JPH0454386B2 - - Google Patents
Info
- Publication number
- JPH0454386B2 JPH0454386B2 JP57018642A JP1864282A JPH0454386B2 JP H0454386 B2 JPH0454386 B2 JP H0454386B2 JP 57018642 A JP57018642 A JP 57018642A JP 1864282 A JP1864282 A JP 1864282A JP H0454386 B2 JPH0454386 B2 JP H0454386B2
- Authority
- JP
- Japan
- Prior art keywords
- groove
- resistor
- semiconductor substrate
- impurity diffusion
- diffusion layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
Landscapes
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57018642A JPS58135662A (ja) | 1982-02-08 | 1982-02-08 | 集積回路装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57018642A JPS58135662A (ja) | 1982-02-08 | 1982-02-08 | 集積回路装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58135662A JPS58135662A (ja) | 1983-08-12 |
| JPH0454386B2 true JPH0454386B2 (en, 2012) | 1992-08-31 |
Family
ID=11977250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57018642A Granted JPS58135662A (ja) | 1982-02-08 | 1982-02-08 | 集積回路装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58135662A (en, 2012) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101326639B (zh) | 2005-12-06 | 2014-01-22 | 意法半导体有限公司 | 集成电路中的电阻器 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5426747A (en) * | 1977-07-30 | 1979-02-28 | Tdk Corp | Heat-sinsitive printing head |
| JPS5593251A (en) * | 1978-12-30 | 1980-07-15 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS5643749A (en) * | 1979-09-18 | 1981-04-22 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and its manufacture |
-
1982
- 1982-02-08 JP JP57018642A patent/JPS58135662A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58135662A (ja) | 1983-08-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3826699A (en) | Method for manufacturing a semiconductor integrated circuit isolated through dielectric material | |
| US4314269A (en) | Semiconductor resistor comprising a resistor layer along a side surface | |
| JPS6321351B2 (en, 2012) | ||
| GB2148591A (en) | Semiconductor device isolation grooves | |
| US3404321A (en) | Transistor body enclosing a submerged integrated resistor | |
| JPS6072243A (ja) | 半導体集積回路装置 | |
| US5508545A (en) | Semiconductor device including a pair of transistors having a common channel region, and method of making the same | |
| US4544941A (en) | Semiconductor device having multiple conductive layers and the method of manufacturing the semiconductor device | |
| JPH0454386B2 (en, 2012) | ||
| JP3417482B2 (ja) | 半導体装置の製造方法 | |
| JPS639964A (ja) | 半導体記憶素子製造法 | |
| JPS5838939B2 (ja) | 集積回路 | |
| JPH04361566A (ja) | 半導体集積回路 | |
| JPH05864B2 (en, 2012) | ||
| JPS6018931A (ja) | 半導体装置とその使用方法 | |
| JPH01241163A (ja) | 半導体装置とその製造方法 | |
| JPH04365370A (ja) | 半導体集積回路 | |
| JPS63192249A (ja) | 半導体集積回路装置 | |
| JPH0550140B2 (en, 2012) | ||
| JPS6085846U (ja) | 半導体集積回路装置 | |
| JPS62134961A (ja) | 半導体集積回路装置 | |
| JPS63202966A (ja) | 半導体装置 | |
| JPH0126545B2 (en, 2012) | ||
| JPH06341913A (ja) | 集積化半導体圧力センサ | |
| JPH0466101B2 (en, 2012) |