JPH0450733B2 - - Google Patents

Info

Publication number
JPH0450733B2
JPH0450733B2 JP58030833A JP3083383A JPH0450733B2 JP H0450733 B2 JPH0450733 B2 JP H0450733B2 JP 58030833 A JP58030833 A JP 58030833A JP 3083383 A JP3083383 A JP 3083383A JP H0450733 B2 JPH0450733 B2 JP H0450733B2
Authority
JP
Japan
Prior art keywords
light
workpiece
periphery
wafer
irradiation device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58030833A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59158520A (ja
Inventor
Sachiosa Moriwaki
Kosuke Ooshio
Motoi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58030833A priority Critical patent/JPS59158520A/ja
Publication of JPS59158520A publication Critical patent/JPS59158520A/ja
Publication of JPH0450733B2 publication Critical patent/JPH0450733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58030833A 1983-02-28 1983-02-28 照射装置 Granted JPS59158520A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58030833A JPS59158520A (ja) 1983-02-28 1983-02-28 照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58030833A JPS59158520A (ja) 1983-02-28 1983-02-28 照射装置

Publications (2)

Publication Number Publication Date
JPS59158520A JPS59158520A (ja) 1984-09-08
JPH0450733B2 true JPH0450733B2 (fr) 1992-08-17

Family

ID=12314698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58030833A Granted JPS59158520A (ja) 1983-02-28 1983-02-28 照射装置

Country Status (1)

Country Link
JP (1) JPS59158520A (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6173330A (ja) * 1984-09-18 1986-04-15 Nec Corp 半導体デバイス製造装置
JPS62128121A (ja) * 1985-11-28 1987-06-10 Fujitsu Ltd 半導体装置の製造方法
JP2674746B2 (ja) * 1986-02-20 1997-11-12 日本電気株式会社 半導体製造装置
JPS63133527A (ja) * 1986-11-25 1988-06-06 Nec Corp 露光プリアライメント装置
JPS63160332A (ja) * 1986-12-24 1988-07-04 Mitsubishi Electric Corp レジスト除去装置
JPS63258019A (ja) * 1987-04-15 1988-10-25 Nec Kyushu Ltd 目合露光装置
KR960016175B1 (en) * 1987-08-28 1996-12-04 Tokyo Electron Ltd Exposing method and apparatus thereof
JPH0797549B2 (ja) * 1987-08-28 1995-10-18 東京エレクトロン九州株式会社 露光方法及びその装置
JP2567005B2 (ja) * 1987-12-21 1996-12-25 大日本スクリーン製造株式会社 ウエハの周縁部露光装置
JP2623495B2 (ja) * 1988-01-22 1997-06-25 ウシオ電機株式会社 不要レジスト除去方法及び装置
JP2668537B2 (ja) * 1988-01-27 1997-10-27 東京エレクトロン株式会社 レジスト処理装置及びレジスト処理方法
JPH0795516B2 (ja) * 1988-01-29 1995-10-11 ウシオ電機株式会社 ウエハ周辺露光方法及び装置
JPH0273621A (ja) * 1988-09-09 1990-03-13 Ushio Inc ウエハ周辺露光方法
JPH0795518B2 (ja) * 1988-10-25 1995-10-11 ウシオ電機株式会社 ウエハ周辺露光ユニット
JP2601335B2 (ja) * 1988-10-25 1997-04-16 ウシオ電機株式会社 ウエハ周辺露光装置
JPH0795517B2 (ja) * 1988-10-25 1995-10-11 ウシオ電機株式会社 ウエハ周辺露光方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100730A (en) * 1980-12-16 1982-06-23 Nec Corp Manufacture of semiconductor device
JPS57126134A (en) * 1981-01-28 1982-08-05 Nec Corp Processing system for wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100730A (en) * 1980-12-16 1982-06-23 Nec Corp Manufacture of semiconductor device
JPS57126134A (en) * 1981-01-28 1982-08-05 Nec Corp Processing system for wafer

Also Published As

Publication number Publication date
JPS59158520A (ja) 1984-09-08

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