JPH0452992Y2 - - Google Patents
Info
- Publication number
- JPH0452992Y2 JPH0452992Y2 JP1984184187U JP18418784U JPH0452992Y2 JP H0452992 Y2 JPH0452992 Y2 JP H0452992Y2 JP 1984184187 U JP1984184187 U JP 1984184187U JP 18418784 U JP18418784 U JP 18418784U JP H0452992 Y2 JPH0452992 Y2 JP H0452992Y2
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- ultraviolet
- main body
- ultraviolet lamp
- closed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001816 cooling Methods 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 12
- 239000007789 gas Substances 0.000 description 9
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984184187U JPH0452992Y2 (de) | 1984-12-04 | 1984-12-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984184187U JPH0452992Y2 (de) | 1984-12-04 | 1984-12-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6197834U JPS6197834U (de) | 1986-06-23 |
JPH0452992Y2 true JPH0452992Y2 (de) | 1992-12-14 |
Family
ID=30741672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1984184187U Expired JPH0452992Y2 (de) | 1984-12-04 | 1984-12-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0452992Y2 (de) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51140574A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Method of cleaning silicon substrate plate |
JPS5861831A (ja) * | 1981-10-07 | 1983-04-13 | Toshiba Electric Equip Corp | 光照射装置 |
JPS59124124A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | 半導体装置の製造方法 |
-
1984
- 1984-12-04 JP JP1984184187U patent/JPH0452992Y2/ja not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51140574A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Method of cleaning silicon substrate plate |
JPS5861831A (ja) * | 1981-10-07 | 1983-04-13 | Toshiba Electric Equip Corp | 光照射装置 |
JPS59124124A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6197834U (de) | 1986-06-23 |
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