JPH0479129B2 - - Google Patents

Info

Publication number
JPH0479129B2
JPH0479129B2 JP59255589A JP25558984A JPH0479129B2 JP H0479129 B2 JPH0479129 B2 JP H0479129B2 JP 59255589 A JP59255589 A JP 59255589A JP 25558984 A JP25558984 A JP 25558984A JP H0479129 B2 JPH0479129 B2 JP H0479129B2
Authority
JP
Japan
Prior art keywords
light
mark
polarized light
wafer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59255589A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61134022A (ja
Inventor
Hideki Ine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59255589A priority Critical patent/JPS61134022A/ja
Publication of JPS61134022A publication Critical patent/JPS61134022A/ja
Priority to US07/319,820 priority patent/US4937459A/en
Publication of JPH0479129B2 publication Critical patent/JPH0479129B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59255589A 1984-11-16 1984-12-05 位置合せ信号検出装置 Granted JPS61134022A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59255589A JPS61134022A (ja) 1984-12-05 1984-12-05 位置合せ信号検出装置
US07/319,820 US4937459A (en) 1984-11-16 1989-03-06 Alignment signal detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59255589A JPS61134022A (ja) 1984-12-05 1984-12-05 位置合せ信号検出装置

Publications (2)

Publication Number Publication Date
JPS61134022A JPS61134022A (ja) 1986-06-21
JPH0479129B2 true JPH0479129B2 (show.php) 1992-12-15

Family

ID=17280821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59255589A Granted JPS61134022A (ja) 1984-11-16 1984-12-05 位置合せ信号検出装置

Country Status (1)

Country Link
JP (1) JPS61134022A (show.php)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5158439B2 (ja) 2006-04-17 2013-03-06 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
JPWO2008007632A1 (ja) 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
JPS61134022A (ja) 1986-06-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term