JPH047583B2 - - Google Patents

Info

Publication number
JPH047583B2
JPH047583B2 JP59046804A JP4680484A JPH047583B2 JP H047583 B2 JPH047583 B2 JP H047583B2 JP 59046804 A JP59046804 A JP 59046804A JP 4680484 A JP4680484 A JP 4680484A JP H047583 B2 JPH047583 B2 JP H047583B2
Authority
JP
Japan
Prior art keywords
subfield
exposure
stage
deflection
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59046804A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60189932A (ja
Inventor
Mineo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP59046804A priority Critical patent/JPS60189932A/ja
Publication of JPS60189932A publication Critical patent/JPS60189932A/ja
Publication of JPH047583B2 publication Critical patent/JPH047583B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
JP59046804A 1984-03-12 1984-03-12 電子ビ−ム露光方法 Granted JPS60189932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59046804A JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59046804A JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60189932A JPS60189932A (ja) 1985-09-27
JPH047583B2 true JPH047583B2 (enrdf_load_stackoverflow) 1992-02-12

Family

ID=12757515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59046804A Granted JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60189932A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62250636A (ja) * 1986-04-23 1987-10-31 Advantest Corp 荷電粒子ビ−ム露光装置
JPH07111945B2 (ja) * 1987-05-15 1995-11-29 東芝機械株式会社 荷電ビ−ム描画方法及び描画装置

Also Published As

Publication number Publication date
JPS60189932A (ja) 1985-09-27

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees