JPH0444361U - - Google Patents
Info
- Publication number
- JPH0444361U JPH0444361U JP8359190U JP8359190U JPH0444361U JP H0444361 U JPH0444361 U JP H0444361U JP 8359190 U JP8359190 U JP 8359190U JP 8359190 U JP8359190 U JP 8359190U JP H0444361 U JPH0444361 U JP H0444361U
- Authority
- JP
- Japan
- Prior art keywords
- holding plate
- substrate
- deposition
- source
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims 4
- 239000000463 material Substances 0.000 claims 2
- 238000007738 vacuum evaporation Methods 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第1図は本考案の一実施例を示す斜視図である
。 1……基板、2……保持板、3……蒸着源、4
……遮蔽板、20……孔部、40……孔部。
。 1……基板、2……保持板、3……蒸着源、4
……遮蔽板、20……孔部、40……孔部。
Claims (1)
- 蒸着材料が融解状態にある蒸着源に対向に基板
を保持するものであつて、蒸着源に対向された孔
部上に基板が載置になる保持板と、真空中に蒸発
した蒸着材料の通過孔部を有し上記蒸着源と保持
板との間に介装される遮蔽板とを備えたことを特
徴とする真空蒸着装置用基板ホルダ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8359190U JPH0444361U (ja) | 1990-08-09 | 1990-08-09 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8359190U JPH0444361U (ja) | 1990-08-09 | 1990-08-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0444361U true JPH0444361U (ja) | 1992-04-15 |
Family
ID=31814675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8359190U Pending JPH0444361U (ja) | 1990-08-09 | 1990-08-09 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0444361U (ja) |
-
1990
- 1990-08-09 JP JP8359190U patent/JPH0444361U/ja active Pending