JPH047654U - - Google Patents
Info
- Publication number
- JPH047654U JPH047654U JP4892990U JP4892990U JPH047654U JP H047654 U JPH047654 U JP H047654U JP 4892990 U JP4892990 U JP 4892990U JP 4892990 U JP4892990 U JP 4892990U JP H047654 U JPH047654 U JP H047654U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holding mechanism
- substrate holder
- substrate holding
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 7
- 239000003575 carbonaceous material Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例が採用されたプラズ
マＣＶＤ装置の縦断面概略構成図、第２図は第１
図の矢視略図、第３図は第２図の縦断面部分図
、第４図は高純度グラフアイト及びステンレスの
物理的特性を示す図、第５図は高純度グラフアイ
ト及びＳＵＳ３０４の比較実験結果を示す図であ
る。 １……成膜室、８……基板ホルダ、９……基板
。
マＣＶＤ装置の縦断面概略構成図、第２図は第１
図の矢視略図、第３図は第２図の縦断面部分図
、第４図は高純度グラフアイト及びステンレスの
物理的特性を示す図、第５図は高純度グラフアイ
ト及びＳＵＳ３０４の比較実験結果を示す図であ
る。 １……成膜室、８……基板ホルダ、９……基板
。
Claims (1)
- 【実用新案登録請求の範囲】 基板ホルダを有し、成膜処理すべき基板を保持
するための真空成膜装置の基板保持機構において
、 前記基板ホルダは、カーボン材から構成されて
いる、 真空成膜装置の基板保持機構。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990048929U JP2523463Y2 (ja) | 1990-05-09 | 1990-05-09 | 真空成膜装置の基板保持機構 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990048929U JP2523463Y2 (ja) | 1990-05-09 | 1990-05-09 | 真空成膜装置の基板保持機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH047654U true JPH047654U (ja) | 1992-01-23 |
| JP2523463Y2 JP2523463Y2 (ja) | 1997-01-22 |
Family
ID=31566177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990048929U Expired - Lifetime JP2523463Y2 (ja) | 1990-05-09 | 1990-05-09 | 真空成膜装置の基板保持機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2523463Y2 (ja) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63140085A (ja) * | 1986-11-29 | 1988-06-11 | Kyocera Corp | 成膜装置 |
-
1990
- 1990-05-09 JP JP1990048929U patent/JP2523463Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63140085A (ja) * | 1986-11-29 | 1988-06-11 | Kyocera Corp | 成膜装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2523463Y2 (ja) | 1997-01-22 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |