2 to 0.7% by mass. If it is less than 0.06% by mass, the adhesion to various package members tends to be reduced, and if it exceeds 2% by mass, molding defects such as voids tend to occur.
また、本発明の封止用エポキシ樹脂成形材料には、ICの耐湿性、高温放置特性を向上させる目的で陰イオン交換体を必要に応じて配合することができる。陰イオン交換体としては特に制限はなく、従来公知のものを用いることができるが、たとえば、ハイドロタルサイト類や、マグネシウム、アルミニウム、チタン、ジルコニウム、ビスマスから選ばれる元素の含水酸化物等が挙げられ、これらを単独で用いても2種類以上を組み合わせて用いてもよい。なかでも、下記組成式(X)で示されるハイドロタルサイトが好ましい。
Mg1−XAlX(OH)2(CO3)X/2・mH2O …… (X)
(式(X)中、0<X≦0.5、mは正の数)
Moreover, an anion exchanger can be blended with the epoxy resin molding material for sealing of the present invention, if necessary, for the purpose of improving the moisture resistance and high temperature storage characteristics of the IC. The anion exchanger is not particularly limited, and conventionally known anion exchangers can be used. Examples thereof include hydrotalcites and hydrated oxides of elements selected from magnesium, aluminum, titanium, zirconium, and bismuth. These may be used alone or in combination of two or more. Of these, hydrotalcite represented by the following composition formula (X) is preferable.
Mg 1-X Al X (OH) 2 (CO 3 ) X / 2 · mH 2 O (X)
(In formula (X), 0 <X ≦ 0.5, m is a positive number)
陰イオン交換体の配合量は、ハロゲンイオンなどの陰イオンを捕捉できる十分量であれば特に限定されるものではないが、エポキシ樹脂100質量部に対して、0.1〜30質量部が好ましく、1〜5質量部がより好ましい。 The amount of the anion exchanger is not particularly limited as long as it is sufficient to capture anions such as halogen ions, but is preferably 0.1 to 30 parts by mass with respect to 100 parts by mass of the epoxy resin. 1 to 5 parts by mass is more preferable.
本発明の封止用エポキシ樹脂成形材料には、接着性をより向上させるために、必要に応じて接着促進剤を用いることができる。接着促進剤としては、たとえば、イミダゾール、トリアゾール、テトラゾール、トリアジン等の誘導体、アントラニル酸、没食子酸、マロン酸、リンゴ酸、マレイン酸、アミノフェノール、キノリン等及びこれらの誘導体、脂肪族酸アミド化合物、ジチオカルバミン酸塩、チアジアゾール誘導体などが挙げられ、これらの1種を単独で用いても2種類以上を組み合わせて用いてもよい。 In the sealing epoxy resin molding material of the present invention, an adhesion promoter can be used as necessary in order to further improve the adhesion. Examples of the adhesion promoter include derivatives such as imidazole, triazole, tetrazole and triazine, anthranilic acid, gallic acid, malonic acid, malic acid, maleic acid, aminophenol, quinoline and the like, and derivatives thereof, aliphatic acid amide compounds, Examples thereof include dithiocarbamate and thiadiazole derivatives. One of these may be used alone, or two or more may be used in combination.
本発明の封止用エポキシ樹脂成形材料には、必要に応じて離型剤を用いてもよい。離型剤としては、酸化型又は非酸化型のポリオレフィンをエポキシ樹脂100質量部に対して0.01〜10質量部用いることが好ましく、0.1〜5質量部用いることがより好ましい。0.01質量部未満では離型性が不十分となる傾向があり、10質量部を超えると接着性が低下する傾向がある。酸化型又は非酸化型のポリオレフィンとしては、ヘキスト株式会社製商品名H4やPE、PEDシリーズ等の数平均分子量が500〜10000程度の低分子量ポリエチレンなどが挙げられる。また、これ以外の離型剤としては、たとえばカルナバワックス、モンタン酸エステル、モンタン酸、ステアリン酸等が挙げられ、これらの1種を単独で用いても2種以上組み合わせて用いてもよい。酸化型又は非酸化型のポリオレフィンに加えてこれら他の離型剤を併用する場合、その配合量は合わせてエポキシ樹脂100質量部に対して0.l〜10質量部が好ましく、0.5〜3質量部がより好ましい。 A release agent may be used in the sealing epoxy resin molding material of the present invention as necessary. As a mold release agent, it is preferable to use 0.01-10 mass parts with respect to 100 mass parts of epoxy resins, and, as for a release agent, it is more preferable to use 0.1-5 mass parts. If it is less than 0.01 parts by mass, the releasability tends to be insufficient, and if it exceeds 10 parts by mass, the adhesiveness tends to decrease. Examples of the oxidized or non-oxidized polyolefin include low molecular weight polyethylene having a number average molecular weight of about 500 to 10,000, such as trade name H4 manufactured by Hoechst Corporation, PE, and PED series. Other examples of the release agent include carnauba wax, montanic acid ester, montanic acid, stearic acid, and the like. These may be used alone or in combination of two or more. When these other release agents are used in addition to the oxidized or non-oxidized polyolefin, the blending amount is set to 0.100 parts by mass with respect to 100 parts by mass of the epoxy resin. 1-10 mass parts is preferable, and 0.5-3 mass parts is more preferable.
