JPH0479358U - - Google Patents

Info

Publication number
JPH0479358U
JPH0479358U JP12292690U JP12292690U JPH0479358U JP H0479358 U JPH0479358 U JP H0479358U JP 12292690 U JP12292690 U JP 12292690U JP 12292690 U JP12292690 U JP 12292690U JP H0479358 U JPH0479358 U JP H0479358U
Authority
JP
Japan
Prior art keywords
exposure apparatus
exposure
pattern
exposes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12292690U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12292690U priority Critical patent/JPH0479358U/ja
Publication of JPH0479358U publication Critical patent/JPH0479358U/ja
Pending legal-status Critical Current

Links

JP12292690U 1990-11-24 1990-11-24 Pending JPH0479358U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12292690U JPH0479358U (enrdf_load_stackoverflow) 1990-11-24 1990-11-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12292690U JPH0479358U (enrdf_load_stackoverflow) 1990-11-24 1990-11-24

Publications (1)

Publication Number Publication Date
JPH0479358U true JPH0479358U (enrdf_load_stackoverflow) 1992-07-10

Family

ID=31870660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12292690U Pending JPH0479358U (enrdf_load_stackoverflow) 1990-11-24 1990-11-24

Country Status (1)

Country Link
JP (1) JPH0479358U (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002107942A (ja) * 2000-10-04 2002-04-10 Ricoh Opt Ind Co Ltd 露光方法
JP2002162747A (ja) * 2000-11-27 2002-06-07 Ricoh Opt Ind Co Ltd 多段階露光による三次元構造体製造方法
JP2002268230A (ja) * 2001-03-09 2002-09-18 Asahi Kasei Corp 感光性樹脂凸版の製造方法、装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002107942A (ja) * 2000-10-04 2002-04-10 Ricoh Opt Ind Co Ltd 露光方法
JP2002162747A (ja) * 2000-11-27 2002-06-07 Ricoh Opt Ind Co Ltd 多段階露光による三次元構造体製造方法
JP2002268230A (ja) * 2001-03-09 2002-09-18 Asahi Kasei Corp 感光性樹脂凸版の製造方法、装置

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