JPH051072Y2 - - Google Patents
Info
- Publication number
- JPH051072Y2 JPH051072Y2 JP1985130891U JP13089185U JPH051072Y2 JP H051072 Y2 JPH051072 Y2 JP H051072Y2 JP 1985130891 U JP1985130891 U JP 1985130891U JP 13089185 U JP13089185 U JP 13089185U JP H051072 Y2 JPH051072 Y2 JP H051072Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- sample
- intermediate electrode
- reaction vessel
- frequency power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 10
- 230000005284 excitation Effects 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130891U JPH051072Y2 (US20090163788A1-20090625-C00002.png) | 1985-08-29 | 1985-08-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130891U JPH051072Y2 (US20090163788A1-20090625-C00002.png) | 1985-08-29 | 1985-08-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6240829U JPS6240829U (US20090163788A1-20090625-C00002.png) | 1987-03-11 |
| JPH051072Y2 true JPH051072Y2 (US20090163788A1-20090625-C00002.png) | 1993-01-12 |
Family
ID=31028826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985130891U Expired - Lifetime JPH051072Y2 (US20090163788A1-20090625-C00002.png) | 1985-08-29 | 1985-08-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH051072Y2 (US20090163788A1-20090625-C00002.png) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0682623B2 (ja) * | 1985-12-02 | 1994-10-19 | 株式会社日立製作所 | 薄膜形成方法とその製造装置 |
| JP2652547B2 (ja) * | 1988-02-23 | 1997-09-10 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| JP2926711B2 (ja) * | 1988-05-13 | 1999-07-28 | 松下電器産業株式会社 | ドライエッチング装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58124223A (ja) * | 1982-01-20 | 1983-07-23 | Hitachi Ltd | プラズマ処理装置 |
| JPS5943880A (ja) * | 1982-09-03 | 1984-03-12 | Matsushita Electric Ind Co Ltd | ドライエツチング装置 |
-
1985
- 1985-08-29 JP JP1985130891U patent/JPH051072Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58124223A (ja) * | 1982-01-20 | 1983-07-23 | Hitachi Ltd | プラズマ処理装置 |
| JPS5943880A (ja) * | 1982-09-03 | 1984-03-12 | Matsushita Electric Ind Co Ltd | ドライエツチング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6240829U (US20090163788A1-20090625-C00002.png) | 1987-03-11 |
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