JPH0513374B2 - - Google Patents
Info
- Publication number
- JPH0513374B2 JPH0513374B2 JP61005433A JP543386A JPH0513374B2 JP H0513374 B2 JPH0513374 B2 JP H0513374B2 JP 61005433 A JP61005433 A JP 61005433A JP 543386 A JP543386 A JP 543386A JP H0513374 B2 JPH0513374 B2 JP H0513374B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- etched
- vacuum
- pressure
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61005433A JPS62163325A (ja) | 1986-01-14 | 1986-01-14 | ドライエツチング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61005433A JPS62163325A (ja) | 1986-01-14 | 1986-01-14 | ドライエツチング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62163325A JPS62163325A (ja) | 1987-07-20 |
| JPH0513374B2 true JPH0513374B2 (https=) | 1993-02-22 |
Family
ID=11611060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61005433A Granted JPS62163325A (ja) | 1986-01-14 | 1986-01-14 | ドライエツチング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62163325A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0956951A (ja) * | 1995-08-29 | 1997-03-04 | Nara Sewing Mach Kogyo Kk | ミシンの糸倒れ防止装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03135024A (ja) * | 1989-10-20 | 1991-06-10 | Tokyo Electron Ltd | 基板の処理方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5561026A (en) * | 1978-10-30 | 1980-05-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Gas plasma etching device |
| JPS5729577A (en) * | 1980-07-30 | 1982-02-17 | Anelva Corp | Automatic continuous sputtering apparatus |
| JPS6050924A (ja) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | 半導体製造装置 |
| JPS60138908A (ja) * | 1983-12-27 | 1985-07-23 | Toshiba Corp | 減圧cvd装置 |
-
1986
- 1986-01-14 JP JP61005433A patent/JPS62163325A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0956951A (ja) * | 1995-08-29 | 1997-03-04 | Nara Sewing Mach Kogyo Kk | ミシンの糸倒れ防止装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62163325A (ja) | 1987-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |