JPH0437424B2 - - Google Patents

Info

Publication number
JPH0437424B2
JPH0437424B2 JP28815385A JP28815385A JPH0437424B2 JP H0437424 B2 JPH0437424 B2 JP H0437424B2 JP 28815385 A JP28815385 A JP 28815385A JP 28815385 A JP28815385 A JP 28815385A JP H0437424 B2 JPH0437424 B2 JP H0437424B2
Authority
JP
Japan
Prior art keywords
formula
polymer
resistant material
heat
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP28815385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62145240A (ja
Inventor
Shigeru Kubota
Norimoto Moriwaki
Torahiko Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP28815385A priority Critical patent/JPS62145240A/ja
Publication of JPS62145240A publication Critical patent/JPS62145240A/ja
Publication of JPH0437424B2 publication Critical patent/JPH0437424B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP28815385A 1985-12-19 1985-12-19 ポジ型感光性耐熱材料 Granted JPS62145240A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28815385A JPS62145240A (ja) 1985-12-19 1985-12-19 ポジ型感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28815385A JPS62145240A (ja) 1985-12-19 1985-12-19 ポジ型感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS62145240A JPS62145240A (ja) 1987-06-29
JPH0437424B2 true JPH0437424B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-06-19

Family

ID=17726488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28815385A Granted JPS62145240A (ja) 1985-12-19 1985-12-19 ポジ型感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS62145240A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5087547A (en) * 1990-03-02 1992-02-11 Union Carbide Chemicals & Plastics Technology Corporation Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer

Also Published As

Publication number Publication date
JPS62145240A (ja) 1987-06-29

Similar Documents

Publication Publication Date Title
JP2890213B2 (ja) 感光性重合体組成物及びパターンの形成方法
KR100201194B1 (ko) 습식 에칭 방법 및 조성물
JPH03209478A (ja) ポジ型感光性ポリイミド樹脂組成物
JP3024008B2 (ja) 光画像形成性ポリイミドコーティング
JP3064579B2 (ja) パターン形成方法
JPH1039510A (ja) ネガ型フォトレジスト組成物及びその利用
EP0137655A2 (en) Radiation-sensitive polymer composition
KR100422971B1 (ko) 나프톨 구조를 가진 이온형 광산발생제 및 이를 이용한감광성 폴리이미드 조성물
JP3363580B2 (ja) 感光性樹脂組成物及びレリーフパターンの製造法
JPH0437424B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP3143070B2 (ja) ポリ−ｏ−ヒドロキシアミド及びポリ−ｏ−メルカプトアミドの製造方法
JP3319000B2 (ja) 化学線感応性組成物
JP2002122993A (ja) 感光性樹脂組成物およびポジ型パターン形成方法
JP2001264980A (ja) 感光性樹脂組成物およびその製造方法
JPH04363361A (ja) 耐熱性ポジ型フオトレジスト組成物
JPH0437423B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH03115461A (ja) 感光性樹脂組成物
CN114920934B (zh) 一种感光聚酰亚胺树脂的制备方法和应用
JP2000250209A (ja) 感光性樹脂組成物およびその製造方法
JP2003015290A (ja) 感光性樹脂組成物およびポジ型パターン形成方法
JP2000230049A (ja) 感光性樹脂組成物およびその製造方法
JPS59212834A (ja) 感光性耐熱材料
JP2002162743A (ja) 感光性樹脂組成物およびその製造方法
JPH05310933A (ja) 溶媒可溶性ポリイミドの製造方法
JP2002099084A (ja) 感光性樹脂組成物およびその製造方法