JPH0428788B2 - - Google Patents
Info
- Publication number
- JPH0428788B2 JPH0428788B2 JP31319589A JP31319589A JPH0428788B2 JP H0428788 B2 JPH0428788 B2 JP H0428788B2 JP 31319589 A JP31319589 A JP 31319589A JP 31319589 A JP31319589 A JP 31319589A JP H0428788 B2 JPH0428788 B2 JP H0428788B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- coating
- magnetic
- electroless plating
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 27
- 229910052802 copper Inorganic materials 0.000 claims description 27
- 239000010949 copper Substances 0.000 claims description 27
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 26
- 238000007772 electroless plating Methods 0.000 claims description 24
- 229910052698 phosphorus Inorganic materials 0.000 claims description 16
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 15
- 239000011574 phosphorus Substances 0.000 claims description 15
- JUWOETZNAMLKMG-UHFFFAOYSA-N [P].[Ni].[Cu] Chemical compound [P].[Ni].[Cu] JUWOETZNAMLKMG-UHFFFAOYSA-N 0.000 claims description 3
- 229910017888 Cu—P Inorganic materials 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 230000005415 magnetization Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 229910018104 Ni-P Inorganic materials 0.000 description 5
- 229910018536 Ni—P Inorganic materials 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- -1 NiCl 2 and 6H 2 O Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910021538 borax Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229910000365 copper sulfate Inorganic materials 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 239000001509 sodium citrate Substances 0.000 description 3
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- 239000004328 sodium tetraborate Substances 0.000 description 3
- 235000010339 sodium tetraborate Nutrition 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 2
- 229910018054 Ni-Cu Inorganic materials 0.000 description 2
- 229910018481 Ni—Cu Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 description 2
- 235000018417 cysteine Nutrition 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31319589A JPH02290978A (ja) | 1989-12-01 | 1989-12-01 | 非磁性被膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31319589A JPH02290978A (ja) | 1989-12-01 | 1989-12-01 | 非磁性被膜 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59116945A Division JPS60261022A (ja) | 1984-06-07 | 1984-06-07 | 磁気記録体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02290978A JPH02290978A (ja) | 1990-11-30 |
| JPH0428788B2 true JPH0428788B2 (enrdf_load_stackoverflow) | 1992-05-15 |
Family
ID=18038249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31319589A Granted JPH02290978A (ja) | 1989-12-01 | 1989-12-01 | 非磁性被膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02290978A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014148554A1 (ja) | 2013-03-19 | 2014-09-25 | 株式会社フジシールインターナショナル | シュリンクラベルおよびその製造方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341420B1 (en) | 2000-08-02 | 2002-01-29 | Static Control Components, Inc. | Method of manufacturing a developer roller |
| JP4573445B2 (ja) * | 2001-02-16 | 2010-11-04 | 吉野電化工業株式会社 | 無電解銅メッキ液組成物及び無電解銅メッキ方法 |
| JP2005264214A (ja) * | 2004-03-17 | 2005-09-29 | Tokyo Institute Of Technology | 磁性中空形状材料及びその製造方法 |
| JP6391331B2 (ja) * | 2014-07-07 | 2018-09-19 | 古河電気工業株式会社 | 磁気記録媒体用金属部材および磁気記録媒体 |
| CN113106431B (zh) * | 2021-04-27 | 2023-03-28 | 深圳市优讯佳电子科技有限公司 | 一种热辅助磁记录用存储介质及其制备方法 |
-
1989
- 1989-12-01 JP JP31319589A patent/JPH02290978A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014148554A1 (ja) | 2013-03-19 | 2014-09-25 | 株式会社フジシールインターナショナル | シュリンクラベルおよびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02290978A (ja) | 1990-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6197364B1 (en) | Production of electroless Co(P) with designed coercivity | |
| JPS581065A (ja) | 無電解金めっき浴および方法 | |
| JPS62246145A (ja) | 無電解沈着磁気記録媒体法 | |
| JPH0248981B2 (enrdf_load_stackoverflow) | ||
| US3268353A (en) | Electroless deposition and method of producing such electroless deposition | |
| US5437887A (en) | Method of preparing aluminum memory disks | |
| US3282723A (en) | Electroless deposition and method of producing such electroless deposition | |
| JPH0428788B2 (enrdf_load_stackoverflow) | ||
| US3423214A (en) | Magnetic cobalt and cobalt alloy plating bath and process | |
| US6162343A (en) | Method of preparing hard disc including treatment with amine-containing zincate solution | |
| GB2237032A (en) | Plating aluminium | |
| JP2848103B2 (ja) | 磁気記録体 | |
| JPH0250993B2 (enrdf_load_stackoverflow) | ||
| US3702263A (en) | Process for electrolessly plating magnetic thin films | |
| US3360397A (en) | Process of chemically depositing a magnetic cobalt film from a bath containing malonate and citrate ions | |
| JPH01123079A (ja) | 非晶質Ｎｉ−Ｐ合金 | |
| US6337007B1 (en) | Method of making a Co-Fe-Ni soft magnetic thin film | |
| JP3201763B2 (ja) | 軟磁性薄膜 | |
| JP2757672B2 (ja) | 無電解Ｎｉ−Ｐ−Ｍｏめっき方法 | |
| JP3826323B2 (ja) | めっき磁性薄膜の製造方法 | |
| JP3233963B2 (ja) | 磁性薄膜およびその製造方法 | |
| JPS5837616B2 (ja) | 磁気記録媒体の製造法 | |
| JP3514800B2 (ja) | 軟磁性薄膜およびその製造方法 | |
| JPH0696949A (ja) | 磁性薄膜の製造方法 | |
| JPH0729734A (ja) | 磁性薄膜およびその製造方法 |