JPH0462171B2 - - Google Patents

Info

Publication number
JPH0462171B2
JPH0462171B2 JP57226519A JP22651982A JPH0462171B2 JP H0462171 B2 JPH0462171 B2 JP H0462171B2 JP 57226519 A JP57226519 A JP 57226519A JP 22651982 A JP22651982 A JP 22651982A JP H0462171 B2 JPH0462171 B2 JP H0462171B2
Authority
JP
Japan
Prior art keywords
film
substrate
cracks
tantalum
tantalum oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57226519A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59119734A (ja
Inventor
Hitoshi Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57226519A priority Critical patent/JPS59119734A/ja
Publication of JPS59119734A publication Critical patent/JPS59119734A/ja
Publication of JPH0462171B2 publication Critical patent/JPH0462171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Formation Of Insulating Films (AREA)
  • Semiconductor Memories (AREA)
JP57226519A 1982-12-25 1982-12-25 半導体装置の製造方法 Granted JPS59119734A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57226519A JPS59119734A (ja) 1982-12-25 1982-12-25 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57226519A JPS59119734A (ja) 1982-12-25 1982-12-25 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS59119734A JPS59119734A (ja) 1984-07-11
JPH0462171B2 true JPH0462171B2 (enrdf_load_stackoverflow) 1992-10-05

Family

ID=16846397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57226519A Granted JPS59119734A (ja) 1982-12-25 1982-12-25 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS59119734A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100468638C (zh) 2001-12-18 2009-03-11 松下电器产业株式会社 半导体元件的制造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5325980B2 (enrdf_load_stackoverflow) * 1972-07-12 1978-07-29
JPS53108373A (en) * 1977-03-04 1978-09-21 Hitachi Ltd Manufacture for semiconductor device

Also Published As

Publication number Publication date
JPS59119734A (ja) 1984-07-11

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