JPH0427681B2 - - Google Patents
Info
- Publication number
- JPH0427681B2 JPH0427681B2 JP58160542A JP16054283A JPH0427681B2 JP H0427681 B2 JPH0427681 B2 JP H0427681B2 JP 58160542 A JP58160542 A JP 58160542A JP 16054283 A JP16054283 A JP 16054283A JP H0427681 B2 JPH0427681 B2 JP H0427681B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- exposure
- shutter
- amount
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 19
- 238000005286 illumination Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 6
- 230000035945 sensitivity Effects 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 14
- 238000012937 correction Methods 0.000 description 6
- 238000005375 photometry Methods 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000012733 comparative method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Exposure In Printing And Copying (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58160542A JPS6052852A (ja) | 1983-09-02 | 1983-09-02 | 露光量制御装置の較正方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58160542A JPS6052852A (ja) | 1983-09-02 | 1983-09-02 | 露光量制御装置の較正方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6052852A JPS6052852A (ja) | 1985-03-26 |
JPH0427681B2 true JPH0427681B2 (zh) | 1992-05-12 |
Family
ID=15717230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58160542A Granted JPS6052852A (ja) | 1983-09-02 | 1983-09-02 | 露光量制御装置の較正方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6052852A (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63111617A (ja) * | 1986-10-29 | 1988-05-16 | Mitsubishi Electric Corp | 縮小投影露光装置 |
JPH1092722A (ja) * | 1996-09-18 | 1998-04-10 | Nikon Corp | 露光装置 |
JP2007180229A (ja) * | 2005-12-27 | 2007-07-12 | Harison Toshiba Lighting Corp | 紫外線照射装置 |
DE102012211979A1 (de) * | 2011-07-29 | 2013-01-31 | Canon Kabushiki Kaisha | Ophthalmologische Vorrichtung |
-
1983
- 1983-09-02 JP JP58160542A patent/JPS6052852A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6052852A (ja) | 1985-03-26 |
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