JPH0464453B2 - - Google Patents

Info

Publication number
JPH0464453B2
JPH0464453B2 JP60158114A JP15811485A JPH0464453B2 JP H0464453 B2 JPH0464453 B2 JP H0464453B2 JP 60158114 A JP60158114 A JP 60158114A JP 15811485 A JP15811485 A JP 15811485A JP H0464453 B2 JPH0464453 B2 JP H0464453B2
Authority
JP
Japan
Prior art keywords
pattern
wafer
gap
mask
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60158114A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6220311A (ja
Inventor
Keiichi Okamoto
Yukio Kenbo
Ryuichi Funatsu
Tomohiro Kuni
Yoshihiro Yoneyama
Akira Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60158114A priority Critical patent/JPS6220311A/ja
Publication of JPS6220311A publication Critical patent/JPS6220311A/ja
Publication of JPH0464453B2 publication Critical patent/JPH0464453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703Gap setting, e.g. in proximity printer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60158114A 1985-07-19 1985-07-19 間隙検出装置 Granted JPS6220311A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60158114A JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158114A JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Publications (2)

Publication Number Publication Date
JPS6220311A JPS6220311A (ja) 1987-01-28
JPH0464453B2 true JPH0464453B2 (enrdf_load_stackoverflow) 1992-10-15

Family

ID=15664609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158114A Granted JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Country Status (1)

Country Link
JP (1) JPS6220311A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6220311A (ja) 1987-01-28

Similar Documents

Publication Publication Date Title
JP2546350B2 (ja) 位置合わせ装置
US4741622A (en) Method and apparatus for detecting diversion
US9366524B2 (en) Alignment sensor and height sensor
EP0234562B1 (en) Displacement sensor
JPS61111402A (ja) 位置検出装置
JPH0258766B2 (enrdf_load_stackoverflow)
JPH0464453B2 (enrdf_load_stackoverflow)
JPH06104158A (ja) 位置検出装置
JP3048895B2 (ja) 近接露光に適用される位置検出方法
JP2910151B2 (ja) 位置検出装置
JPS63241407A (ja) 微細凹部の深さ測定方法及びその装置
JP2698446B2 (ja) 間隔測定装置
JPS6289010A (ja) 顕微鏡自動焦点装置
JP2504944B2 (ja) 3次元情報処理方法
JP2513281B2 (ja) 位置合わせ装置
JPH026709A (ja) 表面変位検出装置
JPS6316687B2 (enrdf_load_stackoverflow)
JPS62291512A (ja) 距離測定装置
JPH09120940A (ja) 位置合わせ方法及び位置合わせ装置
JPS60180118A (ja) 回折格子による位置合せ装置
JPH05231834A (ja) 三次元形状測定装置
JP2698388B2 (ja) 位置検出装置
JPS6253049B2 (enrdf_load_stackoverflow)
JPS61134605A (ja) 物体の表面高さ測定装置
JP2903842B2 (ja) 間隔検出方法及びそれを用いた半導体デバイスの製造方法