JPH0461004B2 - - Google Patents

Info

Publication number
JPH0461004B2
JPH0461004B2 JP58100500A JP10050083A JPH0461004B2 JP H0461004 B2 JPH0461004 B2 JP H0461004B2 JP 58100500 A JP58100500 A JP 58100500A JP 10050083 A JP10050083 A JP 10050083A JP H0461004 B2 JPH0461004 B2 JP H0461004B2
Authority
JP
Japan
Prior art keywords
acid
acridine
ester
composition
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58100500A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59226002A (ja
Inventor
Koji Tamoto
Akira Umehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP58100500A priority Critical patent/JPS59226002A/ja
Priority to US06/617,436 priority patent/US4587200A/en
Publication of JPS59226002A publication Critical patent/JPS59226002A/ja
Publication of JPH0461004B2 publication Critical patent/JPH0461004B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
JP58100500A 1983-06-06 1983-06-06 光重合性組成物 Granted JPS59226002A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58100500A JPS59226002A (ja) 1983-06-06 1983-06-06 光重合性組成物
US06/617,436 US4587200A (en) 1983-06-06 1984-06-05 Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58100500A JPS59226002A (ja) 1983-06-06 1983-06-06 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS59226002A JPS59226002A (ja) 1984-12-19
JPH0461004B2 true JPH0461004B2 (en, 2012) 1992-09-29

Family

ID=14275651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58100500A Granted JPS59226002A (ja) 1983-06-06 1983-06-06 光重合性組成物

Country Status (2)

Country Link
US (1) US4587200A (en, 2012)
JP (1) JPS59226002A (en, 2012)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61172139A (ja) * 1985-01-25 1986-08-02 Fuji Photo Film Co Ltd 光重合性組成物
JPS61260237A (ja) * 1985-05-15 1986-11-18 Hitachi Chem Co Ltd 感光性樹脂組成物
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US4769335A (en) * 1985-12-02 1988-09-06 Ncs Diagnostics Inc. Method and apparatus for transporting photosensitive fluids
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
SE458860B (sv) * 1986-02-06 1989-05-16 Itronic Process Ab Anordning vid en foer vaermebehandling av banformiga alster anordnad behandlingsanlaeggning
DE3878349T2 (de) * 1987-03-17 1993-05-27 Asahi Denka Kogyo Kk Substituierte acridin-derivate und deren verwendung.
JPS6426672A (en) * 1987-04-01 1989-01-27 Yokohama Rubber Co Ltd Ultraviolet-curing type resin composition
JPH02132443A (ja) * 1987-11-02 1990-05-21 Matsushita Electric Ind Co Ltd パターン形成材料
DE68906270T2 (de) * 1988-01-15 1993-11-18 Du Pont Lagerstabile photopolymerisierbare Zusammensetzung für die Aufzeichnung von Beugungsbildern.
US4940648A (en) * 1988-02-12 1990-07-10 Hoechst Celanese Corporation Increased sensitivity photoinitiation compositions
JP2606259B2 (ja) * 1988-03-02 1997-04-30 東洋紡績株式会社 光重合性組成物
EP0360443A1 (en) * 1988-09-03 1990-03-28 Hitachi Chemical Co., Ltd. Acridine compound and photopolymerizable composition using the same
US5217845A (en) * 1988-12-22 1993-06-08 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material containing same
DE3843205A1 (de) * 1988-12-22 1990-06-28 Hoechst Ag Photopolymerisierbare verbindungen, diese enthaltendes photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial
DE3843204A1 (de) * 1988-12-22 1990-06-28 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
US5101010A (en) * 1990-07-27 1992-03-31 United States Government Of America Air-dryable resins and processes for preparing same
JP2505637B2 (ja) * 1990-09-28 1996-06-12 日立化成工業株式会社 光重合性組成物および光重合性エレメント
EP0801328A1 (en) * 1996-04-09 1997-10-15 Morton International, Inc. Photoimageable composition having an acrylic-functional UV stabilizer
JP3338890B2 (ja) * 1998-05-20 2002-10-28 富士通株式会社 感光性耐熱樹脂組成物、その組成物を用いた耐熱絶縁膜のパターン形成方法、及びその方法により得られるパターン化耐熱絶縁膜
US20050269819A1 (en) * 2003-10-07 2005-12-08 Chambers James D Packaging with embedded security measures
JP2006276488A (ja) * 2005-03-29 2006-10-12 Fuji Photo Film Co Ltd フォトスペーサー用感光性樹脂組成物、並びにフォトスペーサー、液晶表示装置用基板、液晶表示素子、及び液晶表示装置
JP4931533B2 (ja) * 2005-09-28 2012-05-16 旭化成イーマテリアルズ株式会社 感光性樹脂組成物およびその積層体
US20070075125A1 (en) * 2005-09-30 2007-04-05 Muscat Robert G Packaging and process of authenticating packaging
US20080022098A1 (en) * 2005-09-30 2008-01-24 Muscat Robert G Authentication process
WO2010103918A1 (ja) * 2009-03-13 2010-09-16 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2773822A (en) * 1953-09-24 1956-12-11 Monsanto Chemicals Photopolymerization initiators
DE2027467C3 (de) * 1970-06-04 1974-08-15 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerisierbare Kopiermasse
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
US4001017A (en) * 1972-12-05 1977-01-04 Ciba-Geigy Ag Process for the photopolymerization of ethylenically unsaturated compounds
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE2944866A1 (de) * 1979-11-07 1981-05-21 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物

Also Published As

Publication number Publication date
US4587200A (en) 1986-05-06
JPS59226002A (ja) 1984-12-19

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