JPH0444361U - - Google Patents

Info

Publication number
JPH0444361U
JPH0444361U JP8359190U JP8359190U JPH0444361U JP H0444361 U JPH0444361 U JP H0444361U JP 8359190 U JP8359190 U JP 8359190U JP 8359190 U JP8359190 U JP 8359190U JP H0444361 U JPH0444361 U JP H0444361U
Authority
JP
Japan
Prior art keywords
holding plate
substrate
deposition
source
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8359190U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8359190U priority Critical patent/JPH0444361U/ja
Publication of JPH0444361U publication Critical patent/JPH0444361U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】
第1図は本考案の一実施例を示す斜視図である
。 1……基板、2……保持板、3……蒸着源、4
……遮蔽板、20……孔部、40……孔部。

Claims (1)

    【実用新案登録請求の範囲】
  1. 蒸着材料が融解状態にある蒸着源に対向に基板
    を保持するものであつて、蒸着源に対向された孔
    部上に基板が載置になる保持板と、真空中に蒸発
    した蒸着材料の通過孔部を有し上記蒸着源と保持
    板との間に介装される遮蔽板とを備えたことを特
    徴とする真空蒸着装置用基板ホルダ。
JP8359190U 1990-08-09 1990-08-09 Pending JPH0444361U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8359190U JPH0444361U (ja) 1990-08-09 1990-08-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8359190U JPH0444361U (ja) 1990-08-09 1990-08-09

Publications (1)

Publication Number Publication Date
JPH0444361U true JPH0444361U (ja) 1992-04-15

Family

ID=31814675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8359190U Pending JPH0444361U (ja) 1990-08-09 1990-08-09

Country Status (1)

Country Link
JP (1) JPH0444361U (ja)

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