JPH0466345B2 - - Google Patents

Info

Publication number
JPH0466345B2
JPH0466345B2 JP11586485A JP11586485A JPH0466345B2 JP H0466345 B2 JPH0466345 B2 JP H0466345B2 JP 11586485 A JP11586485 A JP 11586485A JP 11586485 A JP11586485 A JP 11586485A JP H0466345 B2 JPH0466345 B2 JP H0466345B2
Authority
JP
Japan
Prior art keywords
metal silicide
resist
manufacturing
plasma
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11586485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61273546A (ja
Inventor
Shuichi Matsuda
Akira Shigetomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60115864A priority Critical patent/JPS61273546A/ja
Priority to US06/846,518 priority patent/US4661426A/en
Publication of JPS61273546A publication Critical patent/JPS61273546A/ja
Publication of JPH0466345B2 publication Critical patent/JPH0466345B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60115864A 1985-05-29 1985-05-29 金属シリサイドフオトマスクの製造方法 Granted JPS61273546A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60115864A JPS61273546A (ja) 1985-05-29 1985-05-29 金属シリサイドフオトマスクの製造方法
US06/846,518 US4661426A (en) 1985-05-29 1986-03-31 Process for manufacturing metal silicide photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60115864A JPS61273546A (ja) 1985-05-29 1985-05-29 金属シリサイドフオトマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS61273546A JPS61273546A (ja) 1986-12-03
JPH0466345B2 true JPH0466345B2 (h) 1992-10-22

Family

ID=14673036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60115864A Granted JPS61273546A (ja) 1985-05-29 1985-05-29 金属シリサイドフオトマスクの製造方法

Country Status (2)

Country Link
US (1) US4661426A (h)
JP (1) JPS61273546A (h)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6195356A (ja) * 1984-10-16 1986-05-14 Mitsubishi Electric Corp フオトマスクブランク
JPS61273545A (ja) * 1985-05-29 1986-12-03 Mitsubishi Electric Corp フオトマスク
JPS6252550A (ja) * 1985-08-30 1987-03-07 Mitsubishi Electric Corp フオトマスク材料
US5020083A (en) * 1989-04-21 1991-05-28 Lepton Inc. X-ray masks, their fabrication and use
JP3064769B2 (ja) * 1992-11-21 2000-07-12 アルバック成膜株式会社 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法
US5674647A (en) * 1992-11-21 1997-10-07 Ulvac Coating Corporation Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
JP3453435B2 (ja) * 1993-10-08 2003-10-06 大日本印刷株式会社 位相シフトマスクおよびその製造方法
JP3397933B2 (ja) * 1995-03-24 2003-04-21 アルバック成膜株式会社 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。
KR100634387B1 (ko) * 2004-07-22 2006-10-16 삼성전자주식회사 위상 쉬프트 마스크의 수리 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
US4661426A (en) 1987-04-28
JPS61273546A (ja) 1986-12-03

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