JPH0445580B2 - - Google Patents

Info

Publication number
JPH0445580B2
JPH0445580B2 JP61253144A JP25314486A JPH0445580B2 JP H0445580 B2 JPH0445580 B2 JP H0445580B2 JP 61253144 A JP61253144 A JP 61253144A JP 25314486 A JP25314486 A JP 25314486A JP H0445580 B2 JPH0445580 B2 JP H0445580B2
Authority
JP
Japan
Prior art keywords
evaporation source
ion plating
excitation means
substrate
shield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61253144A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63109162A (ja
Inventor
Yoichi Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shingijutsu Kaihatsu Jigyodan filed Critical Shingijutsu Kaihatsu Jigyodan
Priority to JP25314486A priority Critical patent/JPS63109162A/ja
Publication of JPS63109162A publication Critical patent/JPS63109162A/ja
Publication of JPH0445580B2 publication Critical patent/JPH0445580B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP25314486A 1986-10-24 1986-10-24 イオンプレ−テイング方法とその装置 Granted JPS63109162A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25314486A JPS63109162A (ja) 1986-10-24 1986-10-24 イオンプレ−テイング方法とその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25314486A JPS63109162A (ja) 1986-10-24 1986-10-24 イオンプレ−テイング方法とその装置

Publications (2)

Publication Number Publication Date
JPS63109162A JPS63109162A (ja) 1988-05-13
JPH0445580B2 true JPH0445580B2 (OSRAM) 1992-07-27

Family

ID=17247127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25314486A Granted JPS63109162A (ja) 1986-10-24 1986-10-24 イオンプレ−テイング方法とその装置

Country Status (1)

Country Link
JP (1) JPS63109162A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09209131A (ja) * 1996-02-08 1997-08-12 Ricoh Co Ltd 薄膜形成装置
JPH09228046A (ja) * 1996-02-23 1997-09-02 Ricoh Co Ltd 巻き取り式成膜装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003012160A1 (fr) * 2001-07-31 2003-02-13 Asahi Optronics, Ltd. Systeme de galvanoplastie haute frequence par depot par evaporation sous vide
JP2003188115A (ja) * 2001-12-17 2003-07-04 Shin Meiwa Ind Co Ltd 半導体配線形成方法及び装置、半導体デバイス製造方法及び装置、並びにウエハ
DE102015210460B4 (de) 2015-06-08 2021-10-07 Te Connectivity Germany Gmbh Verfahren zur Veränderung mechanischer und/oder elektrischer Eigenschaften zumindest eines Bereichs eines elektrischen Kontaktelements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS535871B2 (OSRAM) * 1973-11-30 1978-03-02
JPS5311175A (en) * 1976-07-19 1978-02-01 Ulvac Corp High frequency ion plating apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09209131A (ja) * 1996-02-08 1997-08-12 Ricoh Co Ltd 薄膜形成装置
JPH09228046A (ja) * 1996-02-23 1997-09-02 Ricoh Co Ltd 巻き取り式成膜装置

Also Published As

Publication number Publication date
JPS63109162A (ja) 1988-05-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees