JPH0463532B2 - - Google Patents

Info

Publication number
JPH0463532B2
JPH0463532B2 JP59005892A JP589284A JPH0463532B2 JP H0463532 B2 JPH0463532 B2 JP H0463532B2 JP 59005892 A JP59005892 A JP 59005892A JP 589284 A JP589284 A JP 589284A JP H0463532 B2 JPH0463532 B2 JP H0463532B2
Authority
JP
Japan
Prior art keywords
resist
coated
thickness
rotation
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59005892A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60149131A (ja
Inventor
Hiroshi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP589284A priority Critical patent/JPS60149131A/ja
Publication of JPS60149131A publication Critical patent/JPS60149131A/ja
Publication of JPH0463532B2 publication Critical patent/JPH0463532B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP589284A 1984-01-17 1984-01-17 レジスト塗布方法 Granted JPS60149131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP589284A JPS60149131A (ja) 1984-01-17 1984-01-17 レジスト塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP589284A JPS60149131A (ja) 1984-01-17 1984-01-17 レジスト塗布方法

Publications (2)

Publication Number Publication Date
JPS60149131A JPS60149131A (ja) 1985-08-06
JPH0463532B2 true JPH0463532B2 (enrdf_load_stackoverflow) 1992-10-12

Family

ID=11623545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP589284A Granted JPS60149131A (ja) 1984-01-17 1984-01-17 レジスト塗布方法

Country Status (1)

Country Link
JP (1) JPS60149131A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197923A (ja) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337708A (en) * 1976-09-21 1978-04-07 Yoshiichirou Suzuki Method of producing ceramic basins jointed to natural dents
JPS5687471A (en) * 1979-12-17 1981-07-16 Matsushita Electric Ind Co Ltd Coating process

Also Published As

Publication number Publication date
JPS60149131A (ja) 1985-08-06

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