JPH0429214B2 - - Google Patents

Info

Publication number
JPH0429214B2
JPH0429214B2 JP58217111A JP21711183A JPH0429214B2 JP H0429214 B2 JPH0429214 B2 JP H0429214B2 JP 58217111 A JP58217111 A JP 58217111A JP 21711183 A JP21711183 A JP 21711183A JP H0429214 B2 JPH0429214 B2 JP H0429214B2
Authority
JP
Japan
Prior art keywords
reticle
wafer
alignment
shot
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58217111A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60110117A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58217111A priority Critical patent/JPS60110117A/ja
Priority to US06/553,814 priority patent/US4620785A/en
Priority to GB08331675A priority patent/GB2133536B/en
Priority to DE19833343206 priority patent/DE3343206A1/de
Priority to DE3348224A priority patent/DE3348224C2/de
Priority to FR838319126A priority patent/FR2541471B1/fr
Publication of JPS60110117A publication Critical patent/JPS60110117A/ja
Publication of JPH0429214B2 publication Critical patent/JPH0429214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58217111A 1982-12-01 1983-11-19 アラインメントマ−クを備えた薄板状物体およびこの物体を使用するアラインメント装置 Granted JPS60110117A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP58217111A JPS60110117A (ja) 1983-11-19 1983-11-19 アラインメントマ−クを備えた薄板状物体およびこの物体を使用するアラインメント装置
US06/553,814 US4620785A (en) 1982-12-01 1983-11-21 Sheet-like member having alignment marks and an alignment apparatus for the same
GB08331675A GB2133536B (en) 1982-12-01 1983-11-28 Sensing alignment
DE19833343206 DE3343206A1 (de) 1982-12-01 1983-11-29 Mit ausrichtungsmarken versehenes blattfoermiges element sowie ausrichtungsvorrichtung fuer dasselbe
DE3348224A DE3348224C2 (enExample) 1982-12-01 1983-11-29
FR838319126A FR2541471B1 (fr) 1982-12-01 1983-11-30 Element en forme de feuille a aligner sur un autre element presentant une zone dessinee, et appareil et reticule pour l'alignement de ces elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58217111A JPS60110117A (ja) 1983-11-19 1983-11-19 アラインメントマ−クを備えた薄板状物体およびこの物体を使用するアラインメント装置

Publications (2)

Publication Number Publication Date
JPS60110117A JPS60110117A (ja) 1985-06-15
JPH0429214B2 true JPH0429214B2 (enExample) 1992-05-18

Family

ID=16699018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58217111A Granted JPS60110117A (ja) 1982-12-01 1983-11-19 アラインメントマ−クを備えた薄板状物体およびこの物体を使用するアラインメント装置

Country Status (1)

Country Link
JP (1) JPS60110117A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166026A (ja) * 1984-12-19 1986-07-26 Fujitsu Ltd 位置合わせ方法
JPH0770575B2 (ja) * 1987-05-25 1995-07-31 松下電子工業株式会社 半導体装置
DE102018129059A1 (de) 2018-11-19 2020-05-20 Kautex Textron Gmbh & Co. Kg Dachhimmelverkleidung sowie Verfahren zur Herstellung einer Dachhimmelverkleidung

Also Published As

Publication number Publication date
JPS60110117A (ja) 1985-06-15

Similar Documents

Publication Publication Date Title
US4699515A (en) Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween
US5440138A (en) Exposure method
KR100389976B1 (ko) 얼라인먼트방법및장치
KR100883482B1 (ko) 노광장치
US10895809B2 (en) Method for the alignment of photolithographic masks and corresponding process for manufacturing integrated circuits in a wafer of semiconductor material
KR20040002468A (ko) 노광장치 및 방법
US4620785A (en) Sheet-like member having alignment marks and an alignment apparatus for the same
JP4280523B2 (ja) 露光装置及び方法、デバイス製造方法
JPH0729803A (ja) 走査型露光装置及び該装置を用いてデバイスを製造する方法
JP3624919B2 (ja) 露光方法
JPH08330204A (ja) 露光方法
JPS6348422B2 (enExample)
JPH0429214B2 (enExample)
JP3507205B2 (ja) 走査型露光装置及び該装置を用いてデバイスを製造する方法
JPS59101829A (ja) アライメントマ−クの配置方法
JP2004279166A (ja) 位置検出装置
JP3344426B2 (ja) 計測方法及びデバイス製造方法
JP3576722B2 (ja) 走査型露光装置及びそれを用いたデバイス製造方法
JPS61123139A (ja) アライメント装置
JPH08339959A (ja) 位置合わせ方法
JPH1027738A (ja) 走査型露光方法および該方法を用いたデバイス製造方法
JP3624920B2 (ja) 露光方法
JPH097919A (ja) 露光方法
KR900004051B1 (ko) 투영노광법 및 그 장치
JPH0743311A (ja) 表面状態検査装置及び該装置を備える露光装置