JPS58207631A - レジスト塗布方法 - Google Patents

レジスト塗布方法

Info

Publication number
JPS58207631A
JPS58207631A JP8989482A JP8989482A JPS58207631A JP S58207631 A JPS58207631 A JP S58207631A JP 8989482 A JP8989482 A JP 8989482A JP 8989482 A JP8989482 A JP 8989482A JP S58207631 A JPS58207631 A JP S58207631A
Authority
JP
Japan
Prior art keywords
resist
speed
film thickness
rotation
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8989482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH046086B2 (enrdf_load_stackoverflow
Inventor
Keiichi Shibata
圭一 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8989482A priority Critical patent/JPS58207631A/ja
Publication of JPS58207631A publication Critical patent/JPS58207631A/ja
Publication of JPH046086B2 publication Critical patent/JPH046086B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8989482A 1982-05-28 1982-05-28 レジスト塗布方法 Granted JPS58207631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8989482A JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8989482A JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Publications (2)

Publication Number Publication Date
JPS58207631A true JPS58207631A (ja) 1983-12-03
JPH046086B2 JPH046086B2 (enrdf_load_stackoverflow) 1992-02-04

Family

ID=13983441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8989482A Granted JPS58207631A (ja) 1982-05-28 1982-05-28 レジスト塗布方法

Country Status (1)

Country Link
JP (1) JPS58207631A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法
JPH03245875A (ja) * 1990-02-21 1991-11-01 Mitsubishi Electric Corp 塗布液の塗布方法
JP2009207997A (ja) * 2008-03-04 2009-09-17 Toshiba Corp 回転塗布方法、および回転塗布装置
JP2015223556A (ja) * 2014-05-28 2015-12-14 株式会社ディスコ 保護被膜の被覆方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136333A (enrdf_load_stackoverflow) * 1974-04-17 1975-10-29
JPS5530212A (en) * 1978-08-25 1980-03-04 Hitachi Ltd Logical-operation type digital compander

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136333A (enrdf_load_stackoverflow) * 1974-04-17 1975-10-29
JPS5530212A (en) * 1978-08-25 1980-03-04 Hitachi Ltd Logical-operation type digital compander

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6334925A (ja) * 1986-07-29 1988-02-15 Nec Corp フオトレジスト膜の形成方法
JPH03245875A (ja) * 1990-02-21 1991-11-01 Mitsubishi Electric Corp 塗布液の塗布方法
JP2009207997A (ja) * 2008-03-04 2009-09-17 Toshiba Corp 回転塗布方法、および回転塗布装置
JP2015223556A (ja) * 2014-05-28 2015-12-14 株式会社ディスコ 保護被膜の被覆方法

Also Published As

Publication number Publication date
JPH046086B2 (enrdf_load_stackoverflow) 1992-02-04

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