JPH0464453B2 - - Google Patents
Info
- Publication number
- JPH0464453B2 JPH0464453B2 JP60158114A JP15811485A JPH0464453B2 JP H0464453 B2 JPH0464453 B2 JP H0464453B2 JP 60158114 A JP60158114 A JP 60158114A JP 15811485 A JP15811485 A JP 15811485A JP H0464453 B2 JPH0464453 B2 JP H0464453B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- wafer
- gap
- mask
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 12
- 235000012431 wafers Nutrition 0.000 description 22
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000009194 climbing Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/703—Gap setting, e.g. in proximity printer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158114A JPS6220311A (ja) | 1985-07-19 | 1985-07-19 | 間隙検出装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158114A JPS6220311A (ja) | 1985-07-19 | 1985-07-19 | 間隙検出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6220311A JPS6220311A (ja) | 1987-01-28 |
JPH0464453B2 true JPH0464453B2 (enrdf_load_stackoverflow) | 1992-10-15 |
Family
ID=15664609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60158114A Granted JPS6220311A (ja) | 1985-07-19 | 1985-07-19 | 間隙検出装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6220311A (enrdf_load_stackoverflow) |
-
1985
- 1985-07-19 JP JP60158114A patent/JPS6220311A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6220311A (ja) | 1987-01-28 |
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