JPH0422034B2 - - Google Patents

Info

Publication number
JPH0422034B2
JPH0422034B2 JP16779883A JP16779883A JPH0422034B2 JP H0422034 B2 JPH0422034 B2 JP H0422034B2 JP 16779883 A JP16779883 A JP 16779883A JP 16779883 A JP16779883 A JP 16779883A JP H0422034 B2 JPH0422034 B2 JP H0422034B2
Authority
JP
Japan
Prior art keywords
layer
semiconductor
groove
bistable
active layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16779883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6058696A (ja
Inventor
Juichi Odagiri
Isao Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16779883A priority Critical patent/JPS6058696A/ja
Publication of JPS6058696A publication Critical patent/JPS6058696A/ja
Publication of JPH0422034B2 publication Critical patent/JPH0422034B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/0625Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching
    • H01S5/2277Buried mesa structure ; Striped active layer mesa created by etching double channel planar buried heterostructure [DCPBH] laser

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP16779883A 1983-09-12 1983-09-12 双安定半導体レ−ザ Granted JPS6058696A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16779883A JPS6058696A (ja) 1983-09-12 1983-09-12 双安定半導体レ−ザ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16779883A JPS6058696A (ja) 1983-09-12 1983-09-12 双安定半導体レ−ザ

Publications (2)

Publication Number Publication Date
JPS6058696A JPS6058696A (ja) 1985-04-04
JPH0422034B2 true JPH0422034B2 (enrdf_load_stackoverflow) 1992-04-15

Family

ID=15856300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16779883A Granted JPS6058696A (ja) 1983-09-12 1983-09-12 双安定半導体レ−ザ

Country Status (1)

Country Link
JP (1) JPS6058696A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6058696A (ja) 1985-04-04

Similar Documents

Publication Publication Date Title
US4870468A (en) Semiconductor light-emitting device and method of manufacturing the same
JP2001274510A (ja) 導波路型光素子及びその製造方法
JP3108183B2 (ja) 半導体レーザ素子とその製造方法
JPH0422034B2 (enrdf_load_stackoverflow)
JPS61102086A (ja) 半導体レ−ザ
JP4164248B2 (ja) 半導体素子及びその製造方法、及び半導体光装置
JPS61150293A (ja) 双安定半導体レ−ザ
JP2555984B2 (ja) 半導体レーザおよびその製造方法
JPH0578810B2 (enrdf_load_stackoverflow)
JP2940185B2 (ja) 埋め込み型半導体レーザ
JPS6297386A (ja) 分布帰還型双安定半導体レ−ザ
JPS6237557B2 (enrdf_load_stackoverflow)
JPS641075B2 (enrdf_load_stackoverflow)
JP2973215B2 (ja) 半導体レーザ装置
JPH0632324B2 (ja) 光双安定半導体レ−ザ
JPS6034089A (ja) 光双安定半導体レ−ザ
JPS6261383A (ja) 半導体レ−ザおよびその製造方法
JPH0722692A (ja) 半導体レーザ
JPS6347357B2 (enrdf_load_stackoverflow)
JP4024319B2 (ja) 半導体発光装置
JPH03120775A (ja) 埋め込み構造半導体レーザおよびその製造方法
JPS6370474A (ja) 半導体レ−ザ素子の製造方法
JPH01309393A (ja) 半導体レーザ装置及びその製造方法
JPH10209568A (ja) 半導体光デバイスの製造方法
JPH02237190A (ja) 半導体レーザ