JPH0512033B2 - - Google Patents

Info

Publication number
JPH0512033B2
JPH0512033B2 JP59085789A JP8578984A JPH0512033B2 JP H0512033 B2 JPH0512033 B2 JP H0512033B2 JP 59085789 A JP59085789 A JP 59085789A JP 8578984 A JP8578984 A JP 8578984A JP H0512033 B2 JPH0512033 B2 JP H0512033B2
Authority
JP
Japan
Prior art keywords
thermal spraying
low
pressure
chamber
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59085789A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60227856A (ja
Inventor
Fumyoshi Kanetani
Takeshi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kawasaki Heavy Industries Ltd
Original Assignee
Kawasaki Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Heavy Industries Ltd filed Critical Kawasaki Heavy Industries Ltd
Priority to JP59085789A priority Critical patent/JPS60227856A/ja
Publication of JPS60227856A publication Critical patent/JPS60227856A/ja
Publication of JPH0512033B2 publication Critical patent/JPH0512033B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)
  • Coating By Spraying Or Casting (AREA)
JP59085789A 1984-04-27 1984-04-27 低圧溶射装置 Granted JPS60227856A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59085789A JPS60227856A (ja) 1984-04-27 1984-04-27 低圧溶射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59085789A JPS60227856A (ja) 1984-04-27 1984-04-27 低圧溶射装置

Publications (2)

Publication Number Publication Date
JPS60227856A JPS60227856A (ja) 1985-11-13
JPH0512033B2 true JPH0512033B2 (enrdf_load_stackoverflow) 1993-02-17

Family

ID=13868652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59085789A Granted JPS60227856A (ja) 1984-04-27 1984-04-27 低圧溶射装置

Country Status (1)

Country Link
JP (1) JPS60227856A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5143139A (en) * 1988-06-06 1992-09-01 Osprey Metals Limited Spray deposition method and apparatus thereof
JP4649126B2 (ja) * 2004-06-11 2011-03-09 学校法人 中央大学 密着性に優れた溶射皮膜を形成する溶射方法
AU2007296573B2 (en) * 2006-09-11 2013-01-17 Enbio Limited Method of doping surfaces

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116066U (ja) * 1982-02-01 1983-08-08 三菱重工業株式会社 溶射装置

Also Published As

Publication number Publication date
JPS60227856A (ja) 1985-11-13

Similar Documents

Publication Publication Date Title
US4596718A (en) Vacuum plasma coating apparatus
JP2589033B2 (ja) レーザ補助による化学蒸着法
JPH0969554A (ja) 静電チャック部材およびその製造方法
JPH0512033B2 (enrdf_load_stackoverflow)
JP2002151494A (ja) 常圧プラズマ処理方法及びその装置
EP0730266A3 (en) Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk
JP2002105618A (ja) 真空処理室用表面構造
JPS60184676A (ja) 有被覆基材または有被覆部材の製造法
JPWO2020090164A1 (ja) 真空処理装置
JPH05326471A (ja) 半導体製造装置のクリーニング方法
JP2007530788A (ja) 半導体被覆基板の製造方法
JPH0524959A (ja) セラミツク回路基板の製造方法
JPH028357A (ja) 溶射方法
JP4766821B2 (ja) 基板にコーティングを施すための真空モジュール(及びその変形)とモジュールシステム
CN106756866B (zh) 一种金刚石涂层刀具的退涂方法
JPH0242308B2 (enrdf_load_stackoverflow)
JPH01205085A (ja) 金属の清浄化方法
JPH0445252A (ja) エキソ電子放出を利用したコーティング方法
SU1475973A1 (ru) Способ получени покрытий
JP2678298B2 (ja) 回転体の表面処理装置
JPS59209727A (ja) 超高真空用アルミ系材料の加工法
JPS6040598Y2 (ja) Pvd装置
JPS5929056A (ja) 溶射方法
JPH04157149A (ja) ステンレス製真空機器の表面処理方法
JPS6063722A (ja) 磁気デイスクの製造法