JPS6220311A - 間隙検出装置 - Google Patents

間隙検出装置

Info

Publication number
JPS6220311A
JPS6220311A JP60158114A JP15811485A JPS6220311A JP S6220311 A JPS6220311 A JP S6220311A JP 60158114 A JP60158114 A JP 60158114A JP 15811485 A JP15811485 A JP 15811485A JP S6220311 A JPS6220311 A JP S6220311A
Authority
JP
Japan
Prior art keywords
gap
wafer
mask
pattern
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60158114A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0464453B2 (enrdf_load_stackoverflow
Inventor
Keiichi Okamoto
啓一 岡本
Yukio Kenbo
行雄 見坊
Ryuichi Funatsu
隆一 船津
Tomohiro Kuji
久迩　朝宏
Yoshihiro Yoneyama
米山　義弘
Akira Inagaki
晃 稲垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60158114A priority Critical patent/JPS6220311A/ja
Publication of JPS6220311A publication Critical patent/JPS6220311A/ja
Publication of JPH0464453B2 publication Critical patent/JPH0464453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60158114A 1985-07-19 1985-07-19 間隙検出装置 Granted JPS6220311A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60158114A JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158114A JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Publications (2)

Publication Number Publication Date
JPS6220311A true JPS6220311A (ja) 1987-01-28
JPH0464453B2 JPH0464453B2 (enrdf_load_stackoverflow) 1992-10-15

Family

ID=15664609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158114A Granted JPS6220311A (ja) 1985-07-19 1985-07-19 間隙検出装置

Country Status (1)

Country Link
JP (1) JPS6220311A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0464453B2 (enrdf_load_stackoverflow) 1992-10-15

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