JPH0480046U - - Google Patents
Info
- Publication number
- JPH0480046U JPH0480046U JP12465390U JP12465390U JPH0480046U JP H0480046 U JPH0480046 U JP H0480046U JP 12465390 U JP12465390 U JP 12465390U JP 12465390 U JP12465390 U JP 12465390U JP H0480046 U JPH0480046 U JP H0480046U
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- heating furnace
- manufacturing apparatus
- semiconductor device
- device manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000010926 purge Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は、本考案の一実施例を示す構成図、第
２図は、従来装置を示す構成図である。 １……ガスボンベ、２……加熱炉、３……半導
体ウエーハ、４……予備加熱器。
２図は、従来装置を示す構成図である。 １……ガスボンベ、２……加熱炉、３……半導
体ウエーハ、４……予備加熱器。
Claims (1)
- 【実用新案登録請求の範囲】 加熱炉を有し、加熱炉内で半導体ウエーハの熱
処理を行う半導体装置の製造装置であつて、 加熱炉は、炉内パージ用ガスの供給配管系に、
炉内パージ用ガスを加熱炉内に導入する直前に炉
体と同じ温度に予備加熱する機構を有することを
特徴とする半導体装置の製造装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12465390U JPH0480046U (ja) | 1990-11-27 | 1990-11-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12465390U JPH0480046U (ja) | 1990-11-27 | 1990-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0480046U true JPH0480046U (ja) | 1992-07-13 |
Family
ID=31872290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12465390U Pending JPH0480046U (ja) | 1990-11-27 | 1990-11-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0480046U (ja) |
-
1990
- 1990-11-27 JP JP12465390U patent/JPH0480046U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5277590A (en) | Semiconductor producing device | |
| JPH0480046U (ja) | ||
| ATE78633T1 (de) | Verfahren zum selektiven abscheiden eines silicids eines hochschmelzenden metalls auf freiliegenden siliciumzonen. | |
| JPS63164220U (ja) | ||
| JPH0434733U (ja) | ||
| JPS6212943U (ja) | ||
| JPH0323926U (ja) | ||
| JPS60149130U (ja) | 半導体熱処理炉 | |
| JPS6343423U (ja) | ||
| JPH0171442U (ja) | ||
| JPS5948040U (ja) | 熱処理装置 | |
| JPS6381267U (ja) | ||
| JPH0296727U (ja) | ||
| JPS53105975A (en) | Heat treatment for silicon oxide film | |
| JPS61125161U (ja) | ||
| JPH0331U (ja) | ||
| JPS5565431A (en) | Semiconductor heating core tube | |
| JPS5613720A (en) | Heat treating device | |
| JPH01153632U (ja) | ||
| JPH0231124U (ja) | ||
| JPH01160400U (ja) | ||
| JPS5222626A (en) | Control device of secondary air used for cleaning of exhausted gas | |
| JPS6314994U (ja) | ||
| JPS5827800U (ja) | ナトリウムハンドリング装置 | |
| JPH01120326U (ja) |