JPH0445969B2 - - Google Patents

Info

Publication number
JPH0445969B2
JPH0445969B2 JP57102017A JP10201782A JPH0445969B2 JP H0445969 B2 JPH0445969 B2 JP H0445969B2 JP 57102017 A JP57102017 A JP 57102017A JP 10201782 A JP10201782 A JP 10201782A JP H0445969 B2 JPH0445969 B2 JP H0445969B2
Authority
JP
Japan
Prior art keywords
thin plate
exposure
wafer
chuck
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57102017A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58219735A (ja
Inventor
Yukio Kenbo
Nobuyuki Akyama
Tomohiro Kuni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57102017A priority Critical patent/JPS58219735A/ja
Publication of JPS58219735A publication Critical patent/JPS58219735A/ja
Publication of JPH0445969B2 publication Critical patent/JPH0445969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57102017A 1982-06-16 1982-06-16 ステップアンドリピート方式のプロキシミティ露光装置 Granted JPS58219735A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57102017A JPS58219735A (ja) 1982-06-16 1982-06-16 ステップアンドリピート方式のプロキシミティ露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57102017A JPS58219735A (ja) 1982-06-16 1982-06-16 ステップアンドリピート方式のプロキシミティ露光装置

Publications (2)

Publication Number Publication Date
JPS58219735A JPS58219735A (ja) 1983-12-21
JPH0445969B2 true JPH0445969B2 (enrdf_load_stackoverflow) 1992-07-28

Family

ID=14315980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57102017A Granted JPS58219735A (ja) 1982-06-16 1982-06-16 ステップアンドリピート方式のプロキシミティ露光装置

Country Status (1)

Country Link
JP (1) JPS58219735A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6175521A (ja) * 1984-09-21 1986-04-17 Hitachi Ltd 露光装置
JPS6184018A (ja) * 1984-10-01 1986-04-28 Hitachi Ltd Ｘ線露光装置
JP2644692B2 (ja) * 1995-01-30 1997-08-25 キヤノン株式会社 Ｘ線転写装置
JP2002251017A (ja) * 2001-02-23 2002-09-06 Adtec Engineeng Co Ltd 露光装置
AU2002354196A1 (en) * 2001-12-17 2003-06-30 Nikon Corporation Substrate holding apparatus, exposure apparatus, and device manufacturing method
TW200500811A (en) * 2002-12-13 2005-01-01 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
JP2010102130A (ja) * 2008-10-23 2010-05-06 Canon Inc 露光装置
JP5526714B2 (ja) * 2009-11-10 2014-06-18 凸版印刷株式会社 基板露光装置
JP6579873B2 (ja) * 2015-09-10 2019-09-25 株式会社ディスコ 加工装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261132A (ja) * 1988-08-26 1990-03-01 Aimu:Kk 殺菌性織布

Also Published As

Publication number Publication date
JPS58219735A (ja) 1983-12-21

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