JPH046086B2 - - Google Patents

Info

Publication number
JPH046086B2
JPH046086B2 JP57089894A JP8989482A JPH046086B2 JP H046086 B2 JPH046086 B2 JP H046086B2 JP 57089894 A JP57089894 A JP 57089894A JP 8989482 A JP8989482 A JP 8989482A JP H046086 B2 JPH046086 B2 JP H046086B2
Authority
JP
Japan
Prior art keywords
resist
rotation speed
coated
film thickness
seconds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57089894A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58207631A (ja
Inventor
Keiichi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8989482A priority Critical patent/JPS58207631A/ja
Publication of JPS58207631A publication Critical patent/JPS58207631A/ja
Publication of JPH046086B2 publication Critical patent/JPH046086B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP8989482A 1982-05-28 1982-05-28 レジスト塗布方法 Granted JPS58207631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8989482A JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8989482A JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Publications (2)

Publication Number Publication Date
JPS58207631A JPS58207631A (ja) 1983-12-03
JPH046086B2 true JPH046086B2 (enrdf_load_stackoverflow) 1992-02-04

Family

ID=13983441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8989482A Granted JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Country Status (1)

Country Link
JP (1) JPS58207631A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法
JP2697226B2 (ja) * 1990-02-21 1998-01-14 三菱電機株式会社 塗布液の塗布方法
JP4745358B2 (ja) * 2008-03-04 2011-08-10 株式会社東芝 回転塗布方法、および回転塗布装置
JP2015223556A (ja) * 2014-05-28 2015-12-14 株式会社ディスコ 保護被膜の被覆方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136333A (enrdf_load_stackoverflow) * 1974-04-17 1975-10-29
JPS6057774B2 (ja) * 1978-08-25 1985-12-17 株式会社日立製作所 論理演算型ディジタル圧伸器

Also Published As

Publication number Publication date
JPS58207631A (ja) 1983-12-03

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