JPH04330388A - 真空ポンプ装置 - Google Patents

真空ポンプ装置

Info

Publication number
JPH04330388A
JPH04330388A JP9784491A JP9784491A JPH04330388A JP H04330388 A JPH04330388 A JP H04330388A JP 9784491 A JP9784491 A JP 9784491A JP 9784491 A JP9784491 A JP 9784491A JP H04330388 A JPH04330388 A JP H04330388A
Authority
JP
Japan
Prior art keywords
vacuum pump
phase
gas
process gas
piping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9784491A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0559277B2 (enrdf_load_stackoverflow
Inventor
Manabu Tsujimura
学 辻村
Yoshihiro Niimura
恵弘 新村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP9784491A priority Critical patent/JPH04330388A/ja
Publication of JPH04330388A publication Critical patent/JPH04330388A/ja
Publication of JPH0559277B2 publication Critical patent/JPH0559277B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compressor (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
JP9784491A 1991-04-30 1991-04-30 真空ポンプ装置 Granted JPH04330388A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9784491A JPH04330388A (ja) 1991-04-30 1991-04-30 真空ポンプ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9784491A JPH04330388A (ja) 1991-04-30 1991-04-30 真空ポンプ装置

Publications (2)

Publication Number Publication Date
JPH04330388A true JPH04330388A (ja) 1992-11-18
JPH0559277B2 JPH0559277B2 (enrdf_load_stackoverflow) 1993-08-30

Family

ID=14203034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9784491A Granted JPH04330388A (ja) 1991-04-30 1991-04-30 真空ポンプ装置

Country Status (1)

Country Link
JP (1) JPH04330388A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003209101A (ja) * 2002-01-17 2003-07-25 Tokura Kogyo Kk Ｃｖｄ排気系配管における塩化アンモニウムの付着防止方法
WO2012017972A1 (en) * 2010-08-05 2012-02-09 Ebara Corporation Exhaust system
KR20170037946A (ko) 2014-07-31 2017-04-05 에드워즈 가부시키가이샤 드라이 펌프 및 배기가스 처리 방법
JP2019143534A (ja) * 2018-02-21 2019-08-29 住友重機械工業株式会社 クライオポンプ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63314397A (ja) * 1987-06-17 1988-12-22 Hitachi Ltd 真空ポンプ
JPH01237397A (ja) * 1988-03-18 1989-09-21 Hitachi Ltd 真空ポンプ
JPH02188691A (ja) * 1989-01-13 1990-07-24 Hitachi Ltd 真空ポンプ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63314397A (ja) * 1987-06-17 1988-12-22 Hitachi Ltd 真空ポンプ
JPH01237397A (ja) * 1988-03-18 1989-09-21 Hitachi Ltd 真空ポンプ
JPH02188691A (ja) * 1989-01-13 1990-07-24 Hitachi Ltd 真空ポンプ

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003209101A (ja) * 2002-01-17 2003-07-25 Tokura Kogyo Kk Ｃｖｄ排気系配管における塩化アンモニウムの付着防止方法
WO2012017972A1 (en) * 2010-08-05 2012-02-09 Ebara Corporation Exhaust system
US9625168B2 (en) 2010-08-05 2017-04-18 Ebara Corporation Exhaust system
KR20170037946A (ko) 2014-07-31 2017-04-05 에드워즈 가부시키가이샤 드라이 펌프 및 배기가스 처리 방법
US11592025B2 (en) 2014-07-31 2023-02-28 Edwards Japan Limited Dry pump and exhaust gas treatment method
JP2019143534A (ja) * 2018-02-21 2019-08-29 住友重機械工業株式会社 クライオポンプ

Also Published As

Publication number Publication date
JPH0559277B2 (enrdf_load_stackoverflow) 1993-08-30

Similar Documents

Publication Publication Date Title
US4911812A (en) Plasma treating method and apparatus therefor
JPH01268030A (ja) プラズマエッチング方法及び装置
JPH04330388A (ja) 真空ポンプ装置
JPH0261067A (ja) 熱処理装置
JP3155487B2 (ja) ウェット酸化装置およびウェット酸化方法
JP2001126988A (ja) 半導体製造装置
JP2708569B2 (ja) 真空装置の脱ガス方法及び脱ガス装置
JPS5812342B2 (ja) 連続ドライエッチング方法
JPS6139519A (ja) プラズマ処理装置
JPH06173010A (ja) 熱処理装置
JPH01302816A (ja) 縦型熱処理装置
JPH02159018A (ja) 減圧式気相成長装置
JPH04304381A (ja) Ｃｖｄ装置における排気システムの反応生成物除去装置
JPH10173025A (ja) 半導体製造装置のロードロック室
JP4545852B2 (ja) 排ガス処理装置
JPH04187771A (ja) クリーニング方法
KR100503256B1 (ko) 트랩장치
JP2879047B2 (ja) 熱処理装置及び熱処理方法
JPH0774105A (ja) 半導体製造装置
JPH0729842A (ja) 熱処理装置
JP2916686B2 (ja) 真空加熱炉の冷却用気体供給装置
KR100648268B1 (ko) 반도체 소자 제조에 사용되는 배기 시스템 및 이를 이용한기판 처리 장치
JPH0783013B2 (ja) プラズマ処理装置
JPS621870A (ja) 蒸着装置
JPH04196320A (ja) ドライエッチング方法