JPH0450384B2 - - Google Patents

Info

Publication number
JPH0450384B2
JPH0450384B2 JP59173174A JP17317484A JPH0450384B2 JP H0450384 B2 JPH0450384 B2 JP H0450384B2 JP 59173174 A JP59173174 A JP 59173174A JP 17317484 A JP17317484 A JP 17317484A JP H0450384 B2 JPH0450384 B2 JP H0450384B2
Authority
JP
Japan
Prior art keywords
substrate
thin film
film
support
roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59173174A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6152361A (ja
Inventor
Masato Sugyama
Takashi Tomie
Kazuyoshi Suzuki
Yoshio Itakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP17317484A priority Critical patent/JPS6152361A/ja
Publication of JPS6152361A publication Critical patent/JPS6152361A/ja
Publication of JPH0450384B2 publication Critical patent/JPH0450384B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Vapour Deposition (AREA)
JP17317484A 1984-08-22 1984-08-22 薄膜形成方法 Granted JPS6152361A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17317484A JPS6152361A (ja) 1984-08-22 1984-08-22 薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17317484A JPS6152361A (ja) 1984-08-22 1984-08-22 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS6152361A JPS6152361A (ja) 1986-03-15
JPH0450384B2 true JPH0450384B2 (en:Method) 1992-08-14

Family

ID=15955461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17317484A Granted JPS6152361A (ja) 1984-08-22 1984-08-22 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6152361A (en:Method)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009179446A (ja) * 2008-01-31 2009-08-13 Fujifilm Corp 巻取装置および巻取部材の作製方法
JP6252401B2 (ja) * 2014-08-18 2017-12-27 住友金属鉱山株式会社 成膜方法及びそれを用いた金属膜付樹脂フィルムの製造方法
CN107815662B (zh) * 2017-12-08 2019-03-15 苏州矩阵光电有限公司 一种薄膜转移装置及其使用方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5482161U (en:Method) * 1977-11-18 1979-06-11

Also Published As

Publication number Publication date
JPS6152361A (ja) 1986-03-15

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Legal Events

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EXPY Cancellation because of completion of term