本発明の封止用エポキシ樹脂成形材料には従来公知の難燃剤を必要に応じて配合することができる。たとえば、ブロム化エポキシ樹脂、三酸化アンチモン、赤リン、水酸化アルミニウム、水酸化マグネシウム、酸化亜鉛等の無機物及び/又はフェノール樹脂等の熱硬化性樹脂等で被覆された赤リン、リン酸エステル等のリン化合物、メラミン、メラミン誘導体、メラミン変性フェノール樹脂、トリアジン環を有する化合物、シアヌル酸誘導体、イソシアヌル酸誘導体等の窒素含有化合物、シクロホスファゼン等のリン及び窒素含有化合物、水酸化アルミニウム、水酸化マグネシウム及び下記組成式(XI)で示される複合金属水酸化物などが挙げられる。
p(M1 aOb)・q(M2 cOd)・r(M3 eOf)・mH2O ・・・ (XI)
(式(XI)で、M1、M2及びM3は互いに異なる金属元素を示し、a、b、c、d、p、q及びmは正の数、rは0又は正の数を示す。)
A conventionally known flame retardant can be blended in the sealing epoxy resin molding material of the present invention as required. For example, red phosphorus coated with inorganic substances such as brominated epoxy resin, antimony trioxide, red phosphorus, aluminum hydroxide, magnesium hydroxide, zinc oxide and / or thermosetting resins such as phenol resin, phosphoric acid ester, etc. Phosphorus compounds, melamine, melamine derivatives, melamine-modified phenol resins, compounds having a triazine ring, nitrogen-containing compounds such as cyanuric acid derivatives and isocyanuric acid derivatives, phosphorus and nitrogen-containing compounds such as cyclophosphazene, aluminum hydroxide, magnesium hydroxide And a composite metal hydroxide represented by the following composition formula (XI).
p (M 1 a O b) · q (M 2 c O d) · r (M 3 e O f) · mH 2 O ··· (XI)
(In formula (XI), M 1 , M 2 and M 3 represent different metal elements, a, b, c, d, p, q and m are positive numbers, and r is 0 or a positive number. .)
上記組成式(XI)中のM1、M2及びM3は互いに異なる金属元素であれば特に制限はないが、難燃性の観点からは、M1が第3周期の金属元素、IIA族のアルカリ土類金属元素、IVB族、IIB族、VIII族、IB族、IIIA族及びIVA族に属する金属元素から選ばれ、M2がIIIB〜IIB族の遷移金属元素から選ばれることが好ましく、M1がマグネシウム、カルシウム、アルミニウム、スズ、チタン、鉄、コバルト、ニッケル、銅及び亜鉛から選ばれ、M2が鉄、コバルト、ニッケル、銅及び亜鉛から選ばれることがより好ましい。流動性の観点からは、M1がマグネシウム、M2が亜鉛又はニッケルで、r=0のものが好ましい。p、q及びrのモル比は特に制限はないが、r=0で、p/qが1/99〜1/1であることが好ましい。なお、金属元素の分類は、典型元素をA亜族、遷移元素をB亜族とする長周期型の周期律表(出典:共立出版株式会社発行「化学大辞典4」1987年2月15日縮刷版第30刷)に基づいて行った。また、酸化亜鉛、錫酸亜鉛、硼酸亜鉛、酸化鉄、酸化モリブデン、モリブデン酸亜鉛、ジシクロペンタジエニル鉄等の金属元素を含む化合物などが挙げられ、これらの1種を単独で用いても2種以上を組み合わせて用いてもよい。難燃剤の配合量は特に制限はないが、エポキシ樹脂100質量部に対して1〜30質量部が好ましく、2〜15質量部がより好ましい。 M 1 , M 2 and M 3 in the composition formula (XI) are not particularly limited as long as they are different metal elements, but from the viewpoint of flame retardancy, M 1 is a metal element of the third period, group IIA Preferably selected from metal elements belonging to the alkaline earth metal elements, group IVB, group IIB, group VIII, group IB, group IIIA and group IVA, and M 2 is selected from transition metal elements of groups IIIB to IIB, More preferably, M 1 is selected from magnesium, calcium, aluminum, tin, titanium, iron, cobalt, nickel, copper and zinc, and M 2 is selected from iron, cobalt, nickel, copper and zinc. From the viewpoint of fluidity, it is preferable that M 1 is magnesium, M 2 is zinc or nickel, and r = 0. The molar ratio of p, q and r is not particularly limited, but preferably r = 0 and p / q is 1/99 to 1/1. The metal element is classified into a long-period periodic table in which the typical element is the A group and the transition element is the B group (Source: Kyoritsu Shuppan Co., Ltd., “Chemical Dictionary 4”, February 15, 1987). (Reduced plate 30th printing). Further, compounds containing metal elements such as zinc oxide, zinc stannate, zinc borate, iron oxide, molybdenum oxide, zinc molybdate, dicyclopentadienyl iron, etc. may be mentioned, and one of these may be used alone. Two or more kinds may be used in combination. Although the compounding quantity of a flame retardant does not have a restriction | limiting in particular, 1-30 mass parts is preferable with respect to 100 mass parts of epoxy resins, and 2-15 mass parts is more preferable.
また、本発明の封止用エポキシ樹脂成形材料には、カーボンブラック、有機染料、有機顔料、酸化チタン、鉛丹、ベンガラ等の着色剤を用いても良い。さらに、その他の添加剤として、シリコーンオイルやシリコーンゴム粉末等の応力緩和剤等を必要に応じて配合することができる。 Moreover, you may use coloring agents, such as carbon black, an organic dye, an organic pigment, a titanium oxide, a red lead, a bengara, for the epoxy resin molding material for sealing of this invention. Furthermore, as other additives, stress relaxation agents such as silicone oil and silicone rubber powder can be blended as required.
本発明の封止用エポキシ樹脂成形材料は、各種成分を均一に分散混合できるのであれば、いかなる手法を用いても調製できるが、一般的な手法として、所定の配合量の成分をミキサー等によって十分混合した後、ミキシングロール、押出機等によって溶融混練した後、冷却、粉砕する方法を挙げることができる。たとえば、上述した成分の所定量を均一に撹拌、混合し、予め70〜140℃に加熱してあるニーダー、ロール、エクストルーダーなどで混練、冷却し、粉砕するなどの方法で得ることができる。成形条件に合うような寸法及び質量でタブレット化すると使いやすい。 The epoxy resin molding material for sealing of the present invention can be prepared by any method as long as various components can be uniformly dispersed and mixed, but as a general method, components of a predetermined blending amount are mixed by a mixer or the like. A method of cooling and pulverizing after mixing sufficiently, melt-kneading with a mixing roll, an extruder or the like can be mentioned. For example, a predetermined amount of the above-described components can be uniformly stirred and mixed, and can be obtained by a method such as kneading, cooling, and pulverizing with a kneader, roll, extruder, or the like that has been heated to 70 to 140 ° C. in advance. It is easy to use if it is tableted with dimensions and mass that match the molding conditions.
本発明で得られる封止用エポキシ樹脂成形材料により封止した素子を備えた電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ等の支持部材に、半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子等の素子を搭載し、必要な部分を本発明の封止用エポキシ樹脂成形材料で封止した、電子部品装置などが挙げられる。このような電子部品装置としては、たとえば、リードフレーム上に半導体素子を固定し、ボンディングパッド等の素子の端子部とリード部をワイヤボンディングやバンプで接続した後、本発明の封止用エポキシ樹脂成形材料を用いてトランスファ成形等により封止してなる、DIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J−lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC、テープキャリアにバンプで接続した半導体チップを、本発明の封止用エポキシ樹脂成形材料で封止したTCP(Tape Carrier Package)、配線板やガラス上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子及び/又はコンデンサ、抵抗体、コイル等の受動素子を、本発明の封止用エポキシ樹脂成形材料で封止したCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール、裏面に配線板接続用の端子を形成した有機基板の表面に素子を搭載し、バンプ又はワイヤボンディングにより素子と有機基板に形成された配線を接続した後、本発明の封止用エポキシ樹脂成形材料で素子を封止したBGA(Ball Grid Array)、CSP(Chip Size Package)などが挙げられる。また、プリント回路板にも本発明の封止用エポキシ樹脂成形材料は有効に使用できる。 As an electronic component device provided with an element sealed with an epoxy resin molding material for sealing obtained in the present invention, a semiconductor chip is mounted on a support member such as a lead frame, a wired tape carrier, a wiring board, glass, or a silicon wafer. An electronic component device equipped with active elements such as transistors, diodes and thyristors, and passive elements such as capacitors, resistors and coils, and encapsulated with the epoxy resin molding material for sealing of the present invention Etc. As such an electronic component device, for example, a semiconductor element is fixed on a lead frame, a terminal portion of a device such as a bonding pad and a lead portion are connected by wire bonding or a bump, and then the sealing epoxy resin of the present invention is used. DIP (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package), SOJ (Small Out Package), which is sealed by molding using a molding material. General resin-sealed type I such as lead package, TSOP (Thin Small Outline Package), TQFP (Thin Quad Flat Package), etc. A semiconductor chip connected to a tape carrier with a bump is sealed with a tape carrier package (TCP) sealed with an epoxy resin molding material of the present invention, wiring formed on a wiring board or glass, wire bonding, flip chip bonding COB (Chip) in which active elements such as semiconductor chips, transistors, diodes, thyristors and / or passive elements such as capacitors, resistors, coils, etc., which are connected by solder, etc., are sealed with the sealing epoxy resin molding material of the present invention On Board) Modules, hybrid ICs, multi-chip modules, devices mounted on the surface of the organic substrate with the wiring board connection terminals formed on the back, and the devices and the wiring formed on the organic substrate were connected by bump or wire bonding After, the epoxy resin molding material for sealing of the present invention Examples thereof include BGA (Ball Grid Array) and CSP (Chip Size Package) in which the element is sealed with a material. Moreover, the epoxy resin molding material for sealing of the present invention can also be used effectively for printed circuit boards.
本発明の封止用エポキシ樹脂成形材料を用いて素子を封止する方法としては、低圧トランスファ成形法が最も一般的であるが、インジェクション成形法、圧縮成形法等を用いてもよい。 As a method for sealing an element using the epoxy resin molding material for sealing of the present invention, a low-pressure transfer molding method is the most common, but an injection molding method, a compression molding method, or the like may be used.
次に実施例により本発明を説明するが、本発明の範囲はこれらの実施例に限定されるものではない。
(実施例1〜11、比較例1〜7)
以下の成分をそれぞれ下記表1〜表3に示す質量部で配合し、混練温度80℃、混練時間10分の条件でロール混練を行い、実施例1〜11及び比較例1〜7の封止用エポキシ樹脂成形材料を作製した。なお表中の空欄は配合無しを表す。
EXAMPLES Next, although an Example demonstrates this invention, the scope of the present invention is not limited to these Examples.
(Examples 1-11, Comparative Examples 1-7)
The following components are blended in parts by mass shown in Tables 1 to 3 below, and roll kneading is performed under conditions of a kneading temperature of 80 ° C. and a kneading time of 10 minutes. An epoxy resin molding material was prepared. The blank in the table indicates no blending.
エポキシ樹脂としては、エポキシ当量196、融点106℃のビフェニル型エポキシ樹脂(エポキシ樹脂1、ジャパンエポキシレジン株式会社製商品名YX−4000)、
エポキシ当量242、融点118℃のチオジフェノール型エポキシ樹脂(エポキシ樹脂2、新日鐵化学株式会社製商品名YSLV−120TE)、
エポキシ当量192、融点79℃のビスフェノールF型エポキシ樹脂(エポキシ樹脂3、新日鐵化学株式会社製商品名YSLV−80XY)、
エポキシ当量241、軟化点96℃のビフェニレン骨格含有フェノール・アラルキル型エポキシ樹脂(エポキシ樹脂4、日本化薬株式会社製商品名CER−3000L)、
エポキシ当量375、軟化点80℃、臭素含有量48質量%のビスフェノールA型ブロム化エポキシ樹脂(エポキシ樹脂5)を使用した。
As an epoxy resin, an epoxy equivalent of 196, a biphenyl type epoxy resin having a melting point of 106 ° C. (epoxy resin 1, trade name YX-4000 manufactured by Japan Epoxy Resin Co., Ltd.),
A thiodiphenol type epoxy resin having an epoxy equivalent of 242 and a melting point of 118 ° C. (epoxy resin 2, trade name YSLV-120TE manufactured by Nippon Steel Chemical Co., Ltd.)
