JPH0452992Y2 - - Google Patents

Info

Publication number
JPH0452992Y2
JPH0452992Y2 JP1984184187U JP18418784U JPH0452992Y2 JP H0452992 Y2 JPH0452992 Y2 JP H0452992Y2 JP 1984184187 U JP1984184187 U JP 1984184187U JP 18418784 U JP18418784 U JP 18418784U JP H0452992 Y2 JPH0452992 Y2 JP H0452992Y2
Authority
JP
Japan
Prior art keywords
processing chamber
ultraviolet
main body
ultraviolet lamp
closed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984184187U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6197834U (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984184187U priority Critical patent/JPH0452992Y2/ja
Publication of JPS6197834U publication Critical patent/JPS6197834U/ja
Application granted granted Critical
Publication of JPH0452992Y2 publication Critical patent/JPH0452992Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1984184187U 1984-12-04 1984-12-04 Expired JPH0452992Y2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984184187U JPH0452992Y2 (de) 1984-12-04 1984-12-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984184187U JPH0452992Y2 (de) 1984-12-04 1984-12-04

Publications (2)

Publication Number Publication Date
JPS6197834U JPS6197834U (de) 1986-06-23
JPH0452992Y2 true JPH0452992Y2 (de) 1992-12-14

Family

ID=30741672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984184187U Expired JPH0452992Y2 (de) 1984-12-04 1984-12-04

Country Status (1)

Country Link
JP (1) JPH0452992Y2 (de)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140574A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Method of cleaning silicon substrate plate
JPS5861831A (ja) * 1981-10-07 1983-04-13 Toshiba Electric Equip Corp 光照射装置
JPS59124124A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 半導体装置の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140574A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Method of cleaning silicon substrate plate
JPS5861831A (ja) * 1981-10-07 1983-04-13 Toshiba Electric Equip Corp 光照射装置
JPS59124124A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6197834U (de) 1986-06-23

Similar Documents

Publication Publication Date Title
US5998766A (en) Apparatus and method for cleaning substrate surface by use of Ozone
US6277767B1 (en) Method for cleaning semiconductor device
JPH0691014B2 (ja) 半導体装置の製造装置
JPH0452992Y2 (de)
JPH0714761A (ja) 帯電物体の中和装置
JPH09263944A (ja) 成膜装置
JPS6235811B2 (de)
JPH0719764B2 (ja) 表面洗浄方法
JP4319287B2 (ja) 処理装置
JPH0927474A (ja) アッシング方法およびその装置
JPH0429220B2 (de)
JPH0684887A (ja) 半導体ウェーハの保護膜形成方法及び同装置
JPS59143318A (ja) 光アニ−ル法
JP3251832B2 (ja) 表面安定化装置および表面安定化方法
JPS6370429A (ja) アツシング装置
WO2024053386A1 (ja) 基板処理システム
JPS63226866A (ja) 真空装置
JPH05283346A (ja) 半導体製造装置
JPH0878388A (ja) 表面処理装置
JPH0611347U (ja) レジスト膜のアッシング装置
JPS63202921A (ja) 半導体基板洗浄装置
JP2004356403A (ja) パターン転写マスク用収納容器、パターン転写マスクの洗浄装置およびその洗浄方法
JPH05198499A (ja) レジスト膜のアッシング装置
JPH02174228A (ja) 固体表面の大気中酸化・汚染防止方法およびその装置
JPH0263531U (de)