JPH0456446B2 - - Google Patents

Info

Publication number
JPH0456446B2
JPH0456446B2 JP58178084A JP17808483A JPH0456446B2 JP H0456446 B2 JPH0456446 B2 JP H0456446B2 JP 58178084 A JP58178084 A JP 58178084A JP 17808483 A JP17808483 A JP 17808483A JP H0456446 B2 JPH0456446 B2 JP H0456446B2
Authority
JP
Japan
Prior art keywords
substrate
thin film
cluster
gas
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58178084A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6072218A (ja
Inventor
Hitoshi Hasegawa
Tomihiro Yonenaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17808483A priority Critical patent/JPS6072218A/ja
Publication of JPS6072218A publication Critical patent/JPS6072218A/ja
Publication of JPH0456446B2 publication Critical patent/JPH0456446B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP17808483A 1983-09-28 1983-09-28 薄膜形成方法 Granted JPS6072218A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17808483A JPS6072218A (ja) 1983-09-28 1983-09-28 薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17808483A JPS6072218A (ja) 1983-09-28 1983-09-28 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS6072218A JPS6072218A (ja) 1985-04-24
JPH0456446B2 true JPH0456446B2 (cs) 1992-09-08

Family

ID=16042344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17808483A Granted JPS6072218A (ja) 1983-09-28 1983-09-28 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6072218A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62118518A (ja) * 1985-11-19 1987-05-29 Ulvac Corp 化合物半導体の形成方法
DE69722277T2 (de) 1996-01-31 2004-04-01 Canon K.K. Abrechnungsvorrichtung und ein die Abrechnungsvorrichtung verwendendes Informationsverteilungssystem

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4898775A (cs) * 1972-03-28 1973-12-14
JPS5462776A (en) * 1977-10-27 1979-05-21 Nec Corp Production of compound semiconductor thin films
JPS6048831B2 (ja) * 1978-06-22 1985-10-29 日本電気株式会社 バブル用パルス電流駆動装置
JPS5625772A (en) * 1979-08-09 1981-03-12 Mieko Kiyozawa Toy for training wearing of cloth for infant

Also Published As

Publication number Publication date
JPS6072218A (ja) 1985-04-24

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