JPH0515300B2 - - Google Patents

Info

Publication number
JPH0515300B2
JPH0515300B2 JP61237642A JP23764286A JPH0515300B2 JP H0515300 B2 JPH0515300 B2 JP H0515300B2 JP 61237642 A JP61237642 A JP 61237642A JP 23764286 A JP23764286 A JP 23764286A JP H0515300 B2 JPH0515300 B2 JP H0515300B2
Authority
JP
Japan
Prior art keywords
resist pattern
pattern
positive photoresist
ultraviolet
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61237642A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6392021A (ja
Inventor
Mitsuaki Minato
Isamu Hijikata
Akira Uehara
Muneo Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP23764286A priority Critical patent/JPS6392021A/ja
Publication of JPS6392021A publication Critical patent/JPS6392021A/ja
Publication of JPH0515300B2 publication Critical patent/JPH0515300B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP23764286A 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法 Granted JPS6392021A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23764286A JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23764286A JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Publications (2)

Publication Number Publication Date
JPS6392021A JPS6392021A (ja) 1988-04-22
JPH0515300B2 true JPH0515300B2 (en, 2012) 1993-03-01

Family

ID=17018349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23764286A Granted JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Country Status (1)

Country Link
JP (1) JPS6392021A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0427113A (ja) * 1990-04-23 1992-01-30 Tadahiro Omi レジスト処理装置、レジスト処理方法及びレジストパターン
US6620563B2 (en) * 2001-03-08 2003-09-16 Motorola, Inc. Lithography method for forming semiconductor devices on a wafer utilizing atomic force microscopy
EP1441121A2 (en) 2003-01-27 2004-07-28 Denso Corporation Vapor-compression refrigerant cycle system with refrigeration cycle and rankine cycle
US7181919B2 (en) * 2004-03-31 2007-02-27 Denso Corporation System utilizing waste heat of internal combustion engine

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60135943A (ja) * 1983-12-26 1985-07-19 Dainippon Screen Mfg Co Ltd レジスト層の強度向上方法および装置
JPS6352410A (ja) * 1986-08-22 1988-03-05 Hitachi Ltd 半導体装置の製造方法および加熱処理装置

Also Published As

Publication number Publication date
JPS6392021A (ja) 1988-04-22

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