JPH045260B2 - - Google Patents

Info

Publication number
JPH045260B2
JPH045260B2 JP57195558A JP19555882A JPH045260B2 JP H045260 B2 JPH045260 B2 JP H045260B2 JP 57195558 A JP57195558 A JP 57195558A JP 19555882 A JP19555882 A JP 19555882A JP H045260 B2 JPH045260 B2 JP H045260B2
Authority
JP
Japan
Prior art keywords
film
pattern
photoresist film
photoresist
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57195558A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5984529A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19555882A priority Critical patent/JPS5984529A/ja
Publication of JPS5984529A publication Critical patent/JPS5984529A/ja
Publication of JPH045260B2 publication Critical patent/JPH045260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP19555882A 1982-11-08 1982-11-08 パタ−ン形成方法 Granted JPS5984529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19555882A JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19555882A JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5984529A JPS5984529A (ja) 1984-05-16
JPH045260B2 true JPH045260B2 (enrdf_load_stackoverflow) 1992-01-30

Family

ID=16343103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19555882A Granted JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5984529A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07107901B2 (ja) * 1987-04-20 1995-11-15 日本電気株式会社 縮小投影露光法によるテ−パ−形成方法
JPH0797581B2 (ja) * 1988-07-18 1995-10-18 シャープ株式会社 半導体装置の製造方法
EP0469370A3 (en) * 1990-07-31 1992-09-09 Gold Star Co. Ltd Etching process for sloped side walls

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51117136A (en) * 1975-04-09 1976-10-15 Tokyo Shibaura Electric Co Plasma etching process
JPS5255867A (en) * 1975-11-04 1977-05-07 Toshiba Corp Exposure method
JPS5775431A (en) * 1980-10-28 1982-05-12 Fujitsu Ltd Formation of pattern

Also Published As

Publication number Publication date
JPS5984529A (ja) 1984-05-16

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