JPH0474430B2 - - Google Patents

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Publication number
JPH0474430B2
JPH0474430B2 JP60228077A JP22807785A JPH0474430B2 JP H0474430 B2 JPH0474430 B2 JP H0474430B2 JP 60228077 A JP60228077 A JP 60228077A JP 22807785 A JP22807785 A JP 22807785A JP H0474430 B2 JPH0474430 B2 JP H0474430B2
Authority
JP
Japan
Prior art keywords
film
gas
cyclotron resonance
substrate
product gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60228077A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6286165A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP22807785A priority Critical patent/JPS6286165A/ja
Priority to CN86106620A priority patent/CN1027549C/zh
Priority to KR1019860008597A priority patent/KR920000591B1/ko
Publication of JPS6286165A publication Critical patent/JPS6286165A/ja
Publication of JPH0474430B2 publication Critical patent/JPH0474430B2/ja
Priority to US08/219,287 priority patent/US5512102A/en
Priority to CN94106741A priority patent/CN1053230C/zh
Priority to CN94106740A priority patent/CN1053229C/zh
Priority to US08/814,993 priority patent/US6230650B1/en
Priority to US08/853,589 priority patent/US6673722B1/en
Granted legal-status Critical Current

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JP22807785A 1985-10-14 1985-10-14 薄膜形成方法 Granted JPS6286165A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP22807785A JPS6286165A (ja) 1985-10-14 1985-10-14 薄膜形成方法
CN86106620A CN1027549C (zh) 1985-10-14 1986-10-14 利用磁场的微波增强型cvd系统和方法
KR1019860008597A KR920000591B1 (ko) 1985-10-14 1986-10-14 마이크로파 강화 cvd시스템
US08/219,287 US5512102A (en) 1985-10-14 1994-03-28 Microwave enhanced CVD system under magnetic field
CN94106741A CN1053230C (zh) 1985-10-14 1994-06-21 利用磁场的微波增强型cvd系统和方法
CN94106740A CN1053229C (zh) 1985-10-14 1994-06-21 利用磁场的微波增强型cvd系统和方法
US08/814,993 US6230650B1 (en) 1985-10-14 1997-03-14 Microwave enhanced CVD system under magnetic field
US08/853,589 US6673722B1 (en) 1985-10-14 1997-05-09 Microwave enhanced CVD system under magnetic field

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22807785A JPS6286165A (ja) 1985-10-14 1985-10-14 薄膜形成方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1309388A Division JPH0198221A (ja) 1988-01-23 1988-01-23 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS6286165A JPS6286165A (ja) 1987-04-20
JPH0474430B2 true JPH0474430B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-11-26

Family

ID=16870830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22807785A Granted JPS6286165A (ja) 1985-10-14 1985-10-14 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6286165A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0732135B2 (ja) * 1987-10-07 1995-04-10 松下電器産業株式会社 ヘテロ接合素子の製造方法
JPH0198221A (ja) * 1988-01-23 1989-04-17 Semiconductor Energy Lab Co Ltd 薄膜形成装置
CN115679443B (zh) * 2021-12-02 2023-06-30 北京大学 一种光辅助金属有机化合物化学气相沉积装置及实现方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61248420A (ja) * 1985-04-26 1986-11-05 Canon Inc 堆積膜形成法
JPS6227575A (ja) * 1985-07-30 1987-02-05 Yasuo Tarui 成膜方法

Also Published As

Publication number Publication date
JPS6286165A (ja) 1987-04-20

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