JPH0518260B2 - - Google Patents
Info
- Publication number
- JPH0518260B2 JPH0518260B2 JP58124186A JP12418683A JPH0518260B2 JP H0518260 B2 JPH0518260 B2 JP H0518260B2 JP 58124186 A JP58124186 A JP 58124186A JP 12418683 A JP12418683 A JP 12418683A JP H0518260 B2 JPH0518260 B2 JP H0518260B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- well
- region
- channel misfet
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58124186A JPS6016455A (ja) | 1983-07-08 | 1983-07-08 | 相補型mis半導体集積回路装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58124186A JPS6016455A (ja) | 1983-07-08 | 1983-07-08 | 相補型mis半導体集積回路装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4124885A Division JPH05152523A (ja) | 1992-05-18 | 1992-05-18 | 相補型mis半導体集積回路装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6016455A JPS6016455A (ja) | 1985-01-28 |
| JPH0518260B2 true JPH0518260B2 (enExample) | 1993-03-11 |
Family
ID=14879108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58124186A Granted JPS6016455A (ja) | 1983-07-08 | 1983-07-08 | 相補型mis半導体集積回路装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6016455A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61176619A (ja) * | 1985-02-01 | 1986-08-08 | Mitsui Toatsu Chem Inc | α−メチルスチレン共重合体 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3955210A (en) * | 1974-12-30 | 1976-05-04 | International Business Machines Corporation | Elimination of SCR structure |
| JPS5238890A (en) * | 1975-09-23 | 1977-03-25 | Mitsubishi Electric Corp | Semiconductor device |
| JPS54104290A (en) * | 1978-02-02 | 1979-08-16 | Nec Corp | Complementary mos integrated circuit device |
-
1983
- 1983-07-08 JP JP58124186A patent/JPS6016455A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6016455A (ja) | 1985-01-28 |
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