JPH0427683B2 - - Google Patents

Info

Publication number
JPH0427683B2
JPH0427683B2 JP58005184A JP518483A JPH0427683B2 JP H0427683 B2 JPH0427683 B2 JP H0427683B2 JP 58005184 A JP58005184 A JP 58005184A JP 518483 A JP518483 A JP 518483A JP H0427683 B2 JPH0427683 B2 JP H0427683B2
Authority
JP
Japan
Prior art keywords
light
mark
wafer
mask
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58005184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59132126A (ja
Inventor
Junji Hazama
Shoichi Tanimoto
Kinya Kato
Hisao Izawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP58005184A priority Critical patent/JPS59132126A/ja
Priority to US06/570,189 priority patent/US4636626A/en
Publication of JPS59132126A publication Critical patent/JPS59132126A/ja
Publication of JPH0427683B2 publication Critical patent/JPH0427683B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58005184A 1983-01-14 1983-01-18 位置合わせ装置 Granted JPS59132126A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58005184A JPS59132126A (ja) 1983-01-18 1983-01-18 位置合わせ装置
US06/570,189 US4636626A (en) 1983-01-14 1984-01-12 Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58005184A JPS59132126A (ja) 1983-01-18 1983-01-18 位置合わせ装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1234596A Division JPH02191314A (ja) 1989-09-12 1989-09-12 パターン検出装置

Publications (2)

Publication Number Publication Date
JPS59132126A JPS59132126A (ja) 1984-07-30
JPH0427683B2 true JPH0427683B2 (show.php) 1992-05-12

Family

ID=11604142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58005184A Granted JPS59132126A (ja) 1983-01-14 1983-01-18 位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS59132126A (show.php)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6262519A (ja) * 1985-09-13 1987-03-19 Canon Inc 位置検出装置

Also Published As

Publication number Publication date
JPS59132126A (ja) 1984-07-30

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