JPH0480117B2 - - Google Patents
Info
- Publication number
- JPH0480117B2 JPH0480117B2 JP2502125A JP50212590A JPH0480117B2 JP H0480117 B2 JPH0480117 B2 JP H0480117B2 JP 2502125 A JP2502125 A JP 2502125A JP 50212590 A JP50212590 A JP 50212590A JP H0480117 B2 JPH0480117 B2 JP H0480117B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- copper
- lead
- composition
- stripping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 67
- 229910052802 copper Inorganic materials 0.000 description 67
- 239000010949 copper Substances 0.000 description 67
- 239000000203 mixture Substances 0.000 description 61
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 53
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 38
- 229910001128 Sn alloy Inorganic materials 0.000 description 31
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 31
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 26
- 238000000034 method Methods 0.000 description 26
- 239000002253 acid Substances 0.000 description 22
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 22
- 239000010802 sludge Substances 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000007864 aqueous solution Substances 0.000 description 17
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 16
- 239000002244 precipitate Substances 0.000 description 14
- 229910000679 solder Inorganic materials 0.000 description 14
- 239000006227 byproduct Substances 0.000 description 13
- 229940098779 methanesulfonic acid Drugs 0.000 description 13
- 239000000243 solution Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 229910001959 inorganic nitrate Inorganic materials 0.000 description 8
- 238000005507 spraying Methods 0.000 description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 7
- 229910017604 nitric acid Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 5
- 150000002823 nitrates Chemical class 0.000 description 5
- 238000007654 immersion Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- GSJBKPNSLRKRNR-UHFFFAOYSA-N $l^{2}-stannanylidenetin Chemical compound [Sn].[Sn] GSJBKPNSLRKRNR-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- WIKSRXFQIZQFEH-UHFFFAOYSA-N [Cu].[Pb] Chemical class [Cu].[Pb] WIKSRXFQIZQFEH-UHFFFAOYSA-N 0.000 description 1
- VWIYFEZYBCIRSF-UHFFFAOYSA-N [Sn].NC(N)=S Chemical class [Sn].NC(N)=S VWIYFEZYBCIRSF-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- -1 electroplated Chemical compound 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- YAFKGUAJYKXPDI-UHFFFAOYSA-J lead tetrafluoride Chemical compound F[Pb](F)(F)F YAFKGUAJYKXPDI-UHFFFAOYSA-J 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- LJRGBERXYNQPJI-UHFFFAOYSA-M sodium;3-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC(S([O-])(=O)=O)=C1 LJRGBERXYNQPJI-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/334,918 US4957653A (en) | 1989-04-07 | 1989-04-07 | Composition containing alkane sulfonic acid and ferric nitrate for stripping tin or tin-lead alloy from copper surfaces, and method for stripping tin or tin-lead alloy |
| US334918 | 1989-04-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03505349A JPH03505349A (ja) | 1991-11-21 |
| JPH0480117B2 true JPH0480117B2 (en, 2012) | 1992-12-17 |
Family
ID=23309441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2502125A Granted JPH03505349A (ja) | 1989-04-07 | 1990-01-04 | アルカンスルホン酸と硝酸第２鉄を含む、銅表面からスズまたはスズ―鉛合金を剥離するための組成物、およびスズまたはスズ―鉛合金を剥離する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4957653A (en, 2012) |
| EP (1) | EP0418333B1 (en, 2012) |
| JP (1) | JPH03505349A (en, 2012) |
| CA (1) | CA2007608C (en, 2012) |
| DE (1) | DE69014789T2 (en, 2012) |
| WO (1) | WO1990012071A1 (en, 2012) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4921571A (en) * | 1989-07-28 | 1990-05-01 | Macdermid, Incorporated | Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces |
| US5037482A (en) * | 1990-02-16 | 1991-08-06 | Macdermid, Incorporated | Composition and method for improving adhesion of coatings to copper surfaces |
| US5017267A (en) * | 1990-07-17 | 1991-05-21 | Macdermid, Incorporated | Composition and method for stripping tin or tin-lead alloy from copper surfaces |
| US5244539A (en) * | 1992-01-27 | 1993-09-14 | Ardrox, Inc. | Composition and method for stripping films from printed circuit boards |
| US5234542A (en) * | 1992-03-04 | 1993-08-10 | Macdermid, Incorporated | Composition and process for stripping tin from copper surfaces |
| ES2141758T3 (es) * | 1993-11-29 | 2000-04-01 | Procter & Gamble | Composiciones para la eliminacion de manchas de cal. |
| US5677271A (en) * | 1993-11-29 | 1997-10-14 | The Procter & Gamble Company | Limescale removal compositions |
| US5741432A (en) * | 1995-01-17 | 1998-04-21 | The Dexter Corporation | Stabilized nitric acid compositions |
