JPH0429217B2 - - Google Patents

Info

Publication number
JPH0429217B2
JPH0429217B2 JP57124480A JP12448082A JPH0429217B2 JP H0429217 B2 JPH0429217 B2 JP H0429217B2 JP 57124480 A JP57124480 A JP 57124480A JP 12448082 A JP12448082 A JP 12448082A JP H0429217 B2 JPH0429217 B2 JP H0429217B2
Authority
JP
Japan
Prior art keywords
substrate
amorphous silicon
thin film
ultrasonic vibration
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57124480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5916327A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57124480A priority Critical patent/JPS5916327A/ja
Publication of JPS5916327A publication Critical patent/JPS5916327A/ja
Publication of JPH0429217B2 publication Critical patent/JPH0429217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4415—Acoustic wave CVD
    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
JP57124480A 1982-07-19 1982-07-19 薄膜の製造方法 Granted JPS5916327A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57124480A JPS5916327A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57124480A JPS5916327A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS5916327A JPS5916327A (ja) 1984-01-27
JPH0429217B2 true JPH0429217B2 (Direct) 1992-05-18

Family

ID=14886557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57124480A Granted JPS5916327A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS5916327A (Direct)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4443645B2 (ja) * 1998-05-07 2010-03-31 本田技研工業株式会社 Ｃｂｄ成膜装置
US6174651B1 (en) 1999-01-14 2001-01-16 Steag Rtp Systems, Inc. Method for depositing atomized materials onto a substrate utilizing light exposure for heating
US6569249B1 (en) 2000-04-18 2003-05-27 Clemson University Process for forming layers on substrates

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54113243A (en) * 1978-02-24 1979-09-04 Toshiba Corp Production of semiconductor device

Also Published As

Publication number Publication date
JPS5916327A (ja) 1984-01-27

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