JPH0482174B2 - - Google Patents
Info
- Publication number
- JPH0482174B2 JPH0482174B2 JP61162272A JP16227286A JPH0482174B2 JP H0482174 B2 JPH0482174 B2 JP H0482174B2 JP 61162272 A JP61162272 A JP 61162272A JP 16227286 A JP16227286 A JP 16227286A JP H0482174 B2 JPH0482174 B2 JP H0482174B2
- Authority
- JP
- Japan
- Prior art keywords
- original image
- information
- additional information
- exposure apparatus
- image information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61162272A JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61162272A JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6317524A JPS6317524A (ja) | 1988-01-25 |
| JPH0482174B2 true JPH0482174B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-25 |
Family
ID=15751308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61162272A Granted JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6317524A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434777A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Mask aligner |
-
1986
- 1986-07-09 JP JP61162272A patent/JPS6317524A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6317524A (ja) | 1988-01-25 |
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