JPH0473294B2 - - Google Patents
Info
- Publication number
- JPH0473294B2 JPH0473294B2 JP17480882A JP17480882A JPH0473294B2 JP H0473294 B2 JPH0473294 B2 JP H0473294B2 JP 17480882 A JP17480882 A JP 17480882A JP 17480882 A JP17480882 A JP 17480882A JP H0473294 B2 JPH0473294 B2 JP H0473294B2
- Authority
- JP
- Japan
- Prior art keywords
- base
- sample
- exhaust hole
- holding
- exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000007689 inspection Methods 0.000 description 14
- 230000007547 defect Effects 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000036316 preload Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57174808A JPS5963727A (ja) | 1982-10-05 | 1982-10-05 | 試料保持用テ−ブル装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57174808A JPS5963727A (ja) | 1982-10-05 | 1982-10-05 | 試料保持用テ−ブル装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5963727A JPS5963727A (ja) | 1984-04-11 |
| JPH0473294B2 true JPH0473294B2 (de) | 1992-11-20 |
Family
ID=15985021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57174808A Granted JPS5963727A (ja) | 1982-10-05 | 1982-10-05 | 試料保持用テ−ブル装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5963727A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0715137Y2 (ja) * | 1989-06-30 | 1995-04-10 | ソニー株式会社 | ウエハー保持装置 |
| JP4606956B2 (ja) * | 2005-07-11 | 2011-01-05 | 住友重機械工業株式会社 | ステージ装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5066174A (de) * | 1973-10-12 | 1975-06-04 | ||
| JPS54762U (de) * | 1977-06-06 | 1979-01-06 | ||
| JPS5435652U (de) * | 1977-08-15 | 1979-03-08 | ||
| JPS5687318A (en) * | 1979-12-18 | 1981-07-15 | Toshiba Corp | Finely movable table |
-
1982
- 1982-10-05 JP JP57174808A patent/JPS5963727A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5066174A (de) * | 1973-10-12 | 1975-06-04 | ||
| JPS54762U (de) * | 1977-06-06 | 1979-01-06 | ||
| JPS5435652U (de) * | 1977-08-15 | 1979-03-08 | ||
| JPS5687318A (en) * | 1979-12-18 | 1981-07-15 | Toshiba Corp | Finely movable table |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5963727A (ja) | 1984-04-11 |
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