JPH0510351Y2 - - Google Patents
Info
- Publication number
- JPH0510351Y2 JPH0510351Y2 JP1982030660U JP3066082U JPH0510351Y2 JP H0510351 Y2 JPH0510351 Y2 JP H0510351Y2 JP 1982030660 U JP1982030660 U JP 1982030660U JP 3066082 U JP3066082 U JP 3066082U JP H0510351 Y2 JPH0510351 Y2 JP H0510351Y2
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- reaction tube
- tube
- region
- notch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3066082U JPS58133932U (ja) | 1982-03-04 | 1982-03-04 | 化合物半導体の気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3066082U JPS58133932U (ja) | 1982-03-04 | 1982-03-04 | 化合物半導体の気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58133932U JPS58133932U (ja) | 1983-09-09 |
JPH0510351Y2 true JPH0510351Y2 (enrdf_load_stackoverflow) | 1993-03-15 |
Family
ID=30042362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3066082U Granted JPS58133932U (ja) | 1982-03-04 | 1982-03-04 | 化合物半導体の気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58133932U (enrdf_load_stackoverflow) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS544066A (en) * | 1977-06-13 | 1979-01-12 | Hitachi Ltd | Growing method of silicon crystal under low pressure |
JPS5698823A (en) * | 1980-01-09 | 1981-08-08 | Nec Corp | Method of vapor growth of semiconductor of 3-5 group compound |
-
1982
- 1982-03-04 JP JP3066082U patent/JPS58133932U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58133932U (ja) | 1983-09-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4507169A (en) | Method and apparatus for vapor phase growth of a semiconductor | |
JPH0510351Y2 (enrdf_load_stackoverflow) | ||
US6916373B2 (en) | Semiconductor manufacturing method | |
JPH0680633B2 (ja) | 気相成長装置 | |
JPS6136372B2 (enrdf_load_stackoverflow) | ||
JPS5737827A (en) | Manufacture of semiconductor device | |
JPS62123093A (ja) | 分子線エピタキシヤル成長装置の基板装着方法 | |
JPS5593222A (en) | Crystal growing method | |
JPH02233585A (ja) | 基板ホルダ | |
JPS61132595A (ja) | 有機金属熱分解気相結晶成長装置 | |
JPS61215288A (ja) | 半導体製造方法 | |
JPH01234391A (ja) | 基板ホルダー | |
JP3717220B2 (ja) | 液相エピタキシャル成長法 | |
JPS5923104B2 (ja) | 軟x線露光用マスクの製造方法 | |
KR950009247Y1 (ko) | 반도체 소자의 에피택셜층 형성을 위한 보우트 | |
JPS62137821A (ja) | 半導体気相成長方法 | |
JPS6226171B2 (enrdf_load_stackoverflow) | ||
JPS61155292A (ja) | 気相成長装置 | |
JPH10163117A (ja) | 化合物半導体の製造方法および製造装置 | |
JPS5931711Y2 (ja) | 化合物半導体の溶液成長装置 | |
JPS593848B2 (ja) | リンカインジウムノ キソウエツチングホウホウ | |
JPH0474794A (ja) | 基板ホルダおよび基板の装着方法 | |
JPS58121623A (ja) | 多層半導体の気相成長法 | |
JPH02284417A (ja) | 気相結晶成長装置 | |
JPH0982642A (ja) | 結晶成長用基板の加熱装置 |