JPH0510426B2 - - Google Patents

Info

Publication number
JPH0510426B2
JPH0510426B2 JP60179025A JP17902585A JPH0510426B2 JP H0510426 B2 JPH0510426 B2 JP H0510426B2 JP 60179025 A JP60179025 A JP 60179025A JP 17902585 A JP17902585 A JP 17902585A JP H0510426 B2 JPH0510426 B2 JP H0510426B2
Authority
JP
Japan
Prior art keywords
film
hard carbon
carbon film
atm
hardness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60179025A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6240375A (ja
Inventor
Kenji Yamamoto
Takehisa Nakayama
Yoshihisa Oowada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP60179025A priority Critical patent/JPS6240375A/ja
Publication of JPS6240375A publication Critical patent/JPS6240375A/ja
Publication of JPH0510426B2 publication Critical patent/JPH0510426B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
JP60179025A 1985-08-14 1985-08-14 硬質カ−ボン膜 Granted JPS6240375A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60179025A JPS6240375A (ja) 1985-08-14 1985-08-14 硬質カ−ボン膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60179025A JPS6240375A (ja) 1985-08-14 1985-08-14 硬質カ−ボン膜

Publications (2)

Publication Number Publication Date
JPS6240375A JPS6240375A (ja) 1987-02-21
JPH0510426B2 true JPH0510426B2 (ko) 1993-02-09

Family

ID=16058796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60179025A Granted JPS6240375A (ja) 1985-08-14 1985-08-14 硬質カ−ボン膜

Country Status (1)

Country Link
JP (1) JPS6240375A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275850A (en) * 1988-04-20 1994-01-04 Hitachi, Ltd. Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias
JPH0649645A (ja) * 1992-07-31 1994-02-22 Yoshida Kogyo Kk <Ykk> 硬質多層膜形成体およびその製造方法
DE19929184A1 (de) * 1998-06-26 1999-12-30 Mclaughlin James A Vorrichtung und Verfahren für das Aufbringen von diamantartigem Kohlenstoff (DLC) oder anderen im Vakuum abscheidbaren Materialien auf ein Substrat
JP2007320142A (ja) * 2006-05-31 2007-12-13 Meisho Kiko Kk ナノインプリント用モールド
WO2018226370A1 (en) * 2017-06-08 2018-12-13 Applied Materials, Inc. High-density low temperature carbon films for hardmask and other patterning applications

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60145375A (ja) * 1984-01-09 1985-07-31 Nippon Telegr & Teleph Corp <Ntt> Νb膜表面の不動態化処理方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60145375A (ja) * 1984-01-09 1985-07-31 Nippon Telegr & Teleph Corp <Ntt> Νb膜表面の不動態化処理方法

Also Published As

Publication number Publication date
JPS6240375A (ja) 1987-02-21

Similar Documents

Publication Publication Date Title
Berg et al. Diamond-like carbon films produced in a butane plasma
US4783368A (en) High heat conductive insulated substrate and method of manufacturing the same
EP0347727B1 (fr) Procédé de dépôt d&#39;un revêtement de couleur noire sur un substrat et revêtement de couleur noire obtenu par ce procédé
JPS63239103A (ja) 立方晶窒化硼素被覆体およびその製造法
JP4122387B2 (ja) 複合硬質皮膜、その製造方法及び成膜装置
JPH0510426B2 (ko)
JP5295102B2 (ja) 導電性保護膜及びその製造方法
JPH02213474A (ja) 薄い硫化モリブデンフイルムの製法、硫化モリブデンフイルムおよび自己潤滑性層、電気光学的層および化学触媒作用性層の製法
JPH02239622A (ja) 安定化層のための保護層及びその製法
JPH06952B2 (ja) 硬質カ−ボン膜
JPH02182880A (ja) バッファ層を介した炭素または炭素を主成分とする被膜及びその作製方法
JP2004107102A (ja) 酸化炭素薄膜、酸化窒化炭素薄膜および酸化ダイヤモンド状炭素薄膜とこれら酸化炭素系薄膜の製造方法
JPH08288172A (ja) ケイ素添加無定形水素化炭素誘電体を有するコンデンサ
JPH0283816A (ja) 磁気記録媒体
Lazar Influence of the substrate-electrode applied bias voltage on the properties of sputtered aC: H thin films
JPH04103754A (ja) セラミック被覆材料とその製造方法
JPH0610135A (ja) 炭素膜の製造方法
JPH04103777A (ja) カーボン硬質膜を形成した基材
WO1998059355A3 (fr) Cathode froide et procedes de fabrication
JP2898338B2 (ja) カーボン硬質膜の被覆方法
JP2004010741A (ja) 撥水性被膜の形成方法および該方法で形成される撥水性被膜
JP3634460B2 (ja) 耐ハロゲン系ガス腐食性及び耐ハロゲン系プラズマ腐食性に優れたコーティング膜並びに該コーティング膜を施した積層構造体
RU2141006C1 (ru) Способ получения легированных углеродосодержащих покрытий
Gleason et al. Deposition of Titanilum Nitride Thin Films by Plasma Enhanced CVD and Reactive Sputtering
JPS62116767A (ja) カ−ボン硬質膜を被覆した金属部材