Bisphenol F type epoxy resin having an epoxy equivalent of 192 and a melting point of 79 ° C. (epoxy resin 3, trade name YSLV-80XY manufactured by Nippon Steel Chemical Co., Ltd.),
Biphenylene skeleton-containing phenol / aralkyl epoxy resin having an epoxy equivalent of 241 and a softening point of 96 ° C. (epoxy resin 4, Nippon Kayaku Co., Ltd., trade name CER-3000L),
A bisphenol A-type brominated epoxy resin (epoxy resin 5) having an epoxy equivalent of 375, a softening point of 80 ° C., and a bromine content of 48 mass% was used.
硬化剤としては、水酸基当量199、軟化点89℃のフェノール・アラルキル樹脂(硬化剤1、明和化成株式会社製商品名MEH−7851)、
水酸基当量176、軟化点70℃のフェノール・アラルキル樹脂(硬化剤2、三井化学株式会社製商品名ミレックスXLC)、
水酸基当量104、軟化点83℃のトリフェニルメタン型フェノール樹脂(硬化剤3、明和化成株式会社製商品名MEH−7500)、
水酸基当量156、軟化点83℃のフェノール樹脂(硬化剤4、エア・ウォーター株式会社製商品名HE−510)を使用した。
As a curing agent, a phenol aralkyl resin having a hydroxyl group equivalent of 199 and a softening point of 89 ° C. (curing agent 1, trade name MEH-7851 manufactured by Meiwa Kasei Co., Ltd.),
Phenol aralkyl resin having a hydroxyl group equivalent of 176 and a softening point of 70 ° C. (curing agent 2, trade name “Mirex XLC” manufactured by Mitsui Chemicals, Inc.)
Triphenylmethane type phenolic resin having a hydroxyl group equivalent of 104 and a softening point of 83 ° C. (curing agent 3, trade name MEH-7500 manufactured by Meiwa Kasei Co., Ltd.),
A phenol resin having a hydroxyl group equivalent of 156 and a softening point of 83 ° C. (curing agent 4, trade name HE-510 manufactured by Air Water Co., Ltd.) was used.
メラニンとしてはイカスミパウダー(メラニン1)、アイカブラックS(メラニン2)、硬化促進剤としてはトリフェニルホスフィンとp−ベンゾキノンとのベタイン型付加物(硬化促進剤1)、トリブチルホスフィンとp−ベンゾキノンとのベタイン型付加物(硬化促進剤2)、無機充てん剤としては平均粒径17.5μm、比表面積3.8m2/gの球状溶融シリカ、シラン化合物としてはγ−グリシドキシプロピルトリメトキシシラン(シラン化合物)、その他の添加成分としてはカルナバワックス、三酸化アンチモン、カーボンブラックを使用した。 As the melanin, squid ink powder (melanin 1), Aika black S (melanin 2), as the curing accelerator, betaine type adduct of triphenylphosphine and p-benzoquinone (curing accelerator 1), tributylphosphine and p-benzoquinone Betaine adduct (curing accelerator 2), spherical filler silica having an average particle size of 17.5 μm and specific surface area of 3.8 m 2 / g as an inorganic filler, and γ-glycidoxypropyltrimethoxysilane as a silane compound (Silane compound) and other additive components were carnauba wax, antimony trioxide, and carbon black.
実施例及び比較例の封止用エポキシ樹脂成形材料を、次の(1)〜(5)の各種特性試験により評価した。評価結果を下記表1〜表3に示す。なお、封止用エポキシ樹脂成形材料の成形は、明記しない限りトランスファ成形機により、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で行った。また、後硬化は180℃で5時間行った。
(1)スパイラルフロー
EMMI−1−66に準じたスパイラルフロー測定用金型を用いて、封止用エポキシ成形材料を上記条件で成形し、流動距離(cm)を求めた。
(2)熱時硬度
封止用エポキシ樹脂成形材料を上記条件で直径50mm×厚さ3mmの円板に成形し、成形後直ちにショアD型硬度計(株式会社上島製作所製HD−1120(タイプD))を用いて測定した。
(3)耐半田リフロー性
銅リードフレーム上に6×8mmのシリコンチップを搭載した外形寸法20×14×2mmの80ピンフラットパッケージを、封止用エポキシ樹脂成形材料を用いて上記条件で成形、後硬化して作製し、85℃、60%RHの条件で168時間加湿後、245度、10秒の条件でリフロー処理を行い、日立建機ファインテック株式会社製の超音波映像装置(HYE−FOCUS)によりパッケージ内部の剥離発生の有無を観察し、試験パッケージ数(10)に対する剥離発生パッケージ数で評価した。
(4)着色性
封止用エポキシ樹脂成形材料を上記条件で直径50mm×厚さ3mmの円板に成形し、分光式色彩計SE‐2000(日本電色工業株式会社製)を用いて、C光源、視野角2度、反射方式でL*a*b*表色系のL*(明度)を求め黒色度の指標とした。
(5)電気特性
銅リードフレーム上に8mm×8mm×0.4mmのシリコンチップを搭載した外形寸法20mm×20mm×1.4mmの176ピンフラットパッケージを、封止用エポキシ樹脂成形材料を用いて上記条件で作製し、試験パッケージ数(500)に対するショート不良が発生したパッケージ数で評価した。
The epoxy resin molding materials for sealing of Examples and Comparative Examples were evaluated by the following various characteristic tests (1) to (5). The evaluation results are shown in Tables 1 to 3 below. The epoxy resin molding material for sealing was molded by a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds unless otherwise specified. Further, post-curing was performed at 180 ° C. for 5 hours.
(1) Spiral flow Using a spiral flow measurement mold in accordance with EMMI-1-66, the sealing epoxy molding material was molded under the above conditions, and the flow distance (cm) was determined.
(2) Hardness under heat The epoxy resin molding material for sealing is molded into a disc having a diameter of 50 mm and a thickness of 3 mm under the above conditions, and immediately after molding, a Shore D hardness meter (HD-1120 (type D )).
(3) Solder reflow resistance An 80-pin flat package having an outer dimension of 20 × 14 × 2 mm, in which a 6 × 8 mm silicon chip is mounted on a copper lead frame, is molded under the above conditions using an epoxy resin molding material for sealing. It is made by post-curing, humidified for 168 hours under conditions of 85 ° C. and 60% RH, and then subjected to reflow treatment under conditions of 245 ° C. and 10 seconds. The presence or absence of occurrence of peeling inside the package was observed by FOCUS), and the number of peeling occurrence packages with respect to the number of test packages (10) was evaluated.
(4) Colorability The epoxy resin molding material for sealing was molded into a disk having a diameter of 50 mm and a thickness of 3 mm under the above conditions, and using a spectroscopic color meter SE-2000 (manufactured by Nippon Denshoku Industries Co., Ltd.), C L * (brightness) of the L * a * b * color system was determined by a light source, a viewing angle of 2 degrees, and a reflection method, and used as an index of blackness.
(5) Electrical characteristics A 176-pin flat package having an external dimension of 20 mm × 20 mm × 1.4 mm, in which a silicon chip of 8 mm × 8 mm × 0.4 mm is mounted on a copper lead frame, is formed by using an epoxy resin molding material for sealing. It was produced under the conditions, and was evaluated by the number of packages in which short-circuit defects occurred with respect to the number of test packages (500).
表1〜3から以下のことがわかった。本発明におけるメラニンを含有していない比較例1〜7は、いずれも流動性、着色性及び電気特性に劣っている。
これに対して実施例1〜11は電気特性に優れ、メラニン以外は同樹脂組成の比較例と比べて流動性、熱時硬度、耐リフロー性及び着色性も同等かそれ以上である。
The following things were understood from Tables 1-3. The comparative examples 1-7 which do not contain the melanin in this invention are all inferior to fluidity | liquidity, coloring property, and an electrical property.
On the other hand, Examples 1-11 are excellent in an electrical property, and fluidity, heat hardness, reflow resistance, and coloring property are equivalent or more compared with the comparative example of the same resin composition except melanin.
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CN109517355B (en) * | 2018-11-20 | 2020-12-15 | 江南大学 | Ultraviolet shielding composite material based on modified melanin nanoparticles and preparation method thereof |
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