| US5512201A (en) * | 1995-02-13 | 1996-04-30 | Applied Chemical Technologies, Inc. | Solder and tin stripper composition |
| US5505872A (en) * | 1995-05-23 | 1996-04-09 | Applied Electroless Concepts, Inc. | Solder stripper recycle and reuse |
| US5911907A (en) * | 1995-08-30 | 1999-06-15 | Surface Tek Specialty Products, Inc. | Composition and method for stripping tin and tin-lead from copper surfaces |
| CA2253679A1 (fr) * | 1998-01-26 | 1999-07-26 | Elf Atochem S.A. | Passivation des aciers inoxydables en milieu acide organosulfonique |
| US6036758A (en) * | 1998-08-10 | 2000-03-14 | Pmd (U.K.) Limited | Surface treatment of copper |
| FI120052B (fi) * | 2007-04-13 | 2009-06-15 | Yara Suomi Oy | Menetelmä syövytysliuoksen käsittelemiseksi ja uudelleenkäyttämiseksi |
| TWI558817B (zh) | 2010-04-15 | 2016-11-21 | 恩特葛瑞斯股份有限公司 | 廢棄印刷電路板之回收利用方法 |
| US20120244050A1 (en) * | 2011-03-25 | 2012-09-27 | Dowa Electronics Materials Co., Ltd. | Cleaning agent for silver-containing composition, method for removing silver-containing composition, and method for recovering silver |
| AP2014007781A0 (en) | 2011-12-15 | 2014-07-31 | Advanced Tech Materials | Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment |
| DE102013009586A1 (de) | 2013-02-26 | 2014-08-28 | Ulrich Loser | Hydrometallurgisches Verfahren zur Rückgewinnung von lll-V-, ll-Vl- oder l-lll-Vl2- Verbindungshalbleitermaterialien aus High-Tech- bzw, Green-Tech-Abfällen, bzw. Elektro- und Elektronikabfällen |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3677949A (en) * | 1970-09-04 | 1972-07-18 | Enthone | Selectively stripping tin and/or lead from copper substrates |
| US3926699A (en) * | 1974-06-17 | 1975-12-16 | Rbp Chemical Corp | Method of preparing printed circuit boards with terminal tabs |
| US4004956A (en) * | 1974-08-14 | 1977-01-25 | Enthone, Incorporated | Selectively stripping tin or tin-lead alloys from copper substrates |
| US3990982A (en) * | 1974-12-18 | 1976-11-09 | Rbp Chemical Corporation | Composition for stripping lead-tin solder |
| US4306933A (en) * | 1980-02-11 | 1981-12-22 | Chemline Industries | Tin/tin-lead stripping solutions |
| US4297257A (en) * | 1980-04-17 | 1981-10-27 | Dart Industries Inc. | Metal stripping composition and method |
| JPS57164984A (en) * | 1981-04-06 | 1982-10-09 | Metsuku Kk | Exfoliating solution for tin or tin alloy |
| DE3208124A1 (de) * | 1981-08-17 | 1983-09-08 | Elget Ing.-Büro für grafische und elektronische Technik, 8501 Oberasbach | Stripper |
| IT1144797B (it) * | 1981-10-14 | 1986-10-29 | Alfachimici Spa | Soluzione per l asportazione di stagno o lega stagno piombo da un substrato mediante operazione a spruzzo |
| US4397753A (en) * | 1982-09-20 | 1983-08-09 | Circuit Chemistry Corporation | Solder stripping solution |
| US4673521A (en) * | 1986-01-21 | 1987-06-16 | Enthone, Incorporated | Process for regenerating solder stripping solutions |
| US4687545A (en) * | 1986-06-18 | 1987-08-18 | Macdermid, Incorporated | Process for stripping tin or tin-lead alloy from copper |
| US4713144A (en) * | 1986-08-01 | 1987-12-15 | Ardrox Inc. | Composition and method for stripping films from printed circuit boards |
-
1989
- 1989-04-07 US US07/334,918 patent/US4957653A/en not_active Expired - Lifetime
-
1990
- 1990-01-04 WO PCT/US1990/000033 patent/WO1990012071A1/en active IP Right Grant
- 1990-01-04 EP EP90902052A patent/EP0418333B1/en not_active Expired - Lifetime
- 1990-01-04 DE DE69014789T patent/DE69014789T2/de not_active Expired - Fee Related
- 1990-01-04 JP JP2502125A patent/JPH03505349A/ja active Granted
- 1990-01-11 CA CA002007608A patent/CA2007608C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2007608A1 (en) | 1990-10-07 |
| WO1990012071A1 (en) | 1990-10-18 |
| EP0418333A4 (en) | 1991-09-25 |
| JPH03505349A (ja) | 1991-11-21 |
| DE69014789T2 (de) | 1995-05-18 |
| CA2007608C (en) | 2002-06-11 |
| US4957653A (en) | 1990-09-18 |
| DE69014789D1 (de) | 1995-01-19 |
| EP0418333A1 (en) | 1991-03-27 |
| EP0418333B1 (en) | 1994-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
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| US5017267A (en) | Composition and method for stripping tin or tin-lead alloy from copper surfaces | |
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| US4713144A (en) | Composition and method for stripping films from printed circuit boards | |
| US5244539A (en) | Composition and method for stripping films from printed circuit boards | |
| US5035749A (en) | Process for removing tin and tin-lead alloy from copper substrates | |
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| TWI460311B (zh) | 用於撓性配線基板之鎳－鉻合金剝離劑 | |
| US4919752A (en) | Bath solution and process for the removal of lead/tim, lead or tin coatings from copper or nickel surfaces | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |