JPH0479358U - - Google Patents
Info
- Publication number
- JPH0479358U JPH0479358U JP12292690U JP12292690U JPH0479358U JP H0479358 U JPH0479358 U JP H0479358U JP 12292690 U JP12292690 U JP 12292690U JP 12292690 U JP12292690 U JP 12292690U JP H0479358 U JPH0479358 U JP H0479358U
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- exposure
- pattern
- exposes
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
Description
第１図は、本考案の露光装置の一実施例を説明
するための概略構成図、第２図は、第１図の実施
例の露光装置を用いて、多重露光を行なつた一例
を説明するための工程図、第３図は、第１図の実
施例の露光装置を用いて、パターンの寸法を小さ
くしながら、多重露光を行なつた一例を説明する
ための工程図、第４図は、本考案の露光装置の他
の実施例を説明するための概略構成図、第５図は
、第４図の実施例の露光装置を用いて、多重露光
を行なつた一例を説明するための工程図、第６図
は、第４図の実施例の露光装置を用いて、パター
ンの寸法を小さくしながら、多重露光を行なつた
一例を説明するための工程図、第７図は、従来の
露光装置によるパターンの形成方法を説明するた
めの工程図、第８図は、従来の露光装置の概略構
成図である。
１１……光源、１２……フオトマスク、１３…
…ステツパー、１４……電子デバイス基板、１５
……露光パターン、１６……ＸＹコントローラ、
１７……ＣＰＵ、１８……ソフトウエア。
FIG. 1 is a schematic configuration diagram for explaining an embodiment of the exposure apparatus of the present invention, and FIG. 2 is an illustration of an example of multiple exposure using the exposure apparatus of the embodiment of FIG. 1. FIG. 3 is a process diagram for explaining an example of performing multiple exposure while reducing the pattern size using the exposure apparatus of the embodiment shown in FIG. 5 is a schematic configuration diagram for explaining another embodiment of the exposure apparatus of the present invention, and FIG. 5 is a diagram for explaining an example of multiple exposure using the exposure apparatus of the embodiment of FIG. 4. FIG. 6 is a process diagram for explaining an example of performing multiple exposure while reducing the pattern size using the exposure apparatus of the embodiment shown in FIG. 4, and FIG. FIG. 8, a process diagram for explaining a pattern forming method using a conventional exposure apparatus, is a schematic configuration diagram of a conventional exposure apparatus. 11...Light source, 12...Photomask, 13...
...Stepper, 14...Electronic device board, 15
...Exposure pattern, 16...XY controller,
17...CPU, 18...Software.
Claims (1)
ーンの露光を行なう露光装置において、前記パタ
ーンとして、透過量の平面的部位が信号により変
化可能なマスクを用いることを特徴とする露光装
置。 (2) 基板上に形成された感光層に、所定のパタ
ーンの露光を行なう露光装置において、前記パタ
ーンとして、発光強度の平面的部位が信号により
変化可能である露光用光源を用いることを特徴と
する露光装置。[Claims for Utility Model Registration] (1) In an exposure apparatus that exposes a photosensitive layer formed on a substrate in a predetermined pattern, the pattern is a mask whose planar area of transmission amount can be changed according to a signal. An exposure apparatus characterized in that it is used. (2) An exposure apparatus that exposes a photosensitive layer formed on a substrate to light in a predetermined pattern, characterized in that the pattern uses an exposure light source whose planar region of emission intensity can be changed by a signal. exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12292690U JPH0479358U (en) | 1990-11-24 | 1990-11-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12292690U JPH0479358U (en) | 1990-11-24 | 1990-11-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0479358U true JPH0479358U (en) | 1992-07-10 |
Family
ID=31870660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12292690U Pending JPH0479358U (en) | 1990-11-24 | 1990-11-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0479358U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002107942A (en) * | 2000-10-04 | 2002-04-10 | Ricoh Opt Ind Co Ltd | Exposure method |
| JP2002162747A (en) * | 2000-11-27 | 2002-06-07 | Ricoh Opt Ind Co Ltd | Manufacturing method for three-dimensional structure by multistep exposure |
| JP2002268230A (en) * | 2001-03-09 | 2002-09-18 | Asahi Kasei Corp | Method and device for manufacturing photosensitive resin letterpress |
-
1990
- 1990-11-24 JP JP12292690U patent/JPH0479358U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002107942A (en) * | 2000-10-04 | 2002-04-10 | Ricoh Opt Ind Co Ltd | Exposure method |
| JP4573418B2 (en) * | 2000-10-04 | 2010-11-04 | リコー光学株式会社 | Exposure method |
| JP2002162747A (en) * | 2000-11-27 | 2002-06-07 | Ricoh Opt Ind Co Ltd | Manufacturing method for three-dimensional structure by multistep exposure |
| JP2002268230A (en) * | 2001-03-09 | 2002-09-18 | Asahi Kasei Corp | Method and device for manufacturing photosensitive resin letterpress |
| JP4698044B2 (en) * | 2001-03-09 | 2011-06-08 | 旭化成イーマテリアルズ株式会社 | Manufacturing method and apparatus for photosensitive resin relief printing plate |
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